US5516625A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Fill and etchback process using dual photoresist sacrificial layer and two-step etching process for planarizing oxide-filled shallow trench structure
Assignee: Intersil Corp
•
Filing: 1993-09-08
•
Granted: 1996-05-14
•
Expires: 2013-09-08
Abstract
Abstract To planarize an oxide-filled shallow trench-isolated semiconductor architecture, a composite photoresist sacrificial layer is initially formed on the oxide-filled structure. The composite photoresist layer contains photoresist plugs which are reflowed to fill depressions in the oxide fill layer overlying the trench, and an overlying photoresist layer which effectively planarizes the depression-filled trench oxide layer. Respective photoresist and oxide selective etching chemistries are then successively applied to first etch the composite sacrificial photoresist layer and then etch the trench fill oxide layer down to the surface of an etch stop polysilicon layer. Since the thickness of the polysilicon etch stop layer is initially formed so as to extend above the mesa layer of the trench-isolated semiconductor structure by a relatively nominal height, after planarization, the top surface of the trench fill oxide layer still extends above the surface of the mesa to prevent shorting of a subsequently formed polysilicon gate layer with underlying mesa material, while being sufficiently low enough to avoid sidewall stringer formation.
Inventors
- 👤 Jeanne M. McNamara
- 👤 Deborah K. Rodriguez
- 👤 David H. Leebrick
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 05:03
CPC Classifications
H; H10; H10W; H10W10/00; H10W10/01; H10W10/011; H10W10/014; H10W10/10; H10W10/17; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/97
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
245 words
A method of forming a semiconductor structure comprising the steps of: (a) providing a substrate having a top surface and a trench which extends from said top surface into said substrate; (b) non-selectively forming a first layer of a first material on the structure provided in step (a) such that said first layer of said first material fills said trench and is formed on said top surface of said substrate, and wherein a depression extends from a top surface of said first layer of said first material, said depression overlying said trench; (c) filling the depression in said first layer of said first material with a second layer of a second material such that said second layer of said second material has a top surface that substantially coincides with the top surface of said first layer of said first material; (d) non-selectively forming a third layer of said second material on the structure resulting from step (c) such that said third layer of said second material forms a planarizing top layer structure overlying said first and second layers; (e) etching second material of said third layer and said second layer down to the surface of said first layer; (f) etching first material of said first layer down to the top surface of said substrate, so as to leave second material of said second layer overlying first material filling said trench; and (g) removing second material of said second layer overlying first material filling said trench.
Claim 2
Independent Claim
245 words
A method of forming a semiconductor structure comprising the steps of: (a) providing a substrate having a top surface and a trench which extends from said top surface into said substrate; (b) non-selectively forming a first layer of a first material on the structure provided in step (a) such that said first layer of said first material fills said trench and is formed on said top surface of said substrate, and wherein a depression extends from a top surface of said first layer of said first material, said depression overlying said trench; (c) filling the depression in said first layer of said first material with a second layer of a second material such that said second layer of said second material has a top surface that substantially coincides with the top surface of said first layer of said first material; (d) non-selectively forming a third layer of said second material on the structure resulting from step (c) such that said third layer of said second material forms a planarizing top layer structure overlying said first and second layers; (e) etching second material of said third layer and said second layer down to the surface of said first layer; (f) etching first material of said first layer down to the top surface of said substrate, so as to leave second material of said second layer overlying first material filling said trench; and (g) removing second material of said second layer overlying first material filling said trench.
Claim 3
Dependent Claim
100 words
A method according to claim 1, wherein step (e) comprises non-selectively applying a first etchant, which etches said second material, to the structure resulting from step (d), so as to etch said third layer and said second layer down to the surface of said first layer, and step (f) comprises non-selectively applying a second etchant, which etches said first material, to the structure resulting from step (e), so as to etch said first material of said first layer down to the top surface of said substrate, and leave second material of said second layer overlying first material filling said trench.
Claim 4
Dependent Claim
78 words
A method according to claim 2, wherein step (a) comprises providing a semiconductor substrate having a layer of polysilicon formed on a top surface thereof and a trench which extends from a top surface of said layer of polysilicon into said substrate, and further including the step of: (h) removing said layer of polysilicon from said top surface of semiconductor substrate so that said first material filling said trench projects above said top surface of said semiconductor substrate.
Claim 5
Independent Claim
373 words
A method of forming a semiconductor structure comprising the steps of: (a) non-selectively forming a trench fill material layer on a trench-patterned semiconductor structure, said trench-patterned semiconductor structure containing mesa regions on which an etch stop layer has been formed and a trench pattern which extends from a top surface said trench-patterned semiconductor structure down to a prescribed depth therein, said trench fill material layer being substantially conformal with the topography of the trench-patterned surface of the underlying semiconductor structure, such that the top surface of said trench fill material layer has depressions which overlie said trench pattern, said trench fill material layer having a thickness sufficient to ensure that said depressions are located above the top surface of said mesa regions; (b) selectively forming a plurality of photoresist plugs which fill the depressions in the top surface of said trench fill material layer and extend above the top surface of said trench fill material layer, so as to allow said photoresist plugs to be reflowed into a generally smooth and substantially planar shape that blends into an intended planar surface contour with the top surface of said trench fill material layer; (c) reflowing said photoresist plugs into a shape which smoothly conforms with the top surface of the oxide layer; (d) non-selectively forming a planarizing photoresist layer on the structure resulting from step (c), so as to form a composite photoresist sacrificial layer structure containing said planarizing photoresist layer and reflowed photoresist plugs; (e) etching said composite photoresist sacrificial layer down to and terminating at the top surface of the trench fill material layer, so as to produce a planarized surface containing the top surface of said trench fill material and planarized top surface portions of said reflowed photoresist plugs that have formed in the depressions in the top surface of said trench fill material overlying said trench pattern; (f) anisotropically etching said trench fill material layer down to and terminating at the surface of said etch stop layer, which leaves a plurality of reflowed photoresist plugs overlying said trench pattern and being coplanar with the top surface of said etch stop layer; (g) removing said plurality of reflowed photoresist plugs overlying said trench pattern; and (h) removing said etch stop layer.
Claim 6
Independent Claim
373 words
A method of forming a semiconductor structure comprising the steps of: (a) non-selectively forming a trench fill material layer on a trench-patterned semiconductor structure, said trench-patterned semiconductor structure containing mesa regions on which an etch stop layer has been formed and a trench pattern which extends from a top surface said trench-patterned semiconductor structure down to a prescribed depth therein, said trench fill material layer being substantially conformal with the topography of the trench-patterned surface of the underlying semiconductor structure, such that the top surface of said trench fill material layer has depressions which overlie said trench pattern, said trench fill material layer having a thickness sufficient to ensure that said depressions are located above the top surface of said mesa regions; (b) selectively forming a plurality of photoresist plugs which fill the depressions in the top surface of said trench fill material layer and extend above the top surface of said trench fill material layer, so as to allow said photoresist plugs to be reflowed into a generally smooth and substantially planar shape that blends into an intended planar surface contour with the top surface of said trench fill material layer; (c) reflowing said photoresist plugs into a shape which smoothly conforms with the top surface of the oxide layer; (d) non-selectively forming a planarizing photoresist layer on the structure resulting from step (c), so as to form a composite photoresist sacrificial layer structure containing said planarizing photoresist layer and reflowed photoresist plugs; (e) etching said composite photoresist sacrificial layer down to and terminating at the top surface of the trench fill material layer, so as to produce a planarized surface containing the top surface of said trench fill material and planarized top surface portions of said reflowed photoresist plugs that have formed in the depressions in the top surface of said trench fill material overlying said trench pattern; (f) anisotropically etching said trench fill material layer down to and terminating at the surface of said etch stop layer, which leaves a plurality of reflowed photoresist plugs overlying said trench pattern and being coplanar with the top surface of said etch stop layer; (g) removing said plurality of reflowed photoresist plugs overlying said trench pattern; and (h) removing said etch stop layer.
Claim 7
Dependent Claim
23 words
A method according to claim 4, wherein said trench fill material comprises a trench fill oxide, and said etch stop layer comprises polysilicon.
Claim 8
Dependent Claim
110 words
A method according to claim 5, wherein said trench-patterned semiconductor structure comprises a trench-patterned single crystal semiconductor mesa layer disposed on an underlying support substrate, a thin oxide layer disposed on the top surface of the silicon mesa layer, and a polysilicon etch stop formed on the top surface of said thin oxide layer, said etch stop polysilicon layer having a thickness which is predefined to take into account subsequent wash treatments to which said trench fill oxide will be exposed, so that after such wash treatments the top surface of said trench fill oxide will not be lower than the top surface of said trench-patterned single crystal mesa layer.
Claim 9
Dependent Claim
36 words
A method according to claim 6, wherein step (a) comprises oxidizing said trench-patterned semiconductor structure, so as to form a thin oxide layer on the exposed surfaces of the trench and said polysilicon etch stop layer.
Claim 10
Dependent Claim
87 words
A method according to claim 5, wherein step (e) comprises non-selectively applying an oxygen-based chemistry etch to said composite photoresist sacrificial layer, so as to etch away said composite photoresist sacrificial layer down to the top surface of the trench fill material layer, thereby obtaining a planarized surface coincident with the top surface of said trench fill material and planarized top surface portions of said reflowed photoresist plugs that have formed in the depressions in the top surface of said trench fill material overlying said trench pattern.
Claim 11
Dependent Claim
101 words
A method according to claim 8, wherein step (f) comprises non-selectively applying an NF 3 /CHF 3 oxide etchant having a high selectivity to oxide to the structure resulting from step (e), thereby enabling a functionally anisotropic etch of oxide within said trench fill layer to terminate at the top surface of said polysilicon etch stop layer, so as to etch said trench fill oxide material layer down to the surface of said polysilicon etch stop layer, leaving a plurality of reflowed photoresist plugs overlying said trench pattern and being coplanar with the top surface of said polysilicon etch stop layer.
Claim 12
Dependent Claim
101 words
A method according to claim 5, wherein step (f) comprises non-selectively applying an NF 3 /CHF 3 oxide etchant having a high selectivity to oxide to the structure resulting from step (e), thereby enabling a functionally anisotropic etch of oxide within said trench fill layer to terminate at the top surface of said polysilicon etch stop layer, so as to etch said trench fill oxide material layer down to the surface of said polysilicon etch stop layer, leaving a plurality of reflowed photoresist plugs overlying said trench pattern and being coplanar with the top surface of said polysilicon etch stop layer.
Claim 13
Dependent Claim
110 words
A method according to claim 10, wherein said trench-patterned semiconductor structure comprises a trench-patterned single crystal semiconductor mesa layer disposed on an underlying support substrate, a thin oxide layer disposed on the top surface of the silicon mesa layer, and a polysilicon etch stop formed on the top surface of said thin oxide layer, said etch stop polysilicon layer having a thickness which is predefined to take into account subsequent wash treatments to which said trench fill oxide will be exposed, so that after such wash treatments the top surface of said trench fill oxide will not be lower than the top surface of said trench-patterned single crystal mesa layer.
Claim 14
Dependent Claim
36 words
A method according to claim 11, wherein step (a) comprises oxidizing said trench-patterned semiconductor structure, so as to form a thin oxide layer on the exposed surfaces of the trench and said polysilicon etch stop layer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-05-14 | 1999-11-13 | 2000-05-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-05-14 | 2003-11-13 | 2004-05-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-05-14 | 2007-11-13 | 2008-05-14 | $7700.00 | Window Closed / Lapsed |