Plasma generating apparatus and method

Claim 2

A plasma generating method comprising a step of carrying out capacitive-coupling and inductive-coupling so as to be associated with each other by means of a pair of parallel-planar electrodes and an inductive-coupling coil driven by a single radio-frequency power supply, respectively, so that capacitively-coupled plasma and inductively-coupled plasma are generated within a vacuum chamber.

Claim 3

The plasma generating method as claimed in claim 1, wherein a condition and characteristics of the generated plasma are controllable by way of a winding of the inductive-coupling coil.

Claim 4

The plasma generating method as claimed in claim 2, wherein a magnetic field generated by the inductive-coupling coil and an electric field generated by the pair of the parallel-planar electrodes are in a same position, and have a same operation cycle.

Claim 5

The plasma generating method as claimed in claim 1, wherein a magnetic field generated by the inductive-coupling coil and an electric field generated by the pair of the parallel-planar electrodes are in a same position, and have a same operation cycle.

Claim 6

The plasma generating method as claimed in claim 1, wherein said inductive-coupling coil and said pair of parallel-planar electrodes constructs a resonance circuit.

Claim 7

A plasma generating apparatus comprising: a vacuum chamber; an inductive-coupling coil wound around said vacuum chamber; a pair of parallel-planar electrodes, each of which electrodes has a center on a central axis of said inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis; a radio-frequency power supply; and a radio-frequency matching circuit coupled to said radio-frequency power supply; wherein: said a radio-frequency matching circuit is coupled to said inductive-coupling coil and to said pair of parallel-planar electrodes; said pair of parallel-planar electrodes and said inductive-coupling coil are driven by the radio-frequency power supply; and said pair of parallel-planar electrodes and said inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber.

Claim 8

A plasma generating apparatus comprising: a vacuum chamber; an inductive-coupling coil wound around said vacuum chamber; a pair of parallel-planar electrodes, each of which electrodes has a center on a central axis of said inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis; a radio-frequency power supply; and a radio-frequency matching circuit coupled to said radio-frequency power supply; wherein: said a radio-frequency matching circuit is coupled to said inductive-coupling coil and to said pair of parallel-planar electrodes; said pair of parallel-planar electrodes and said inductive-coupling coil are driven by the radio-frequency power supply; and said pair of parallel-planar electrodes and said inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber.

Claim 9

The plasma generating apparatus as claimed in claim 1, wherein said inductive-coupling coil and said pair of parallel-planar electrodes constructs a resonance circuit.

Claim 10

A plasma generating apparatus comprising: a vacuum chamber; an inductive-coupling coil wound around said vacuum chamber; a pair of parallel-planar electrodes, each of which electrodes has a center on a central axis of said inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis; a radio-frequency power supply; and a radio-frequency matching circuit coupled to said radio-frequency power supply; wherein: said a radio-frequency matching circuit is coupled to said inductive-coupling coil and to said pair of parallel-planar electrodes; said pair of parallel-planar electrodes and said inductive-coupling coil are driven by the radio-frequency power supply; and said pair of parallel-planar electrodes and said inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber; and said pair of parallel-planar electrodes and said inductive-coupling coil are coupled in series to said radio-frequency matching circuit.

Claim 11

A plasma generating apparatus comprising: a vacuum chamber; an inductive-coupling coil wound around said vacuum chamber; a pair of parallel-planar electrodes, each of which electrodes has a center on a central axis of said inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis; a radio-frequency power supply; and a radio-frequency matching circuit coupled to said radio-frequency power supply; wherein: said a radio-frequency matching circuit is coupled to said inductive-coupling coil and to said pair of parallel-planar electrodes; said pair of parallel-planar electrodes and said inductive-coupling coil are driven by the radio-frequency power supply; and said pair of parallel-planar electrodes and said inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber; and said pair of parallel-planar electrodes and said inductive-coupling coil are coupled in series to said radio-frequency matching circuit.

Claim 12

The plasma generating apparatus as claimed in claim 8, wherein: said pair of parallel-planar electrodes includes first and second electrodes; said first electrode and said radio-frequency power supply are grounded; an end of said inductive-coupling coil is coupled to said radio-frequency matching circuit; the other end of the coil is coupled to said second electrode; and a substrate for plasma processing is positioned on the second electrode.

Claim 13

The plasma generating apparatus as claimed in claim 8, wherein: said pair of parallel-planar electrodes includes first and second electrodes; said first electrode is coupled to said radio-frequency matching circuit; said second electrode is coupled to an end of said inductive-coupling coil; the other end of the coil and said radio-frequency power supply are grounded; and a substrate for plasma processing is positioned on the first electrode.

Claim 14

The plasma generating apparatus as claimed in claim 8, wherein a condition and characteristics of the generated plasma are controllable by way of a winding of the inductive-coupling coil.

Claim 15

A plasma generating apparatus comprising: a vacuum chamber; an inductive-coupling coil wound around said vacuum chamber; a pair of parallel-planar electrodes, each of which electrodes has a center on a central axis of said inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis; a radio-frequency power supply; and a radio-frequency matching circuit coupled to said radio-frequency power supply; wherein: said a radio-frequency matching circuit is coupled to said inductive-coupling coil and to said pair of parallel-planar electrodes; said pair of parallel-planar electrodes and said inductive-coupling coil are driven by the radio-frequency power supply; and said pair of parallel-planar electrodes and said inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber; and said pair of parallel-planar electrodes and said inductive-coupling coil are coupled in parallel to said radio-frequency matching circuit.

Claim 16

A plasma generating apparatus comprising: a vacuum chamber; an inductive-coupling coil wound around said vacuum chamber; a pair of parallel-planar electrodes, each of which electrodes has a center on a central axis of said inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis; a radio-frequency power supply; and a radio-frequency matching circuit coupled to said radio-frequency power supply; wherein: said a radio-frequency matching circuit is coupled to said inductive-coupling coil and to said pair of parallel-planar electrodes; said pair of parallel-planar electrodes and said inductive-coupling coil are driven by the radio-frequency power supply; and said pair of parallel-planar electrodes and said inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber; and said pair of parallel-planar electrodes and said inductive-coupling coil are coupled in parallel to said radio-frequency matching circuit.

Claim 17

The plasma generating apparatus as claimed in claim 12, wherein: said pair of parallel-planar electrodes includes first and second electrodes; said first electrode, an end of said inductive-coupling coil, and said radio-frequency power supply are grounded; the other end of said inductive-coupling coil is coupled to said radio-frequency matching circuit and to said second electrode; and a substrate for plasma processing is positioned on the second electrode.

Claim 18

The plasma generating apparatus as claimed in claim 12, wherein a condition and characteristics of the generated plasma are controllable by way of a winding of the inductive-coupling coil.

Claim 19

A plasma generating apparatus comprising: a vacuum chamber; a load circuit having an inductive-coupling coil and a pair of planar electrodes provided to said vacuum chamber; and single power supply means, coupled to said inductive-coupling coil and said pair of planar electrodes in said load circuit, for supplying a radio frequency power to said load circuit so that the inductive-coupling coil and the pair of planar electrodes carry out capacitive-coupling and inductive-coupling so as to be associated with each other, whereby inductively-coupled plasma and capacitively-coupled plasma are generated within the vacuum chamber.

Claim 20

A plasma generating apparatus comprising: a vacuum chamber; a load circuit having an inductive-coupling coil and a pair of planar electrodes provided to said vacuum chamber; and single power supply means, coupled to said inductive-coupling coil and said pair of planar electrodes in said load circuit, for supplying a radio frequency power to said load circuit so that the inductive-coupling coil and the pair of planar electrodes carry out capacitive-coupling and inductive-coupling so as to be associated with each other, whereby inductively-coupled plasma and capacitively-coupled plasma are generated within the vacuum chamber.

Claim 21

The plasma generating apparatus as claimed in claim 15, wherein said inductive-coupling coil and said pair of parallel-planar electrodes constructs a resonance circuit.

Claim 22

A plasma generating apparatus comprising: a vacuum chamber; an inductive-coupling coil wound around said vacuum chamber; a pair of parallel-planar electrodes, each of which electrodes has a center on a central axis of said inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis; a radio-frequency power supply; and a radio-frequency matching circuit coupled to said radio-frequency power supply; wherein: said a radio-frequency matching circuit is coupled to said inductive-coupling coil and to said pair of parallel-planar electrodes; said pair of parallel-planar electrodes and said inductive-coupling coil are driven by the radio-frequency power supply; and said pair of parallel-planar electrodes and said inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber; and a condition and characteristics of the generated plasma are controllable by way of a winding of the inductive-coupling coil.

Claim 23

A plasma generating apparatus comprising: a vacuum chamber; an inductive-coupling coil wound around said vacuum chamber; a pair of parallel-planar electrodes, each of which electrodes has a center on a central axis of said inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis; a radio-frequency power supply; and a radio-frequency matching circuit coupled to said radio-frequency power supply; wherein: said a radio-frequency matching circuit is coupled to said inductive-coupling coil and to said pair of parallel-planar electrodes; said pair of parallel-planar electrodes and said inductive-coupling coil are driven by the radio-frequency power supply; and said pair of parallel-planar electrodes and said inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber; and a condition and characteristics of the generated plasma are controllable by way of a winding of the inductive-coupling coil.