Patent US5506684A successfully refreshed from Google Patents.
US5506684A
Expired / Lapsed
US
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Projection scanning exposure apparatus with synchronous mask/wafer alignment system
Assignee: Nikon Corp
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Filing: 1995-06-07
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Granted: 1996-04-09
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Expires: 2015-06-07
Abstract
Abstract A scanning exposure apparatus has a mask (reticle) and a photosensitive substrate (a wafer) in an imaging relationship across a projection optical system. A mask stage and a wafer stage are moved simultaneously in first (X) direction with a speed ratio corresponding to the magnification of projection, so that a shot area of the photosensitive substrate is scan-exposed to an original pattern of the mask. The mask is provided, over the scanning range of the original pattern, with mask gratings, each composed of plural grating elements arranged at a predetermined pitch along the first (X) direction. The photosensitive substrate is provided with substrate gratings corresponding to said mask gratings. The positional aberration between said mask gratings and the substrate gratings is detected, through the projection optical system, by positional aberration detecting means. At the scanning exposure, either of the mask stage and the substrate stage is driven in the first (X) direction at a constant speed, by first drive control means. The other stage is controlled by second drive control means in such a manner that the relative positional aberration detected by the positional aberration detecting means in the course of movement of the stage, driven by the first drive control means, remains at a predetermined value.
Inventors
- 👤 Kazuya Ota
- 👤 Kouichirou Komatsu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 17:49
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7088; G01; G01B; G01B11/00; G01B11/26; G03F7/00; G03F7/70; G03F7/70216; G03F7/70358; G03F7/70691; G03F7/708; G03F7/70858; G03F9/7003; G03F9/7023; G03F9/7026; G03F9/7073; G03F9/7076
Claims Analysis
Total Claims: 39
Claim 1
Independent Claim
237 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising: a projection optical system for projecting at least a portion of said original pattern on said photosensitive substrate; a mask stage supporting said mask and movable in a predetermined direction perpendicular to an optical axis of said projection optical system; a substrate stage supporting said photosensitive substrate and movable in said predetermined direction; wherein said mask has a mask mark formed over substantially the entire range of a forming area of said original pattern along said predetermined direction, and said photosensitive substrate is provided with a substrate mark formed over substantially the entire range of said predetermined area along said predetermined direction; a measuring device for measuring an amount of relative positional displacement between said mask mark and said substrate mark in said predetermined direction; a first drive system for driving one of said mask stage and said substrate stage at a predetermined set speed in said predetermined direction during transfer of said original pattern to said predetermined area; and a second drive system for driving the other of said mask stage and substrate stage in said predetermined direction in such a manner that a positional displacement detected by said measuring device accompanying movement of said one stage is kept at a predetermined value.
Claim 2
Independent Claim
237 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising: a projection optical system for projecting at least a portion of said original pattern on said photosensitive substrate; a mask stage supporting said mask and movable in a predetermined direction perpendicular to an optical axis of said projection optical system; a substrate stage supporting said photosensitive substrate and movable in said predetermined direction; wherein said mask has a mask mark formed over substantially the entire range of a forming area of said original pattern along said predetermined direction, and said photosensitive substrate is provided with a substrate mark formed over substantially the entire range of said predetermined area along said predetermined direction; a measuring device for measuring an amount of relative positional displacement between said mask mark and said substrate mark in said predetermined direction; a first drive system for driving one of said mask stage and said substrate stage at a predetermined set speed in said predetermined direction during transfer of said original pattern to said predetermined area; and a second drive system for driving the other of said mask stage and substrate stage in said predetermined direction in such a manner that a positional displacement detected by said measuring device accompanying movement of said one stage is kept at a predetermined value.
Claim 3
Dependent Claim
52 words
An apparatus according to claim 1, wherein said measuring device includes a light irradiation system which irradiates each of said mask mark and said substrate mark with an illumination light and a photodetector which receives light from said mask mark and light from said substrate mark passing through said projection optical system.
Claim 4
Dependent Claim
87 words
An apparatus according to claim 1, wherein each of said mask mark and said substrate mark is a diffraction grating consisting of plural grating elements arranged along said predetermined direction, and wherein said measuring device includes a light irradiation system which radiates two beams onto said mask mark and radiates two beams onto said substrate mark through said projection optical system, and a photodetector which receives diffracted light produced from said mask mark and diffracted light produced from said substrate mark passing through said projection optical system.
Claim 5
Dependent Claim
45 words
An apparatus according to claim 3, wherein said light irradiation system includes a light source producing a beam, a splitter which splits said beam from said light source into two and an objective optical system which emits said two split beams toward said mask mark.
Claim 6
Dependent Claim
37 words
An apparatus according to claim 4, wherein said light irradiation system includes a frequency shifter which is disposed between said splitter and said objective optical system and provides a predetermined frequency difference between said two split beams.
Claim 7
Dependent Claim
51 words
An apparatus according to claim 5, wherein said first drive system drives said one stage at a speed different from a moving speed of an interference fringe formed by said two split beams when a moving direction of said one stage is accorded with said moving direction of said interference fringe.
Claim 8
Independent Claim
165 words
An apparatus which transfers an original pattern formed on a first substrate to a predetermined area on a second substrate, wherein said first substrate is provided with a first mark formed over substantially the entire range of a forming area of said original pattern along a predetermined direction and said second substrate is provided with a second mark formed over substantially the entire range of said predetermined area along said predetermined direction, said apparatus comprising: a measuring device for measuring an amount of relative positional displacement between said first and second marks in said predetermined direction; a first drive system for moving one of said first and second substrates at a constant speed in said predetermined direction during transfer of said original pattern to said predetermined area; and a second drive system for moving the other of said first and second substrates in said predetermined direction dependent on an amount of a positional displacement detected by said measuring device during movement of said one substrate.
Claim 9
Independent Claim
165 words
An apparatus which transfers an original pattern formed on a first substrate to a predetermined area on a second substrate, wherein said first substrate is provided with a first mark formed over substantially the entire range of a forming area of said original pattern along a predetermined direction and said second substrate is provided with a second mark formed over substantially the entire range of said predetermined area along said predetermined direction, said apparatus comprising: a measuring device for measuring an amount of relative positional displacement between said first and second marks in said predetermined direction; a first drive system for moving one of said first and second substrates at a constant speed in said predetermined direction during transfer of said original pattern to said predetermined area; and a second drive system for moving the other of said first and second substrates in said predetermined direction dependent on an amount of a positional displacement detected by said measuring device during movement of said one substrate.
Claim 10
Independent Claim
164 words
A method for transferring an original pattern formed on a first substrate to a predetermined area on a second substrate, wherein said first substrate is provided with a first mark formed over substantially the entire range of a forming area of said original pattern along a predetermined direction and said second substrate is provided with a second mark formed over substantially the entire range of said predetermined area along said predetermined direction, said method comprising: moving one of said first and second substrates at a constant speed in said predetermined direction during transfer of said original pattern to said predetermined area; and moving the other of said first and second substrates in said predetermined direction in such a manner that an amount of positional displacement between said first and second marks in said predetermined direction is kept at a predetermined value, by measuring said amount of positional displacement between said first and second marks in said predetermined direction during movement of said one substrate.
Claim 11
Independent Claim
164 words
A method for transferring an original pattern formed on a first substrate to a predetermined area on a second substrate, wherein said first substrate is provided with a first mark formed over substantially the entire range of a forming area of said original pattern along a predetermined direction and said second substrate is provided with a second mark formed over substantially the entire range of said predetermined area along said predetermined direction, said method comprising: moving one of said first and second substrates at a constant speed in said predetermined direction during transfer of said original pattern to said predetermined area; and moving the other of said first and second substrates in said predetermined direction in such a manner that an amount of positional displacement between said first and second marks in said predetermined direction is kept at a predetermined value, by measuring said amount of positional displacement between said first and second marks in said predetermined direction during movement of said one substrate.
Claim 12
Independent Claim
301 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising: a projection optical system which projects at least a portion of said original pattern on said photosensitive substrate; a mask stage supporting said mask and movable in a predetermined direction perpendicular to an optical axis of said projection optical system; a substrate stage supporting said photosensitive substrate and movable in said predetermined direction; wherein said mask is provided with first and second mask marks formed on opposite sides of said original pattern over substantially the entire range of a forming area of said original pattern along said predetermined direction, and said photosensitive substrate is provided with first and second substrate marks formed on opposite sides of said predetermined area over substantially the entire range of said predetermined area along said predetermined directions; a measuring device for measuring an amount of relative positional displacement between each of said first and second mask marks and each of said first and second substrate marks corresponding to each of said mask marks in said predetermined direction; a first drive system driving one of said mask stage and said substrate stage at a predetermined set speed in said predetermined direction during transfer of said original pattern to said predetermined area; a second drive system driving the other of said mask stage and said substrate stage in said predetermined direction in such a manner that an amount of positional displacement detected by said measuring device accompanying movement of said one stage is kept at a predetermined value; and a rotation device for relatively rotating said mask and said photosensitive substrate on the basis of an amount of positional displacement detected by said measuring device.
Claim 13
Independent Claim
301 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising: a projection optical system which projects at least a portion of said original pattern on said photosensitive substrate; a mask stage supporting said mask and movable in a predetermined direction perpendicular to an optical axis of said projection optical system; a substrate stage supporting said photosensitive substrate and movable in said predetermined direction; wherein said mask is provided with first and second mask marks formed on opposite sides of said original pattern over substantially the entire range of a forming area of said original pattern along said predetermined direction, and said photosensitive substrate is provided with first and second substrate marks formed on opposite sides of said predetermined area over substantially the entire range of said predetermined area along said predetermined directions; a measuring device for measuring an amount of relative positional displacement between each of said first and second mask marks and each of said first and second substrate marks corresponding to each of said mask marks in said predetermined direction; a first drive system driving one of said mask stage and said substrate stage at a predetermined set speed in said predetermined direction during transfer of said original pattern to said predetermined area; a second drive system driving the other of said mask stage and said substrate stage in said predetermined direction in such a manner that an amount of positional displacement detected by said measuring device accompanying movement of said one stage is kept at a predetermined value; and a rotation device for relatively rotating said mask and said photosensitive substrate on the basis of an amount of positional displacement detected by said measuring device.
Claim 14
Independent Claim
359 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising: a projection optical system projecting at least a portion of said original pattern on said photosensitive substrate; a mask stage supporting said mask and movable in a first direction perpendicular to an optical axis of said projection optical system; a substrate stage supporting said photosensitive substrate and movable in said first direction; wherein said mask is provided with a first mask grating consisting of plural grating elements arranged in said first direction and a second mask grating consisting of plural grating elements arranged in a second direction perpendicular to said first direction, each mask grating extending over substantially the entire range of a forming area of said original pattern, and said photosensitive substrate is provided with a first substrate grating consisting of plural grating elements arranged in said first direction and a second substrate grating consisting of plural grating elements arranged in said second direction, each substrate grating extending over substantially the entire range of said predetermined area; a measuring device measuring a first amount of positional displacement between said first mask grating and said first substrate grating in said first direction and measuring a second amount of positional displacement between said second mask grating and said second substrate grating in said second direction; a first drive system for driving one of said mask stage and said substrate stage at a predetermined set speed in said first direction during transfer of said original pattern to said predetermined area; a second drive system for driving the other of said mask stage and said substrate stage in said first direction in such a manner that said first amount of positional displacement detected by said measuring device accompanying movement of said one stage is kept at a predetermined value; and a third drive system for relatively moving said mask and said photosensitive substrate in said second direction in such a manner that said second amount of positional displacement detected by said measuring device is kept at a predetermined value.
Claim 15
Independent Claim
359 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising: a projection optical system projecting at least a portion of said original pattern on said photosensitive substrate; a mask stage supporting said mask and movable in a first direction perpendicular to an optical axis of said projection optical system; a substrate stage supporting said photosensitive substrate and movable in said first direction; wherein said mask is provided with a first mask grating consisting of plural grating elements arranged in said first direction and a second mask grating consisting of plural grating elements arranged in a second direction perpendicular to said first direction, each mask grating extending over substantially the entire range of a forming area of said original pattern, and said photosensitive substrate is provided with a first substrate grating consisting of plural grating elements arranged in said first direction and a second substrate grating consisting of plural grating elements arranged in said second direction, each substrate grating extending over substantially the entire range of said predetermined area; a measuring device measuring a first amount of positional displacement between said first mask grating and said first substrate grating in said first direction and measuring a second amount of positional displacement between said second mask grating and said second substrate grating in said second direction; a first drive system for driving one of said mask stage and said substrate stage at a predetermined set speed in said first direction during transfer of said original pattern to said predetermined area; a second drive system for driving the other of said mask stage and said substrate stage in said first direction in such a manner that said first amount of positional displacement detected by said measuring device accompanying movement of said one stage is kept at a predetermined value; and a third drive system for relatively moving said mask and said photosensitive substrate in said second direction in such a manner that said second amount of positional displacement detected by said measuring device is kept at a predetermined value.
Claim 16
Independent Claim
270 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising: a projection optical system for projecting at least a portion of said original pattern on said photosensitive substrate; a mask stage supporting said mask and movable in a predetermined direction perpendicular to an optical axis of said projection optical system; a substrate stage supporting said photosensitive substrate and movable in said predetermined direction; a drive device for driving said mask stage and said substrate stage in synchronism with each other; wherein said mask is provided with a mask grating consisting of plural grating elements arranged in said predetermined direction over substantially the entire range of a forming area of said original pattern, and said photosensitive substrate is provided with a substrate grating consisting of plural grating elements arranged in said predetermined direction over substantially the entire area of said predetermined area; a measuring device for measuring an amount of positional displacement between said mask grating and said substrate grating in said predetermined direction, the measuring device including a light irradiation system which radiates two beams having a predetermined frequency difference on each of said mask grating and said substrate grating, and a photodetector which receives diffracted light produced from said mask grating and diffracted light produced from said substrate grating; and a regulator which changes frequency of at least one of said two beams according to a drive condition of said substrate stage and said mask stage when said original pattern is transferred to said predetermined area.
Claim 17
Independent Claim
270 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising: a projection optical system for projecting at least a portion of said original pattern on said photosensitive substrate; a mask stage supporting said mask and movable in a predetermined direction perpendicular to an optical axis of said projection optical system; a substrate stage supporting said photosensitive substrate and movable in said predetermined direction; a drive device for driving said mask stage and said substrate stage in synchronism with each other; wherein said mask is provided with a mask grating consisting of plural grating elements arranged in said predetermined direction over substantially the entire range of a forming area of said original pattern, and said photosensitive substrate is provided with a substrate grating consisting of plural grating elements arranged in said predetermined direction over substantially the entire area of said predetermined area; a measuring device for measuring an amount of positional displacement between said mask grating and said substrate grating in said predetermined direction, the measuring device including a light irradiation system which radiates two beams having a predetermined frequency difference on each of said mask grating and said substrate grating, and a photodetector which receives diffracted light produced from said mask grating and diffracted light produced from said substrate grating; and a regulator which changes frequency of at least one of said two beams according to a drive condition of said substrate stage and said mask stage when said original pattern is transferred to said predetermined area.
Claim 18
Dependent Claim
75 words
An apparatus according to claim 11, wherein said drive device includes a first drive system for moving one of said mask stage and said substrate stage at a constant speed in said predetermined direction and a second drive system for moving the other of said mask stage and said substrate stage in said predetermined direction on the basis of an amount of positional displacement detected by said measuring device accompanying movement of said one stage.
Claim 19
Dependent Claim
74 words
An apparatus according to claim 11, wherein said light irradiation system includes a light source producing a beam, a splitter for splitting the beam from said light source into two, and a frequency shifter for providing said predetermined frequency difference between said two split beams, and said regulator includes a drive circuit for driving said frequency shifter in such a manner that frequency of at least one of said two split beams is changed.
Claim 20
Dependent Claim
36 words
An apparatus according to claim 13, wherein said drive circuit drives said frequency shifter in such a manner that a frequency of a photoelectric signal produced from said photodetector becomes greater than said predetermined frequency difference.
Claim 21
Dependent Claim
74 words
An apparatus according to claim 11, wherein said light irradiation system includes a light source producing a beam, a splitter for splitting the beam from said light source into two, and two sets of frequency shifters disposed in each of optical paths of said two split beams and providing said predetermined frequency difference between said two beams, and said regulator includes a switching unit for changing over each of frequencies of said two beams.
Claim 22
Dependent Claim
32 words
An apparatus according to claim 15, wherein said regulator includes a driver unit for changing over said switching unit according to the moving direction of said mask stage or said substrate stage.
Claim 23
Independent Claim
178 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, wherein said mask is provided with a first grating formed over substantially the entire range of a forming area of said original pattern along a predetermined direction and said photosensitive substrate is provided with a second grating formed over substantially the entire range of said predetermined area along said predetermined direction, said apparatus comprising: a detector for detecting an amount of positional displacement between first and second gratings during movement of said mask and said photosensitive substrate, the detector including a light irradiation system for radiating two beams having a predetermined frequency difference on each of said first and second gratings and a photodetector for receiving diffracted light produced from said first grating and diffracted light produced from said second grating; and a regulator for changing frequency of at least one of said two beams according to movement conditions of said mask and said photosensitive substrate.
Claim 24
Independent Claim
178 words
An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, wherein said mask is provided with a first grating formed over substantially the entire range of a forming area of said original pattern along a predetermined direction and said photosensitive substrate is provided with a second grating formed over substantially the entire range of said predetermined area along said predetermined direction, said apparatus comprising: a detector for detecting an amount of positional displacement between first and second gratings during movement of said mask and said photosensitive substrate, the detector including a light irradiation system for radiating two beams having a predetermined frequency difference on each of said first and second gratings and a photodetector for receiving diffracted light produced from said first grating and diffracted light produced from said second grating; and a regulator for changing frequency of at least one of said two beams according to movement conditions of said mask and said photosensitive substrate.
Claim 25
Dependent Claim
45 words
An apparatus according to claim 17, further comprising a correction device for correcting a relative positional relation between said mask and said photosensitive substrate according to an amount of positional displacement detected by said detector during the movement of said mask and said photosensitive substrate.
Claim 26
Independent Claim
220 words
An apparatus for transferring an original pattern formed on a mask, onto a predetermined area on a photosensitive substrate, comprising: a projection optical system for projecting at least a part of said original pattern onto said photosensitive substrate; a mask stage carrying thereon said mask and being movable in a predetermined direction perpendicular to the axis of said projection optical system; a movable member for moving said mask, relative to the mask stage; a substrate stage for holding said photosensitive substrate so as to move the same in said predetermined direction; a first system for driving said mask stage and said substrate stage with a speed ratio in dependence upon a magnification of projection of said projection optical system; wherein said mask has a mask mark formed over a substantially entire range of an area where said original pattern is formed, along said predetermined direction, and said photosensitive substrate has a substrate mark formed over a substantially entire range of said predetermined area along said predetermined direction; a measuring device for measuring a relative positional deviation between said mask mark and said substrate mark; and a second system for driving said movable member so as to maintain said relative positional deviation measured by said measuring device at a predetermined value while said mask stage and said substrate stage are driven.
Claim 27
Independent Claim
220 words
An apparatus for transferring an original pattern formed on a mask, onto a predetermined area on a photosensitive substrate, comprising: a projection optical system for projecting at least a part of said original pattern onto said photosensitive substrate; a mask stage carrying thereon said mask and being movable in a predetermined direction perpendicular to the axis of said projection optical system; a movable member for moving said mask, relative to the mask stage; a substrate stage for holding said photosensitive substrate so as to move the same in said predetermined direction; a first system for driving said mask stage and said substrate stage with a speed ratio in dependence upon a magnification of projection of said projection optical system; wherein said mask has a mask mark formed over a substantially entire range of an area where said original pattern is formed, along said predetermined direction, and said photosensitive substrate has a substrate mark formed over a substantially entire range of said predetermined area along said predetermined direction; a measuring device for measuring a relative positional deviation between said mask mark and said substrate mark; and a second system for driving said movable member so as to maintain said relative positional deviation measured by said measuring device at a predetermined value while said mask stage and said substrate stage are driven.
Claim 28
Independent Claim
191 words
An apparatus for transferring an original pattern formed on a first substrate onto a predetermined area on a second substrate, comprising: a projection optical system for projecting at least a part of said original pattern onto said second substrate; a driving system for moving said first substrate and said second substrate along said predetermined direction with a speed ratio in dependence upon a magnification of projection of said projection optical system; a movable member for changing relative positional relationship between said first and second substrates, irrespective of movement by said drive system; wherein said first substrate has a first mask mark formed over a substantially entire range of an area where said original pattern is formed, along said predetermined direction, and said second substrate has a second mark formed over a substantially entire range of said predetermined area along said predetermined direction; a measuring device for measuring a relative positional deviation between said first and second marks; and a controller for controlling movement of said movable member so as to maintain said positional deviation measured by said measuring device at a predetermined value while said first and second substrates are moved.
Claim 29
Independent Claim
191 words
An apparatus for transferring an original pattern formed on a first substrate onto a predetermined area on a second substrate, comprising: a projection optical system for projecting at least a part of said original pattern onto said second substrate; a driving system for moving said first substrate and said second substrate along said predetermined direction with a speed ratio in dependence upon a magnification of projection of said projection optical system; a movable member for changing relative positional relationship between said first and second substrates, irrespective of movement by said drive system; wherein said first substrate has a first mask mark formed over a substantially entire range of an area where said original pattern is formed, along said predetermined direction, and said second substrate has a second mark formed over a substantially entire range of said predetermined area along said predetermined direction; a measuring device for measuring a relative positional deviation between said first and second marks; and a controller for controlling movement of said movable member so as to maintain said positional deviation measured by said measuring device at a predetermined value while said first and second substrates are moved.
Claim 30
Dependent Claim
62 words
An apparatus according to claim 20, wherein said measuring device includes a first stage which carries thereon said first substrate, and which is movable in said predetermined direction, and a second stage which carries thereon said second substrate, and which is movable in said predetermined direction; and said movable member is provided to at least one of said first and second stages.
Claim 31
Dependent Claim
59 words
An apparatus according to claim 21, wherein said movable member has a slightly movable stage which is provided to one of said first and second stages so as to hold one of said first and second substrates, which is loaded on said one of said first and second stages, for moving said one substrate, relative to said one stage.
Claim 32
Independent Claim
226 words
An apparatus for transferring an original pattern formed on a mask, onto a predetermined area on a photosensitive substrate, comprising: a projection optical system for projecting at least a part of said original pattern onto said photosensitive substrate; a mask stage carrying thereon said mask and being movable in a predetermined direction perpendicular to the axis of said optical system; a substrate stage for holding said photosensitive substrate, which is movable in said predetermined direction; wherein said mask has mask marks which are incorporated respectively to a plurality of partial patterns constituting said original pattern and arranged in said predetermined direction, and said photosensitive substrate has substrate marks which are incorporated respectively to a plurality of partial areas constituting the said predetermined area and arranged in said predetermined direction; a device for measuring a relative positional deviation between a mask mark incorporated to one of said plurality of partial patterns and a substrate mark incorporated to one of said plurality of partial areas, onto which said one of partial patterns is transferred; and a movable member for moving said mask and said photosensitive substrate, relative to each other, so as to maintain the positional deviation measured by said measuring device at a predetermined value, when said mask stage and said substrate stage are successively moved in order to transfer said original pattern onto said predetermined area.
Claim 33
Independent Claim
226 words
An apparatus for transferring an original pattern formed on a mask, onto a predetermined area on a photosensitive substrate, comprising: a projection optical system for projecting at least a part of said original pattern onto said photosensitive substrate; a mask stage carrying thereon said mask and being movable in a predetermined direction perpendicular to the axis of said optical system; a substrate stage for holding said photosensitive substrate, which is movable in said predetermined direction; wherein said mask has mask marks which are incorporated respectively to a plurality of partial patterns constituting said original pattern and arranged in said predetermined direction, and said photosensitive substrate has substrate marks which are incorporated respectively to a plurality of partial areas constituting the said predetermined area and arranged in said predetermined direction; a device for measuring a relative positional deviation between a mask mark incorporated to one of said plurality of partial patterns and a substrate mark incorporated to one of said plurality of partial areas, onto which said one of partial patterns is transferred; and a movable member for moving said mask and said photosensitive substrate, relative to each other, so as to maintain the positional deviation measured by said measuring device at a predetermined value, when said mask stage and said substrate stage are successively moved in order to transfer said original pattern onto said predetermined area.
Claim 34
Dependent Claim
80 words
A scanning exposure apparatus comprising: a measuring system for measuring a positional deviation between a mask and a substrate in a predetermined direction; a first driving system for moving one of said mask and said substrate at a constant speed in said predetermined direction during scanning exposure; and a second driving system for moving the other of said mask and said substrate in said predetermined direction dependent on a positional deviation detected by said measuring system during said scanning exposure.
Claim 35
Dependent Claim
80 words
A scanning exposure apparatus comprising: a measuring system for measuring a positional deviation between a mask and a substrate in a predetermined direction; a first driving system for moving one of said mask and said substrate at a constant speed in said predetermined direction during scanning exposure; and a second driving system for moving the other of said mask and said substrate in said predetermined direction dependent on a positional deviation detected by said measuring system during said scanning exposure.
Claim 36
Dependent Claim
57 words
An apparatus according to claim 24, wherein said measuring system includes an illumination system for radiating two beams on each of a first grating on said mask and a second grating on said substrate, a first photodetector which receives diffracted light from said first grating, and a second photodetector which receives diffracted light from said second grating.
Claim 37
Dependent Claim
39 words
An apparatus according to claim 25, wherein said measuring system includes a frequency shifter which provides a predetermined frequency difference between said two beams, and a detector which detects phase difference between signals from said first and second photodetectors.
Claim 38
Dependent Claim
73 words
A scanning exposure apparatus comprising: a measuring system for radiating two beams having a predetermined frequency difference on each of a first grating on a mask and a second grating on a substrate so as to detect a positional deviation between said first and second gratings during scanning exposure; and a regulator for changing frequency of at least one of said two beams according to scanning conditions of said mask and said substrate.
Claim 39
Dependent Claim
73 words
A scanning exposure apparatus comprising: a measuring system for radiating two beams having a predetermined frequency difference on each of a first grating on a mask and a second grating on a substrate so as to detect a positional deviation between said first and second gratings during scanning exposure; and a regulator for changing frequency of at least one of said two beams according to scanning conditions of said mask and said substrate.
References Cited (Backward Citations)
US5214489A
Cited
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