Patent US5504347A successfully refreshed from Google Patents.
← Back to Patent Explorer
US5504347A Expired / Lapsed US ⏱️ 0.0 years remaining

Lateral resonant tunneling device having gate electrode aligned with tunneling barriers

Assignee: Raytheon Co
•
Filing: 1994-10-17
•
Granted: 1996-04-02
•
Expires: 2014-10-17
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A resonant tunneling transistor (400) with lateral carrier transport through tunneling barriers (404, 408) grown as a refilling of trenches etched partially into a transverse quantum well (410) and defining a quantum wire or quantum dot (406). The fabrication methods include use of angled deposition to create overhangs at the top of openings which define sublithographic separations for tunneling barrier locations.

Inventors

  • 👤 Dejan Jovanovic
  • 👤 John N. Randall

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 20:23
CPC Classifications
H; H10; H10D; H10D30/00; B; B82; B82Y; B82Y10/00; H10D48/00; H10D48/01; H10D48/031; H10D48/032; H10D30/40; H10D62/00; H10D62/80; H10D62/85; H10D62/852

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 72 words
A lateral resonant tunneling structure, comprising: (a) a heterojunction with a semiconductor layer having a band edge offset from the corresponding band edge of an overlying material layer; (b) an electrode on said material layer and at least two tunneling barriers aligned to edges of said electrode and extending from said material layer into but not through said semiconductor layer; and (c) contacts to said semiconductor layer remote from said tunneling barriers.
Claim 2
Dependent Claim 72 words
A lateral resonant tunneling structure, comprising: (a) a heterojunction with a semiconductor layer having a band edge offset from the corresponding band edge of an overlying material layer; (b) an electrode on said material layer and at least two tunneling barriers aligned to edges of said electrode and extending from said material layer into but not through said semiconductor layer; and (c) contacts to said semiconductor layer remote from said tunneling barriers.
Claim 3
Dependent Claim 28 words
The lateral resonant tunneling structure of claim 1, wherein: (a) said semiconductor layer is a first III-V compound; and (b) said material layer is a second III-V compound.
Claim 4
Dependent Claim 41 words
The lateral resonant tunneling structure of claim 2, wherein: (a) said material layer includes (i) a first sublayer abutting said semiconductor layer and including said tunneling barriers and (ii) a second sublayer containing dopants whereby said semiconductor layer is modulation doped.
Claim 5
Dependent Claim 23 words
The lateral resonant tunneling structure of claim 1, wherein: (a) said semiconductor layer is silicon; and (b) said material layer is a dielectric.
Claim 6
Dependent Claim 16 words
The lateral resonant tunneling structure of claim 4, wherein: (a) said tunneling barriers have (111)-oriented sidewalls.

References Cited (Backward Citations)

US4912531A Cited
US5198879A Cited
US5283445A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1999-04-02 1999-10-02 2000-04-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2003-04-02 2003-10-02 2004-04-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2007-04-02 2007-10-02 2008-04-02 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag