Bipolar transistor having reduced base-collector capacitance while maintaining improved cut-off frequency

Claim 2

A semiconductor device, comprising: a single crystal silicon substrate of one conduction type, which has selectively on its surface a buried layer of reverse conduction type, at least part of the top surface of which is covered by a silicon epitaxial layer of reverse conduction type; a first silicon oxide film which is provided on the surface of said single crystal silicon substrate and which has a first opening which reaches said silicon epitaxial layer; a silicon nitride film which is provided on the surface of said first silicon oxide film, and which has a second opening which is connected to said first opening and is of a form enclosing said first opening; a second silicon oxide film which is provided on said silicon nitride film, and which has a third opening which is connected to said second opening and has substantially the same shape as said first opening; a base drawing electrode which is provided on the surface of said second silicon oxide film at least in the vicinity of said third opening, which base drawing electrode has a protrusion of a prescribed width extending from an end of said third opening and has a fourth opening of a form such that said fourth opening is enclosed by said third opening, at least a bottom layer of said base drawing electrode comprises a first polycrystalline semiconductor film of one conduction type; a third silicon oxide film which directly covers said base drawing electrode and which has said fourth opening; a first spacer comprising a fourth silicon oxide film which directly covers a side surface of said third silicon oxide film and a side surface of said base drawing electrode, which constitute a side wall of said fourth opening; a second polycrystalline semiconductor film of one conduction type, which is provided inside said second opening with a prescribed width, which said second polycrystalline semiconductor film directly covers a lower surface of said second silicon oxide film and a top surface of said first silicon oxide film which are exposed by said second opening, and which said second polycrystalline semiconductor film directly covers a side surface of said silicon nitride film constituting a side wall of said second opening; a third polycrystalline semiconductor film of one conduction type, which is connected directly to a lower surface of said first polycrystalline semiconductor film which is exposed by said third opening, which said third polycrystalline semiconductor film directly covers a side surface of said second silicon oxide film constituting a side wall of said third opening, and which is directly connected to a top surface of said second polycrystalline semiconductor film which is exposed by said third opening, and part of a side surface of said second polycrystalline semiconductor film which is exposed inside said second opening; a first single crystal semiconductor layer of one conduction type, which is directly connected to a top surface of said silicon epitaxial layer which is exposed by said first opening, which said first single crystal semiconductor layer is directly connected to at least a lower surface of said third polycrystalline semiconductor film and to said second polycrystalline semiconductor film, and which fills at least part of said first opening; a second spacer comprising a fifth silicon oxide film which directly covers at least part of a side surface of said first spacer, a lower surface of said first spacer which is exposed by said third opening, and a side surface of said third polycrystalline semiconductor film which is exposed at least inside said second opening and said third opening, and which second spacer directly covers part of a top surface of said first single crystal semiconductor layer which is exposed inside said second opening; and a second single crystal semiconductor layer of reverse conduction type which directly covers at least part of a side surface of said second spacer and which is directly connected to the top surface of said first single crystal semiconductor layer which is not covered by said second spacer.

Claim 3

The semiconductor device as set forth in claim 1, wherein said first and second single crystal semiconductor layers and said first, second and third polycrystalline semiconductor films are made of silicon.

Claim 4

The semiconductor device as set forth in claim 1, wherein said second single crystal semiconductor layer and said first and second polycrystalline semiconductor films are made of silicon, and said first single crystal semiconductor layer and said third polycrystalline semiconductor film are made of silicon-germanium.

Claim 5

The semiconductor device as set forth in claim 1, wherein said base drawing electrode comprises said first polycrystalline semiconductor film and a high melting point metal silicide film which is directly connected to the top surface of said first polycrystalline semiconductor film.

Claim 6

The semiconductor device as set forth in claim 2, wherein said base drawing electrode comprises said first polycrystalline semiconductor film and a high melting point metal silicide film which is directly connected to the top surface of said first polycrystalline semiconductor film.

Claim 7

The semiconductor device as set forth in claim 3, wherein said base drawing electrode comprises said first polycrystalline semiconductor film and a high melting point metal silicide film which is directly connected to the top surface of said first polycrystalline semiconductor film.

Claim 8

A semiconductor device, comprising: a single crystal silicon substrate of one conduction type, which has selectively on its surface a buried layer of reverse conduction type, at least part of the surface of which is covered by a silicon epitaxial layer of reverse conduction type; a first silicon oxide film which is provided on the surface of said single crystal silicon substrate and which has at its bottom surface a first opening which reaches said silicon epitaxial layer and has at its top surface a second opening which is connected to said first opening and has a form enclosing said first opening; a silicon nitride film which is provided on the top surface of said first silicon oxide film and which has a third opening which is connected to said second opening and has a form such that it is enclosed by said second opening; a second silicon oxide film which is provided on a surface of said silicon nitride film and which has a fourth opening which is connected to said third opening and has substantially the same shape as said second opening; a base drawing electrode which is provided on a surface of said second silicon oxide film at least in the vicinity of said fourth opening, which base drawing electrode has a protrusion of a prescribed width extending from an end of said fourth opening and has a fifth opening of a form such that said fifth opening is enclosed by said third opening, at least a bottom layer of said base drawing electrode comprises a first polycrystalline semiconductor film of one conduction type; a third silicon oxide film which directly covers said base drawing electrode and which has said fifth opening; a first spacer comprising a fourth silicon oxide film which directly covers a side surface of said third silicon oxide film and a side surface of said base drawing electrode, which constitute a side wall of said fifth opening; a second polycrystalline semiconductor film of one conduction type, which is provided inside said second, said third and said fourth openings immediately below a lower surface of said first polycrystalline semiconductor film which is exposed by said fourth opening, and which second polycrystalline semiconductor film directly covers the top surface and a side surface of said first silicon oxide film which is exposed by said second opening, and a lower surface of said silicon nitride film, and a side surface of said silicon nitride film constituting a side wall of said third opening, and a top surface of said silicon nitride film which is exposed by said fourth opening, and a side surface of said second silicon oxide film constituting a side wall of said fourth opening, and which said second polycrystalline semiconductor film is directly connected to the lower surface of said first polycrystalline semiconductor film which is exposed by said fourth opening; a third polycrystalline semiconductor film of one conduction type, which directly covers part of the side surface of said first silicon oxide film constituting a side wall of said first opening and at least part of a lower surface of said first spacer, and which third polycrystalline semiconductor film is directly connected to a side surface of said second polycrystalline semiconductor film and a lower surface of said second polycrystalline semiconductor film which is exposed by said first opening; a first single crystal semiconductor layer of one conduction type, which is directly connected to a lower surface of said third polycrystalline semiconductor film and a top surface of said silicon epitaxial layer which is exposed by said first opening, and which first single crystal semiconductor layer fills part of said first opening; a second spacer comprising a fifth silicon oxide film which directly covers at least part of a side surface of said first spacer, a lower surface of said first spacer which is exposed by said fourth opening and is not covered by said third polycrystalline semiconductor film, a side surface of said third polycrystalline semiconductor film, and part of a top surface of said first single crystal semiconductor layer which is exposed inside said first opening; and a second single crystal semiconductor layer of reverse conduction type which directly covers at least part of a side surface of said second spacer and which is directly connected to the top surface of said first single crystal semiconductor layer which is exposed inside said first opening and is not covered by said second spacer.

Claim 9

A semiconductor device, comprising: a single crystal silicon substrate of one conduction type, which has selectively on its surface a buried layer of reverse conduction type, at least part of the surface of which is covered by a silicon epitaxial layer of reverse conduction type; a first silicon oxide film which is provided on the surface of said single crystal silicon substrate and which has at its bottom surface a first opening which reaches said silicon epitaxial layer and has at its top surface a second opening which is connected to said first opening and has a form enclosing said first opening; a silicon nitride film which is provided on the top surface of said first silicon oxide film and which has a third opening which is connected to said second opening and has a form such that it is enclosed by said second opening; a second silicon oxide film which is provided on a surface of said silicon nitride film and which has a fourth opening which is connected to said third opening and has substantially the same shape as said second opening; a base drawing electrode which is provided on a surface of said second silicon oxide film at least in the vicinity of said fourth opening, which base drawing electrode has a protrusion of a prescribed width extending from an end of said fourth opening and has a fifth opening of a form such that said fifth opening is enclosed by said third opening, at least a bottom layer of said base drawing electrode comprises a first polycrystalline semiconductor film of one conduction type; a third silicon oxide film which directly covers said base drawing electrode and which has said fifth opening; a first spacer comprising a fourth silicon oxide film which directly covers a side surface of said third silicon oxide film and a side surface of said base drawing electrode, which constitute a side wall of said fifth opening; a second polycrystalline semiconductor film of one conduction type, which is provided inside said second, said third and said fourth openings immediately below a lower surface of said first polycrystalline semiconductor film which is exposed by said fourth opening, and which second polycrystalline semiconductor film directly covers the top surface and a side surface of said first silicon oxide film which is exposed by said second opening, and a lower surface of said silicon nitride film, and a side surface of said silicon nitride film constituting a side wall of said third opening, and a top surface of said silicon nitride film which is exposed by said fourth opening, and a side surface of said second silicon oxide film constituting a side wall of said fourth opening, and which said second polycrystalline semiconductor film is directly connected to the lower surface of said first polycrystalline semiconductor film which is exposed by said fourth opening; a third polycrystalline semiconductor film of one conduction type, which directly covers part of the side surface of said first silicon oxide film constituting a side wall of said first opening and at least part of a lower surface of said first spacer, and which third polycrystalline semiconductor film is directly connected to a side surface of said second polycrystalline semiconductor film and a lower surface of said second polycrystalline semiconductor film which is exposed by said first opening; a first single crystal semiconductor layer of one conduction type, which is directly connected to a lower surface of said third polycrystalline semiconductor film and a top surface of said silicon epitaxial layer which is exposed by said first opening, and which first single crystal semiconductor layer fills part of said first opening; a second spacer comprising a fifth silicon oxide film which directly covers at least part of a side surface of said first spacer, a lower surface of said first spacer which is exposed by said fourth opening and is not covered by said third polycrystalline semiconductor film, a side surface of said third polycrystalline semiconductor film, and part of a top surface of said first single crystal semiconductor layer which is exposed inside said first opening; and a second single crystal semiconductor layer of reverse conduction type which directly covers at least part of a side surface of said second spacer and which is directly connected to the top surface of said first single crystal semiconductor layer which is exposed inside said first opening and is not covered by said second spacer.

Claim 10

The semiconductor device as set forth in claim 7, wherein said first and second single crystal semiconductor layers and said first, second and third polycrystalline semiconductor films are made of silicon.

Claim 11

The semiconductor device as set forth in claim 7, wherein said second single crystal semiconductor layer and said first and second polycrystalline semiconductor films are made of silicon, and said first single crystal semiconductor layer and said third polycrystalline semiconductor film are made of silicon-germanium.

Claim 12

The semiconductor device as set forth in claim 7, wherein said base drawing electrode comprises said first polycrystalline semiconductor film and a high melting point metal silicide film which is directly connected to a top surface of said first polycrystalline semiconductor film.

Claim 13

The semiconductor device as set forth in claim 8, wherein said base drawing electrode comprises said first polycrystalline semiconductor film and a high melting point metal silicide film which is directly connected to a top surface of said first polycrystalline semiconductor film.

Claim 14

The semiconductor device as set forth in claim 9, wherein said base drawing electrode comprises said first polycrystalline semiconductor film and a high melting point metal silicide film which is directly connected to a top surface of said first polycrystalline semiconductor film.