Polymer core optical wave-guide and fabrication method thereof

Claim 2

A polymer core optical wave-guide which comprises a substrate, a buffer layer formed on the surface of the substrate made of a SiO x N y H z film wherein 0.72=x<1; 0<y≦0.25; 0<z≦0.03, of desirable thickness having a refractive index of n b , an approximately rectangle-shaped core formed on the buffer layer made of a polymer material having a refractive index of n w (n w >n b ), a cladding layer covering the surfaces of the buffer layer and the core having a refractive index of n c (n c <n w ).

Claim 3

A polymer core optical wave-guide according to claim 1, wherein the cladding layer is made of a SiO x N y H z film.

Claim 4

A polymer core optical wave-guide according to claim 1, wherein the cladding layer is made of a polymer material.

Claim 5

A polymer core optical wave-guide according to claim 1, wherein a thin SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03), is formed between the upper surface of the core and the cladding layer.

Claim 6

A polymer core optical wave-guide according to claim 1, wherein an indented shaped portion is formed on the surface of the substrate, a buffer layer of SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03), being formed on the surface of the substrate, a core made of a polymer material being embedded in the indented portion of the buffer layer, the buffer layer and the surface of the core being covered with a cladding layer.

Claim 7

A polymer core optical wave-guide according to claim 1, wherein the core is made of a polymer material selected from the group consisting of polyimide, polycarbonate, polymethacrylic acid methyl and polystyrene.

Claim 8

A polymer core optical wave-guide according to claim 1, wherein the approximately rectangular-shaped core has at least one of core patterns selected from the group consisting of straight line, curved line, S-shaped curved line, ring-shaped line and, parallel lines.

Claim 9

A polymer core optical wave-guide according to claim 1, wherein the substrate is made of a material selected from the group of semiconductor, dielectric material, magnetic material.

Claim 10

A polymer core optical wave-guide according to claim 1, wherein the substrate is made of a material selected from the group consisting of semiconductor material, dielectric material, and magnetic material.

Claim 11

A polymer core optical wave-guide according to claim 1, which comprises a second cladding layer on the cladding layer made of a material selected from the group consisting of SiO 2 glass, and SiO 2 glass containing at least one kind of additives for controlling refractive index.

Claim 12

A fabrication method of polymer core optical wave-guide, comprising the steps of: forming layers on the surface of a substrate in the order of a buffer layer of SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03) a core layer of polymer material, a mask layer of SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03), forming a photoresist pattern on the mask layer of SiO x N y H z film through photo-lithography, patterning the mask layer of SiO x N y H z film using the photoresist pattern as a mask through dry etching, etching the polymer layer using the SiO x N y H z mask pattern as a mask through dry etching, and covering the surface of the dry etched polymer core with a cladding layer.

Claim 13

A fabrication method of polymer core optical wave-guide, comprising the steps of: forming layers on the surface of a substrate in the order of a buffer layer of SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03) a core layer of polymer material, a mask layer of SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03), forming a photoresist pattern on the mask layer of SiO x N y H z film through photo-lithography, patterning the mask layer of SiO x N y H z film using the photoresist pattern as a mask through dry etching, etching the polymer layer using the SiO x N y H z mask pattern as a mask through dry etching, and covering the surface of the dry etched polymer core with a cladding layer.

Claim 14

A fabrication method of polymer core optical wave-guide according to claim 11, which comprises a process for forming a second cladding layer on the cladding layer made of a material selected from the group consisting of SiO 2 , and SiO 2 containing at least one kind of additives for controlling refractive index.

Claim 15

A fabrication method of polymer core optical wave-guide according to claim 11, wherein the core contains at least one of core patterns selected from the group consisting of straight line, curved line, S-shaped curved line, ring-shaped line, and parallel lines.

Claim 16

A fabrication method of polymer core optical wave-guide comprising the steps of: forming an indented shaped portion on the surface of a substrate, forming a buffer layer of SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03) on the substrate, forming a core layer of polymer material in the indented portion corresponding to the indented portion of the buffer layer, forming a mask layer of SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03), on the buffer layer and the surface of the core, the mask layer of SiO x N y H z film serving as a part of a cladding layer, forming a photoresist pattern on the mask layer of SiO x N y H.sub. film through photo-lithography, patterning the mask layer of SiO x N y H z film using the photoresist pattern as a mask through dry etching, etching the polymer layer using the SiO x N y H z mask pattern as a mask through dry etching, and covering the surface of the dry etched polymer core with a cladding layer.

Claim 17

A fabrication method of polymer core optical wave-guide comprising the steps of: forming an indented shaped portion on the surface of a substrate, forming a buffer layer of SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03) on the substrate, forming a core layer of polymer material in the indented portion corresponding to the indented portion of the buffer layer, forming a mask layer of SiO x N y H z film, wherein (0.72≦x<1; 0<y≦0.25; 0<z≦0.03), on the buffer layer and the surface of the core, the mask layer of SiO x N y H z film serving as a part of a cladding layer, forming a photoresist pattern on the mask layer of SiO x N y H.sub. film through photo-lithography, patterning the mask layer of SiO x N y H z film using the photoresist pattern as a mask through dry etching, etching the polymer layer using the SiO x N y H z mask pattern as a mask through dry etching, and covering the surface of the dry etched polymer core with a cladding layer.

Claim 18

A fabrication method of polymer core optical wave-guide according to claim 14, which comprises a process for forming a second cladding layer on the cladding layer made of a material selected from the group consisting of SiO 2 , SiO 2 containing at least one kind of additives for controlling refractive index.

Claim 19

A fabrication method of polymer core optical wave-guide according to claim 14, wherein the core contains at least one of core patterns selected from the group consisting of straight line, curved line, and S-shaped curved line, ring-shaped line, parallel lines.