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US5482602A
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Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces
Assignee: RTX Corp
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Filing: 1993-11-04
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Granted: 1996-01-09
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Expires: 2013-11-04
Abstract
Abstract One broad-beam ion deposition coating method (10) for depositing diamond-like-carbon (DLC) coatings (124) on the dynamic surfaces (120S) of articles (120) subject to adherence difficulties includes the steps of: (12) preliminarily conditioning the dynamic surface (120S) for broad-beam ion deposition; (14)inserting the article (120) in a deposition chamber (102); (16) evacuating the deposition chamber (102) to a predetermined base pressure; (18) ion sputtering conditioning of the dynamic surface (120) by ionizing an inert gas to form an ion beam (104B) having a predetermined beam current density and accelerating energy and directing the ion beam (104B) onto the dynamic surface; (20) depositing an interface layer (122) on the dynamic surface (120S) by ionizing a first gas to form an ion beam (104B) having a predetermined beam current density and accelerating energy, and directing the ion beam (104B) onto a target (118) to dislodge atoms therefrom, the dislodged atoms depositing on the dynamic surface (120S) to form the interface layer (122); and (22) depositing a DLC coating (124) on the interface layer (122) by ionizing a carbon-based gas to form an ion beam (104B) having a predetermined beam current density and accelerating energy and directing the ion beam (104B) for deposition of carbon ions (C+) onto the interface layer (122) to form the DLC coating (124) thereon.
Inventors
- 👤 Clark V. Cooper
- 👤 Charles J. Isabelle
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:26
CPC Classifications
F; F16; F16C; F16C33/00; C; C23; C23C; C23C14/00; C23C14/06; C23C14/0605; C23C14/22; C23C14/221
Claims Analysis
Total Claims: 44
Claim 1
Independent Claim
427 words
A broad-beam ion deposition coating method for depositing a diamond-like-carbon coating indirectly to a dynamic surface of an article subject to adherence difficulties utilizing a broad-beam ion deposition apparatus, the broad-beam ion deposition apparatus including a deposition chamber, a broad-beam ion gun operative to generate an ion beam having a trajectory, vacuum means for evacuating the deposition chamber, gas supply means for supplying gas to the broad-beam ion gun and the deposition chamber, and a target interposable between the broad-beam ion gun and the dynamic surface, comprising the steps of: (A) preliminarily conditioning the-dynamic surface of the article for broad-beam ion deposition; (B) inserting the conditioned article within the deposition chamber wherein the dynamic surface is spatially orientated at a predetermined trajectory angle with respect to the ion beam trajectory; (C) evacuating the; deposition chamber to a predetermined base pressure utilizing the vacuum means; (D) ion sputtering conditioning the dynamic surface of the article for broad-beam ion deposition by (D1) providing a sputtering gas to the broad-beam ion gun utilizing the gas supply means, (D2) operating the broad-beam ion gun to ionize the sputtering gas to generate a sputtering ion beam having a predetermined beam current density, and (D3) accelerating the sputtering ion beam at a predetermined accelerating energy towards the dynamic surface wherein impact of the accelerated sputtering ion beam with the dynamic surface effectuates sputter cleaning thereof. (E) depositing an interface layer having a predetermined thickness on the dynamic surface by (E1) providing a first gas to the broad-beam ion gun utilizing the gas supply means, (E2) operating the broad-beam ion gun to ionize the first gas to generate a first ion beam having a predetermined beam current density, and (E3) accelerating the first ion beam towards the target at a predetermined accelerating energy to dislodge atoms therefrom, the dislodged atoms being deposited on the dynamic surface to form the interface layer on the dynamic surface; and (F) depositing a diamond-like-carbon coating having a predetermined thickness on the interface layer deposited on the dynamic surface by (F1) providing a carbon-based gas to the broad-beam ion gun utilizing the gas supply means, (F2) operating the broad-beam ion gun to ionize the carbon-based gas to generate a second ion beam that includes carbon ions, the second ion beam having a predetermined beam current density, and (F3) accelerating the second ion beam towards the dynamic surface at a predetermined accelerating energy wherein the carbon ions of the second ion beam are deposited on the interface layer to form the diamond-like-carbon coating for the dynamic surface of the article.
Claim 2
Dependent Claim
427 words
A broad-beam ion deposition coating method for depositing a diamond-like-carbon coating indirectly to a dynamic surface of an article subject to adherence difficulties utilizing a broad-beam ion deposition apparatus, the broad-beam ion deposition apparatus including a deposition chamber, a broad-beam ion gun operative to generate an ion beam having a trajectory, vacuum means for evacuating the deposition chamber, gas supply means for supplying gas to the broad-beam ion gun and the deposition chamber, and a target interposable between the broad-beam ion gun and the dynamic surface, comprising the steps of: (A) preliminarily conditioning the-dynamic surface of the article for broad-beam ion deposition; (B) inserting the conditioned article within the deposition chamber wherein the dynamic surface is spatially orientated at a predetermined trajectory angle with respect to the ion beam trajectory; (C) evacuating the; deposition chamber to a predetermined base pressure utilizing the vacuum means; (D) ion sputtering conditioning the dynamic surface of the article for broad-beam ion deposition by (D1) providing a sputtering gas to the broad-beam ion gun utilizing the gas supply means, (D2) operating the broad-beam ion gun to ionize the sputtering gas to generate a sputtering ion beam having a predetermined beam current density, and (D3) accelerating the sputtering ion beam at a predetermined accelerating energy towards the dynamic surface wherein impact of the accelerated sputtering ion beam with the dynamic surface effectuates sputter cleaning thereof. (E) depositing an interface layer having a predetermined thickness on the dynamic surface by (E1) providing a first gas to the broad-beam ion gun utilizing the gas supply means, (E2) operating the broad-beam ion gun to ionize the first gas to generate a first ion beam having a predetermined beam current density, and (E3) accelerating the first ion beam towards the target at a predetermined accelerating energy to dislodge atoms therefrom, the dislodged atoms being deposited on the dynamic surface to form the interface layer on the dynamic surface; and (F) depositing a diamond-like-carbon coating having a predetermined thickness on the interface layer deposited on the dynamic surface by (F1) providing a carbon-based gas to the broad-beam ion gun utilizing the gas supply means, (F2) operating the broad-beam ion gun to ionize the carbon-based gas to generate a second ion beam that includes carbon ions, the second ion beam having a predetermined beam current density, and (F3) accelerating the second ion beam towards the dynamic surface at a predetermined accelerating energy wherein the carbon ions of the second ion beam are deposited on the interface layer to form the diamond-like-carbon coating for the dynamic surface of the article.
Claim 3
Dependent Claim
34 words
The method of claim 1 wherein the predetermined beam current density of the first ion beam of step (F2) is within the range of about 1.5 mA/cm 2 to about 3.5 mA/cm 2 .
Claim 4
Dependent Claim
25 words
The method of claim 1 wherein the predetermined beam current density of the first ion beam of step (E2) is about 2.5 mA/cm 2 .
Claim 5
Dependent Claim
30 words
The method of claim 1 where the predetermined accelerating energy for the first ion beam of step (E3) is within the range of about 1.00 keV to about 1.20 keV.
Claim 6
Dependent Claim
22 words
The method of claim 1 where the predetermined accelerating energy for the first ion beam of step (E3) is about 1.05 keV.
Claim 7
Dependent Claim
34 words
The method of claim 1 wherein the predetermined beam current density of the second ion beam of step (F2) is within the range of about 1.5 mA/cm 2 to about 3.5 mA/cm 2 .
Claim 8
Dependent Claim
25 words
The method of claim 1 wherein the predetermined beam current density of the second ion beam of step (F2) is about 2.5 mA/cm 2 .
Claim 9
Dependent Claim
30 words
The method of claim 1 where the predetermined accelerating energy for the second ion beam of step (F3) is within the range of about 200 eV to about 1000 eV.
Claim 10
Dependent Claim
30 words
The method of claim 1 where the predetermined accelerating energy for the second ion beam of step (F3) is within the range of about 450 eV to about 700 eV.
Claim 11
Dependent Claim
22 words
The method of claim 1 where the predetermined accelerating energy for the second ion beam of step (F3) is about 450 eV.
Claim 12
Dependent Claim
39 words
The method of claim 1 wherein the first gas supplied in step (E1) is argon gas and wherein the target is formed of silicon such that the interface layer deposited on the dynamic surface is a silicon interface layer.
Claim 13
Dependent Claim
47 words
The method of claim 1 wherein step (E1) further includes providing methane gas at a predetermined partial pressure to the deposition chamber, and further wherein the target is formed from silicon such that the interface layer deposited on the dynamic surface is an amorphous silicon:carbon:hydrogen interface layer.
Claim 14
Dependent Claim
23 words
The method of claim 1 wherein the predetermined partial pressure of the methane gas provided in step (E1) is about 1.5×10 -4 torr.
Claim 15
Dependent Claim
33 words
The method of claim 1 wherein the predetermined thickness of the interface layer deposited on the dynamic surface in step (E3) is within the range of about 0.10 μm to about 0.15 μm.
Claim 16
Dependent Claim
33 words
The method of claim 1 wherein the predetermined thickness of the diamond-like-carbon coating deposited to the interface layer in step (F3) is within the range of about 0.50 μm to about 2.0 μm.
Claim 17
Dependent Claim
33 words
The method of claim 1 wherein the predetermined thickness of the diamond-like-carbon coating deposited to the interface layer in step (F3) is within the range of about 0.70 μm to about 1.5 μm.
Claim 18
Dependent Claim
34 words
The method of claim 1 wherein the predetermined beam current density of the sputtering ion beam of step (D2) is within the range of about 1.5 mA/cm 2 to about 3.5 mA/cm 2 .
Claim 19
Dependent Claim
25 words
The method of claim 1 wherein the predetermined beam current density of the sputtering ion beam of step (D2) is about 2.5 mA/cm 2 .
Claim 20
Dependent Claim
30 words
The method of claim 1 wherein the predetermined accelerating energy of the sputtering ion beam of step (D3) is within the range of about 1.00 keV to about 1.20 keV.
Claim 21
Dependent Claim
22 words
The method of claim 1 wherein the predetermined accelerating energy of the sputtering ion beam of step (D3) is about 1.05 keV.
Claim 22
Dependent Claim
25 words
The method of claim 1 wherein the predetermined base pressure of the evacuated deposition chamber in step (C) is not greater than 3×10 -5 torr.
Claim 23
Dependent Claim
23 words
The method of claim 1 wherein the predetermined base pressure of the evacuated deposition chamber in step (C) is about 2.5×10 -5 torr.
Claim 24
Dependent Claim
21 words
The method of claim 1 wherein the preliminary conditioning step (A) comprises mechanically preparing the dynamic surface for broad-beam ion deposition.
Claim 25
Dependent Claim
22 words
The method of claim 1 wherein the preliminary conditioning step (A) comprises chemical cleaning of the dynamic surface for broad-beam ion deposition.
Claim 26
Dependent Claim
37 words
The method of claim 1 wherein the preliminary conditioning step (A) comprises the substeps of: (A1) mechanically conditioning of the dynamic surface for broad-beam ion deposition; and (A2) chemically cleaning the dynamic surface for broad-beam ion deposition.
Claim 27
Dependent Claim
334 words
A broad-beam ion deposition coating method for depositing a diamond-like-carbon coating directly to a dynamic surface of an article not subject to adherence difficulties utilizing a broad-beam ion deposition apparatus, the broad-beam ion deposition apparatus including a deposition chamber, a broad-beam ion gun operative to generate an ion beam having a trajectory, vacuum means for evacuating the deposition chamber, and gas supply means for supplying gas to the broad-beam ion gun and the deposition chamber, comprising the steps of: (A) preliminarily conditioning the dynamic surface of the article for broad-beam ion deposition; (B) inserting the conditioned article within the deposition chamber wherein the dynamic surface is spatially orientated at a predetermined trajectory angle with respect to the ion beam trajectory; (C) evacuating the deposition chamber to a predetermined base pressure utilizing the vacuum means; (D) ion sputtering conditioning the dynamic surface of the article for broad-beam ion deposition by (D1) providing a sputtering gas to the broad-beam ion gun utilizing the gas supply means, (D2) operating the broad-beam ion gun to ionize the sputtering gas to generate a sputtering ion beam having a predetermined beam current density, and (D3) accelerating the sputtering ion beam at a predetermined accelerating energy towards the dynamic surface wherein impact of the accelerated sputtering ion beam with the dynamic surface effectuates sputter cleaning thereof; and (E) depositing a diamond-like-carbon coating having a predetermined thickness to the dynamic surface by (E1) providing a carbon-based gas to the broad-beam ion gun utilizing the gas supply means, (E1) providing a carbon-based gas to the broad-beam ion gun utilizing the gas supply means, (E2) operating the broad-beam ion gun to ionize the carbon-based gas to generate an ion beam that includes carbon ions, the ion beam having a predetermined beam current density, and (E3) accelerating the ion beam towards the dynamic surface at a predetermined accelerating energy wherein the carbon ions of the ion beam are deposited on the dynamic surface to form the diamond-like-carbon coating for the dynamic surface of the article.
Claim 28
Dependent Claim
334 words
A broad-beam ion deposition coating method for depositing a diamond-like-carbon coating directly to a dynamic surface of an article not subject to adherence difficulties utilizing a broad-beam ion deposition apparatus, the broad-beam ion deposition apparatus including a deposition chamber, a broad-beam ion gun operative to generate an ion beam having a trajectory, vacuum means for evacuating the deposition chamber, and gas supply means for supplying gas to the broad-beam ion gun and the deposition chamber, comprising the steps of: (A) preliminarily conditioning the dynamic surface of the article for broad-beam ion deposition; (B) inserting the conditioned article within the deposition chamber wherein the dynamic surface is spatially orientated at a predetermined trajectory angle with respect to the ion beam trajectory; (C) evacuating the deposition chamber to a predetermined base pressure utilizing the vacuum means; (D) ion sputtering conditioning the dynamic surface of the article for broad-beam ion deposition by (D1) providing a sputtering gas to the broad-beam ion gun utilizing the gas supply means, (D2) operating the broad-beam ion gun to ionize the sputtering gas to generate a sputtering ion beam having a predetermined beam current density, and (D3) accelerating the sputtering ion beam at a predetermined accelerating energy towards the dynamic surface wherein impact of the accelerated sputtering ion beam with the dynamic surface effectuates sputter cleaning thereof; and (E) depositing a diamond-like-carbon coating having a predetermined thickness to the dynamic surface by (E1) providing a carbon-based gas to the broad-beam ion gun utilizing the gas supply means, (E1) providing a carbon-based gas to the broad-beam ion gun utilizing the gas supply means, (E2) operating the broad-beam ion gun to ionize the carbon-based gas to generate an ion beam that includes carbon ions, the ion beam having a predetermined beam current density, and (E3) accelerating the ion beam towards the dynamic surface at a predetermined accelerating energy wherein the carbon ions of the ion beam are deposited on the dynamic surface to form the diamond-like-carbon coating for the dynamic surface of the article.
Claim 29
Dependent Claim
33 words
The method of claim 26 wherein the predetermined beam current density of the ion beam of step (E2) is within the range of about 1.5 mA/cm 2 to about 3.5 mA/cm 2 .
Claim 30
Dependent Claim
24 words
The method of claim 26 wherein the predetermined beam current density of the ion beam of step (E2) is about 2.5 mA/cm 2 .
Claim 31
Dependent Claim
29 words
The method of claim 26 wherein the predetermined accelerating energy for the ion beam of step (E3) is within the range of about 200 eV to about 1000 eV.
Claim 32
Dependent Claim
29 words
The method of claim 26 wherein the predetermined accelerating energy for the ion beam of step (E3) is within the range of about 450 eV to about 700 eV.
Claim 33
Dependent Claim
21 words
The method of claim 26 wherein the predetermined accelerating energy for the ion beam of step (E3) is about 450 eV.
Claim 34
Dependent Claim
33 words
The method of claim 26 wherein the predetermined thickness of the diamond-like-carbon coating deposited on the dynamic surface in step (E3) is within the range of about 0.50 μm to about 2.0 μm.
Claim 35
Dependent Claim
33 words
The method of claim 26 wherein the predetermined thickness of the diamond-like-carbon coating deposited on the dynamic surface in step (E3) is within the range of about 0.70 μm to about 1.5 μm.
Claim 36
Dependent Claim
34 words
The method of claim 26 wherein the predetermined beam current density of the sputtering ion beam of step (D2) is within the range of about 1.5 mA/cm 2 to about 3.5 mA/cm 2 .
Claim 37
Dependent Claim
25 words
The method of claim 26 wherein the predetermined beam current density of the sputtering ion beam of step (D2) is about 2.5 mA/cm 2 .
Claim 38
Dependent Claim
30 words
The method of claim 26 wherein the predetermined accelerating energy of the sputtering ion beam of step (D3) is within the range of about 1.00 keV to about 1.20 keV.
Claim 39
Dependent Claim
22 words
The method of claim 26 wherein the predetermined accelerating energy of the sputtering ion beam of step (D3) is about 1.05 keV.
Claim 40
Dependent Claim
25 words
The method of claim 26 wherein the predetermined base pressure of the evacuated deposition chamber in step (C) is not greater than 3×10 -5 torr.
Claim 41
Dependent Claim
23 words
The method of claim 26 wherein the predetermined base pressure of the evacuated deposition chamber in step (C) is about 2.5×10 -5 torr.
Claim 42
Dependent Claim
21 words
The method of claim 26 wherein the preliminary conditioning step (A) comprises mechanically conditioning the dynamic surface for broad-beam ion deposition.
Claim 43
Dependent Claim
22 words
The method of claim 26 wherein the preliminary conditioning step (A) comprises chemical cleaning of the dynamic surface for broad-beam ion deposition.
Claim 44
Dependent Claim
36 words
The method of claim 26 wherein the preliminary conditioning step (A) comprises the substeps of: (A1) mechanically conditioning the dynamic surface for broad-beam ion deposition; and (A2) chemically cleaning the dynamic surface for broad-beam ion deposition.
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