US5480747A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Attenuated phase shifting mask with buried absorbers
Assignee: State University of New York Polytechnic Institute
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Filing: 1994-11-21
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Granted: 1996-01-02
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Expires: 2014-11-21
Abstract
Abstract An attenuated phase shifting mask has absorbers embedded (buried) in the mask substrate, instead of on the surface of the substrate. The buried absorbers allow for controlling attenuation and phase shifting parameters. The material composition and the thickness of the absorber regions determine the amount of attenuation that is to be achieved, as well as phase shifting in some instances. In other instances, offset distances of the absorbers from the surface of the mask control the phase shift. Light scattering and diffraction is reduced or eliminated by having the absorbers below the surface of the mask. By reducing light scattering and distortion, the mask of the present invention allows for PSM lithography techniques to be extended to ranges of shorter wavelength.
Inventors
- 👤 Prahalad K. Vasudev
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 11:29
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/29; G03F1/32
Claims Analysis
Total Claims: 30
Claim 1
Independent Claim
215 words
An attenuated phase shifting photolithography mask for use in projecting an image pattern onto a target comprising: a mask substrate formed from a substantially transparent material for permitting light transmission therethrough; an absorber pattern, formed from a light absorbing material and buried a set distance below a surface of said substrate and not adjacent to said surface, for absorbing a significant portion of light transmission therethrough to form a phase shifting attenuator pattern in said substrate, such that light attenuation and phase shifting achieved in phase shifting regions of said mask are both obtained from said light absorbing material at a set wavelength of transmitted light; wherein having said attenuator pattern buried below said surface of said substrate but not adjacent to said surface, allows for light scattered from surface areas of said attenuator pattern to be reflected back into said substrate at a surface interface of said substrate, in order to improve image feature definition at said target; and wherein having said attenuator pattern buried below said surface at said set distance is of sufficient depth in order to provide for a maximum depth of focus of an exposure system being utilized to reside within said substrate, such that surface defects and contaminants at said surface interface are not imaged on to said target.
Claim 2
Dependent Claim
215 words
An attenuated phase shifting photolithography mask for use in projecting an image pattern onto a target comprising: a mask substrate formed from a substantially transparent material for permitting light transmission therethrough; an absorber pattern, formed from a light absorbing material and buried a set distance below a surface of said substrate and not adjacent to said surface, for absorbing a significant portion of light transmission therethrough to form a phase shifting attenuator pattern in said substrate, such that light attenuation and phase shifting achieved in phase shifting regions of said mask are both obtained from said light absorbing material at a set wavelength of transmitted light; wherein having said attenuator pattern buried below said surface of said substrate but not adjacent to said surface, allows for light scattered from surface areas of said attenuator pattern to be reflected back into said substrate at a surface interface of said substrate, in order to improve image feature definition at said target; and wherein having said attenuator pattern buried below said surface at said set distance is of sufficient depth in order to provide for a maximum depth of focus of an exposure system being utilized to reside within said substrate, such that surface defects and contaminants at said surface interface are not imaged on to said target.
Claim 3
Dependent Claim
16 words
The mask of claim 1 wherein said surface of said substrate has a substantially planar surface.
Claim 4
Dependent Claim
16 words
The mask of claim 2 wherein said light absorbing material is comprised of a metallic film.
Claim 5
Dependent Claim
20 words
The mask of claim 3 wherein said attenuator pattern has a thickness to attenuate approximately 85-95% of light transmitting therethrough.
Claim 6
Dependent Claim
21 words
The mask of claim 4 wherein said attenuator pattern provides for a 180 ° phase shift of said light transmitting therethrough.
Claim 7
Dependent Claim
13 words
The mask of claim 5 wherein said mask substrate is made from quartz.
Claim 8
Dependent Claim
265 words
An attenuated phase shifting photolithography mask for use in projecting an image pattern onto a target comprising: a mask substrate formed from a substantially transparent material for permitting light transmission therethrough, said substrate having trenches on its surface corresponding to non-phase shifting regions and wherein said trenches have a depth corresponding to a set distance d 2 ; an absorber pattern formed from a light absorbing material and buried at a distance d 1 from said substrate surface, in which said distance d 1 is greater than said set distance d 2 , and disposed below said surface of said substrate at phase shifting regions and not adjacent to said surface; said absorber pattern for absorbing a significant portion of light transmission therethrough to form an attenuator pattern in said substrate, such that light attenuation is obtained from said light absorbing material and phase shifting is determined by a combination of said light absorbing material and trench depth d 2 ; wherein having said attenuator pattern buried below said surface of said substrate but not adjacent to said surface, allows for light scattering at said attenuator pattern to be reflected back into said substrate at a surface interface of said substrate, in order to improve image feature definition; and wherein having said attenuator pattern buried below said surface at said distance d 1 is of sufficient depth in order to provide for a maximum depth of focus of an exposure system being utilized to reside within said substrate, such that surface defects and contaminants at said surface interface are not imaged on to said target.
Claim 9
Dependent Claim
265 words
An attenuated phase shifting photolithography mask for use in projecting an image pattern onto a target comprising: a mask substrate formed from a substantially transparent material for permitting light transmission therethrough, said substrate having trenches on its surface corresponding to non-phase shifting regions and wherein said trenches have a depth corresponding to a set distance d 2 ; an absorber pattern formed from a light absorbing material and buried at a distance d 1 from said substrate surface, in which said distance d 1 is greater than said set distance d 2 , and disposed below said surface of said substrate at phase shifting regions and not adjacent to said surface; said absorber pattern for absorbing a significant portion of light transmission therethrough to form an attenuator pattern in said substrate, such that light attenuation is obtained from said light absorbing material and phase shifting is determined by a combination of said light absorbing material and trench depth d 2 ; wherein having said attenuator pattern buried below said surface of said substrate but not adjacent to said surface, allows for light scattering at said attenuator pattern to be reflected back into said substrate at a surface interface of said substrate, in order to improve image feature definition; and wherein having said attenuator pattern buried below said surface at said distance d 1 is of sufficient depth in order to provide for a maximum depth of focus of an exposure system being utilized to reside within said substrate, such that surface defects and contaminants at said surface interface are not imaged on to said target.
Claim 10
Dependent Claim
16 words
The mask of claim 7 wherein said light absorbing material is comprised of a metallic film.
Claim 11
Dependent Claim
20 words
The mask of claim 8 wherein said attenuator pattern has a thickness to attenuate approximately 85-95% of light transmitting therethrough.
Claim 12
Dependent Claim
20 words
The mask of claim 9 wherein said offset distance for said attenuator pattern is set for a 180° phase shift.
Claim 13
Dependent Claim
13 words
The mask of claim 10 wherein said mask substrate is made from quartz.
Claim 14
Independent Claim
302 words
A method of fabricating an attenuated phase shifting photolithography mask for use in projecting an image onto a target, comprising the steps of: forming a photoresistive layer over a mask substrate; patterning said photoresistive layer to expose portions of said substrate underlying said photoresistive layer; etching said exposed portions of said substrate to a predefined depth to form trenches in said substrate; removing remaining portions of said photoresistive layer; depositing a layer of light absorbing material over said substrate and filling said trenches; selectively etching back said layer of light absorbing material until only said trenches are filled with said light absorbing material; forming a dielectric layer of a predefined thickness over said substrate and said trenches to form an upper boundary region of said mask in order to bury said light absorbing material below a surface of said mask now formed by exposed surface of said dielectric layer; wherein said absorbing material forms an attenuator pattern below said surface of said mask and not adjacent to said surface, such that light attenuation is obtained from said light absorbing material and an amount of phase shifting is obtained from said light absorbing material at a set wavelength of transmitted light; wherein having said attenuator pattern buried below said surface of said mask allows for light scattered from surface areas of said attenuator pattern to be reflected back into said mask at a surface interface of said substrate, in order to improve image feature definition at said target; and wherein having said attenuator pattern buried below said surface is at a distance of sufficient depth in order to provide for a maximum depth of focus of an exposure system being utilized to reside within said substrate, such that surface defects and contaminants at said surface interface are not imaged on to said target.
Claim 15
Independent Claim
302 words
A method of fabricating an attenuated phase shifting photolithography mask for use in projecting an image onto a target, comprising the steps of: forming a photoresistive layer over a mask substrate; patterning said photoresistive layer to expose portions of said substrate underlying said photoresistive layer; etching said exposed portions of said substrate to a predefined depth to form trenches in said substrate; removing remaining portions of said photoresistive layer; depositing a layer of light absorbing material over said substrate and filling said trenches; selectively etching back said layer of light absorbing material until only said trenches are filled with said light absorbing material; forming a dielectric layer of a predefined thickness over said substrate and said trenches to form an upper boundary region of said mask in order to bury said light absorbing material below a surface of said mask now formed by exposed surface of said dielectric layer; wherein said absorbing material forms an attenuator pattern below said surface of said mask and not adjacent to said surface, such that light attenuation is obtained from said light absorbing material and an amount of phase shifting is obtained from said light absorbing material at a set wavelength of transmitted light; wherein having said attenuator pattern buried below said surface of said mask allows for light scattered from surface areas of said attenuator pattern to be reflected back into said mask at a surface interface of said substrate, in order to improve image feature definition at said target; and wherein having said attenuator pattern buried below said surface is at a distance of sufficient depth in order to provide for a maximum depth of focus of an exposure system being utilized to reside within said substrate, such that surface defects and contaminants at said surface interface are not imaged on to said target.
Claim 16
Dependent Claim
25 words
The method of claim 12 wherein said absorbing material has a thickness t to provide both required attenuation and required phase shifting for said mask.
Claim 17
Dependent Claim
32 words
The method of claim 13 wherein said mask substrate is made from quartz and said step of forming said dielectric layer is comprised of depositing an oxide layer of said thickness t.
Claim 18
Dependent Claim
50 words
The method of claim 13 wherein said mask substrate is made from quartz and said step of forming said dielectric layer is comprised of bonding a quartz layer, having a thickness greater than said predefined thickness, onto said quartz substrate and etching back said quartz layer to said predefined thickness.
Claim 19
Dependent Claim
77 words
The method of claim 14 wherein said absorbing material provides said required attenuation, but only provides a fraction of said required phase shifting, wherein trenches are formed in non-phase shifting areas not overlying said attenuator pattern, so that total phase shifting is determined by a combination of said absorbing material and a difference in thickness of dielectric layer overlying said absorbing material and substrate material absent in said trenches, such difference being depth d of said trenches.
Claim 20
Dependent Claim
77 words
The method of claim 15 wherein said absorbing material provides said required attenuation, but only provides a fraction of said required phase shifting, wherein trenches are formed in non-phase shifting areas not overlying said attenuator pattern, so that total phase shifting is determined by a combination of said absorbing material and a difference in thickness of dielectric layer overlying said absorbing material and substrate material absent in said trenches, such difference being depth d of said trenches.
Claim 21
Independent Claim
286 words
A method of fabricating an attenuated phase shifting photolithography mask for use in projecting an image onto a target, comprising the steps of: forming an oxide layer over a mask substrate; forming a photoresistive layer over said oxide layer; patterning said photoresistive layer to expose portions of said oxide layer underlying said photoresistive layer; etching said exposed portions of said oxide layer to expose portions of said underlying substrate; removing remaining portions of said photoresistive layer, but leaving patterned portions of said oxide layer; implanting doped ions into exposed portions of said substrate to a set depth below exposed surface of said substrate to form patterned light absorbing regions in said substrate and not adjacent to said surface; removing remaining portion of said oxide layer such that said substrate has a substantially planar surface with buried light absorbing regions forming an attenuator pattern; wherein said absorbing material forms an attenuator pattern below said surface of said mask, such that light attenuation is obtained from said light absorbing material and an amount of phase shifting is obtained from said light absorbing material at a set wavelength of transmitted light; wherein having said attenuator pattern buried below said surface of said mask allows for light scattered from surface areas of said attenuator pattern to be reflected back into said mask at said surface, in order to improve image feature definition at said target; and wherein having said attenuator pattern buried below said surface is at a distance of sufficient depth in order to provide for a maximum depth of focus of an exposure system being utilized to reside within said substrate, such that surface defects and contaminants at said surface interface are not imaged on to said target.
Claim 22
Independent Claim
286 words
A method of fabricating an attenuated phase shifting photolithography mask for use in projecting an image onto a target, comprising the steps of: forming an oxide layer over a mask substrate; forming a photoresistive layer over said oxide layer; patterning said photoresistive layer to expose portions of said oxide layer underlying said photoresistive layer; etching said exposed portions of said oxide layer to expose portions of said underlying substrate; removing remaining portions of said photoresistive layer, but leaving patterned portions of said oxide layer; implanting doped ions into exposed portions of said substrate to a set depth below exposed surface of said substrate to form patterned light absorbing regions in said substrate and not adjacent to said surface; removing remaining portion of said oxide layer such that said substrate has a substantially planar surface with buried light absorbing regions forming an attenuator pattern; wherein said absorbing material forms an attenuator pattern below said surface of said mask, such that light attenuation is obtained from said light absorbing material and an amount of phase shifting is obtained from said light absorbing material at a set wavelength of transmitted light; wherein having said attenuator pattern buried below said surface of said mask allows for light scattered from surface areas of said attenuator pattern to be reflected back into said mask at said surface, in order to improve image feature definition at said target; and wherein having said attenuator pattern buried below said surface is at a distance of sufficient depth in order to provide for a maximum depth of focus of an exposure system being utilized to reside within said substrate, such that surface defects and contaminants at said surface interface are not imaged on to said target.
Claim 23
Dependent Claim
30 words
The method of claim 18 wherein thickness of said attenuator pattern in said step of implanting doped ions is determined by dosage of said doped ions implanted into said substrate.
Claim 24
Dependent Claim
31 words
The method of claim 19 wherein said set depth of implanting doped ions is determined by an amount of implanting energy imparted on said ions during said step of implanting them.
Claim 25
Dependent Claim
25 words
The method of claim 20 wherein said dosage for implantation is in an approximate range of 3×10 17 /cm 2 -2×10 18 /cm 2 .
Claim 26
Dependent Claim
19 words
The method of claim 21 wherein said implanting energy is in an approximate range of 1-5 million electron volts.
Claim 27
Dependent Claim
25 words
The method of claim 20 wherein said absorbing material has a thickness t to provide both required attenuation and required phase shifting for said mask.
Claim 28
Dependent Claim
13 words
The method of claim 23 wherein said mask substrate is made from quartz.
Claim 29
Dependent Claim
77 words
The method of claim 20 wherein said absorbing material provides said required attenuation, but only provides a fraction of said required phase shifting, wherein trenches are formed in non-phase shifting areas not overlying said attenuator pattern, so that total phase shifting is determined by a combination of said absorbing material and a difference in thickness of substrate material overlying said absorbing material and substrate material absent in said trenches, such difference being depth d of said trenches.
Claim 30
Dependent Claim
13 words
The method of claim 25 wherein said mask substrate is made from quartz.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-01-01 | 1999-07-03 | 2000-01-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-01-01 | 2003-07-03 | 2004-01-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-01-01 | 2007-07-03 | 2008-01-02 | $7700.00 | Window Closed / Lapsed |