US5478459A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma sputtering installation with microwave enhancement
Assignee: Balzers und Leybold Deutschland Holding AG
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Filing: 1994-07-08
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Granted: 1995-12-26
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Expires: 2014-07-08
Abstract
Abstract A microwave ring resonator surrounds a cathode target and feeds microwaves to a plasma volume over the target through a slit system in such a way that the waves do not pass through the cathode dark space.
Inventors
- 👤 Rudolf Latz
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:49
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; H01J37/3405; H01J37/3408; G; G11; G11B; G11B7/00; G11B7/24; G11B7/26; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/32247
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
89 words
Plasma sputtering apparatus with microwave enhancement, comprising: a target having a plasma volume thereover, cathode means for applying an electric potential to said target, dark space means circumferentially outside of said cathode means, a microwave ring resonator surrounding said cathode means, a microwave source for providing microwaves to said ring resonator, and slit means communicating between said ring resonator and said plasma volume circumferentially outside said dark space means so that microwaves can be fed from said resonator to said plasma volume without passing through said dark space means.
Claim 2
Dependent Claim
89 words
Plasma sputtering apparatus with microwave enhancement, comprising: a target having a plasma volume thereover, cathode means for applying an electric potential to said target, dark space means circumferentially outside of said cathode means, a microwave ring resonator surrounding said cathode means, a microwave source for providing microwaves to said ring resonator, and slit means communicating between said ring resonator and said plasma volume circumferentially outside said dark space means so that microwaves can be fed from said resonator to said plasma volume without passing through said dark space means.
Claim 3
Dependent Claim
19 words
Plasma sputtering apparatus as in claim 1 wherein said ring resonator is filled with a microwave low loss dielectric.
Claim 4
Dependent Claim
15 words
Plasma sputtering apparatus as in claim 2 wherein said dielectric is PTFE, Trolon, or polystyrene.
Claim 5
Dependent Claim
21 words
Plasma sputtering apparatus as in claim 1 further comprising magnet means arranged so that said cathode means is a magnetron cathode.
Claim 6
Dependent Claim
27 words
Plasma sputtering apparatus as in claim 4 further comprising electromagnets adjacent to said target, said apparatus further comprising a shielding box in which said electromagnets are disposed.
Claim 7
Dependent Claim
18 words
Plasma sputtering apparatus as in claim 1 wherein said ring resonator has an operating frequency of 2.45 GHz.
Claim 8
Dependent Claim
15 words
Plasma sputtering apparatus as in claim 1 wherein said ring resonator is at ground potential.
Claim 9
Dependent Claim
20 words
Plasma sputtering apparatus as in claim 1 further comprising electrical insulation means between said ring resonator and said cathode means.
Claim 10
Dependent Claim
15 words
Plasma sputtering apparatus as in claim 1 further comprising reflector means surrounding said plasma volume.
Claim 11
Dependent Claim
23 words
Plasma sputtering apparatus as in claim 1 wherein said slit means is configured to feed a uniform microwave intensity to said plasma volume.
Claim 12
Dependent Claim
18 words
Apparatus as in claim 1 wherein said slit means comprises a plurality of slits separated by baffle means.
Claim 13
Dependent Claim
19 words
Apparatus as in claim 1 wherein said slit means are separated from said dark space means by a wall.
Claim 14
Dependent Claim
29 words
Apparatus as in claim 11 wherein said target has parallel edges and a target surface therebetween, said slit means comprising at least one planar slit parallel to each edge.
Claim 15
Dependent Claim
19 words
Apparatus as in claim 13 wherein each slit is arranged to emit microwaves substantially perpendicular to said target surface.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-12-25 | 1999-06-26 | 1999-12-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-12-25 | 2003-06-26 | 2003-12-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-12-25 | 2007-06-26 | 2007-12-26 | $7700.00 | Window Closed / Lapsed |