Patent US2671398A successfully refreshed from Google Patents.
Patent US5465860A successfully refreshed from Google Patents.
US5465860A
Expired / Lapsed
US
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Method of forming an integrated circuit waveguide
Assignee: Intel Corp
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Filing: 1994-07-01
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Granted: 1995-11-14
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Expires: 2014-07-01
Abstract
Abstract Manufacturing techniques for forming waveguide channels and devices. A trench is formed in a cladding layer through an opening in a conductive layer. The trench is then filled with an active waveguide polymer and the conductive layer is patterned such that the active waveguide polymer may be poled. Also, a trench may be isotropically etched through a cladding layer to an underlying etch stop layer. The etch stop layer is thereafter removed from within the trench region to expose a previously formed, smooth, underlying cladding layer. Finally, a waveguide formed in a cladding layer, bounded in width by an overlying barrier layer, underlies a masking layer having a gap formed therein. Within the gap, a portion of the waveguide channel along with juxtaposing sections of the barrier layer are exposed. An etch is thereafter performed to remove the portion of the waveguide polymer in the waveguide channel bounded by both the masking layer and the barrier layer. Then an alternate type of waveguide polymer is formed in the void left behind by the etched waveguide polymer in the waveguide channel. Thus, a single waveguide channel having a plurality of waveguide polymers is formed.
Inventors
- 👤 Harry H. Fujimoto
- 👤 Siddhartha Das
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 23:36
CPC Classifications
G; G02; G02F; G02F1/00; G02F1/01; G02F1/061; G02F1/065; G02B; G02B6/00; G02B6/10; G02B6/12; G02B6/122; G02B6/1221; G02B2006/12166; G02B2006/12176
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
121 words
A method of forming a self-aligned, active waveguide channel for gap-poling, said method comprising the steps of: (a) forming a cladding layer over a substrate; (b) forming a conductive layer over said cladding layer; (c) etching an opening in said conductive layer; (d) etching a trench in said cladding layer through said opening in said conductive layer; (f) forming an active waveguide polymer within at least a portion of said trench; and (g) etching said conductive layer so as to electrically separate a first portion of said conductive layer residing on one side of said trench from a second portion of said conductive layer residing on the other side of said trench such that said active waveguide polymer may be poled.
Claim 2
Independent Claim
121 words
A method of forming a self-aligned, active waveguide channel for gap-poling, said method comprising the steps of: (a) forming a cladding layer over a substrate; (b) forming a conductive layer over said cladding layer; (c) etching an opening in said conductive layer; (d) etching a trench in said cladding layer through said opening in said conductive layer; (f) forming an active waveguide polymer within at least a portion of said trench; and (g) etching said conductive layer so as to electrically separate a first portion of said conductive layer residing on one side of said trench from a second portion of said conductive layer residing on the other side of said trench such that said active waveguide polymer may be poled.
Claim 3
Dependent Claim
25 words
The method of claim 1 further comprising the step of coating said trench with a coating layer before filling said trench with said waveguide polymer.
Claim 4
Dependent Claim
44 words
The method of claim 1 further comprising the step of etching at least a portion of said waveguide polymer which exists substantially over said conductive layer such that said waveguide polymer becomes substantially isolated from the surface of said conductive layer within said trench.
Claim 5
Dependent Claim
30 words
The method of claim 3 further comprising the step of etching said waveguide polymer away from said conductive layer in said trench and backfilling said trench with a buffer layer.
Claim 6
Dependent Claim
43 words
The method of claim 1 wherein said etching of said opening in said conductive layer and said etching of said trench in said cladding layer are performed substantially anisotropically such that said trench is substantially aligned with said opening in said conductive layer.
Claim 7
Dependent Claim
68 words
The method of claim 1 wherein said etching of said opening in said conductive layer includes a substantially isotropic etch of said conductive layer and said etching of said trench in said cladding layer is performed substantially anisotropically such that said trench in said cladding layer is substantially centered beneath said opening in said conductive layer, and said trench is narrower than said opening in said conductive layer.
Claim 8
Dependent Claim
18 words
The method of claim 1 wherein said cladding layer and said waveguide polymer primarily comprise a polyimide material.
Claim 9
Dependent Claim
27 words
The method of claim 1 wherein said conductive layer primarily comprises a material selected from the group consisting of Al, Cu, Au, Ag, and any combination thereof.
Claim 10
Independent Claim
154 words
A method of forming a waveguide channel, said method comprising the steps of: (a) forming a cladding layer over a substrate; (b) forming a barrier layer over said cladding layer; (c) etching an opening in said barrier layer; (d) etching a trench in said cladding layer through said opening in said barrier layer; (e) forming a first waveguide polymer within at least a portion of said trench; (f) forming a masking layer, said masking layer having a gap over at least a portion of said trench; (h) etching at least a portion of said first waveguide polymer from a region within said trench, said etch of said first waveguide polymer being substantially aligned to said gap in said masking layer at one boundary and substantially aligned to said opening in said barrier layer at another boundary; and (i) forming a second waveguide polymer within at least a portion of said region of said trench.
Claim 11
Independent Claim
154 words
A method of forming a waveguide channel, said method comprising the steps of: (a) forming a cladding layer over a substrate; (b) forming a barrier layer over said cladding layer; (c) etching an opening in said barrier layer; (d) etching a trench in said cladding layer through said opening in said barrier layer; (e) forming a first waveguide polymer within at least a portion of said trench; (f) forming a masking layer, said masking layer having a gap over at least a portion of said trench; (h) etching at least a portion of said first waveguide polymer from a region within said trench, said etch of said first waveguide polymer being substantially aligned to said gap in said masking layer at one boundary and substantially aligned to said opening in said barrier layer at another boundary; and (i) forming a second waveguide polymer within at least a portion of said region of said trench.
Claim 12
Dependent Claim
26 words
The method of claim 9 further comprising the step of coating said trench with a coating layer before filling said trench with said first waveguide polymer.
Claim 13
Dependent Claim
39 words
The method of claim 9 further comprising the step of etching at least a portion of said second waveguide polymer which exists substantially over said barrier layer such that said second waveguide polymer becomes substantially isolated within said trench.
Claim 14
Dependent Claim
31 words
The method of claim 11 further comprising the step of etching said second waveguide polymer away from said barrier layer in said trench and backfilling said trench with a buffer layer.
Claim 15
Dependent Claim
31 words
The method of claim 11 wherein said barrier layer acts as an etch-stop for said etching of said portion of said second waveguide polymer which exists substantially over said barrier layer.
Claim 16
Dependent Claim
19 words
The method of claim 9 wherein said first waveguide polymer is passive and said second waveguide polymer is active.
Claim 17
Dependent Claim
19 words
The method of claim 10 wherein said first waveguide polymer is passive and said second waveguide polymer is active.
Claim 18
Dependent Claim
19 words
The method of claim 12 wherein said first waveguide polymer is passive and said second waveguide polymer is active.
Claim 19
Dependent Claim
13 words
The method of claim 9 wherein said barrier layer primarily comprises a metal.
Claim 20
Dependent Claim
26 words
The method of claim 17 wherein said second waveguide polymer comprises an active material and said barrier layer is used for gap poling said active material.
Claim 21
Dependent Claim
23 words
The method of claim 9 wherein said cladding layer, said first waveguide polymer, and said second waveguide polymer primarily comprise a polyimide material.
References Cited (Backward Citations)
US5142605A
Cited
US5054872A
Cited
US5165004A
Cited
US5136682A
Cited
US5291574A
Cited
US5170461A
Cited
US5282078A
Cited
US5352566A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-11-13 | 1999-05-15 | 1999-11-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-11-13 | 2003-05-15 | 2003-11-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-11-13 | 2007-05-15 | 2007-11-14 | $7700.00 | Window Closed / Lapsed |