US5464476A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma processing device comprising plural RF inductive coils
Assignee: Central Research Laboratories Ltd
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Filing: 1994-10-17
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Granted: 1995-11-07
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Expires: 2014-10-17
Abstract
Abstract A plasma processing device is described which is modular and can be scaled up by assembly together with similar devices to provide a capability for large area processing. The device includes a housing which contains an array of RF coils and into which a process gas is fed. The article to be processed is disposed close to the housing and egress of the process gas from the housing to the process region is resisted so as to maintain a positive pressure differential between the housing and the process region.
Inventors
- 👤 Ian Gibb
- 👤 Philip Allen
- 👤 Andrew Barnes
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 01:45
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; H01J37/32449; H01J37/32009; H01J37/32082; H01J37/321
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
105 words
A plasma processing device comprising a housing with a wall member overlying a substrate to be operated on by means of a plasma process but separated therefrom by a discharge gap, the device comprising a plurality of inductive coils distributed over said wall member, means for supplying RF energy to the coils, means for introducing a process gas into said housing and causing said gas to flow into the discharge gap, said wall member and/or said housing being constructed to resist the flow of said gas so as to maintain in said housing a higher pressure of said gas than exists in said discharge gap.
Claim 2
Dependent Claim
105 words
A plasma processing device comprising a housing with a wall member overlying a substrate to be operated on by means of a plasma process but separated therefrom by a discharge gap, the device comprising a plurality of inductive coils distributed over said wall member, means for supplying RF energy to the coils, means for introducing a process gas into said housing and causing said gas to flow into the discharge gap, said wall member and/or said housing being constructed to resist the flow of said gas so as to maintain in said housing a higher pressure of said gas than exists in said discharge gap.
Claim 3
Dependent Claim
30 words
A device according to claim 1 wherein said wall member is formed, in at least one region thereof, with holes dimensioned to resist said gas flow to a desired extent.
Claim 4
Dependent Claim
29 words
A device according to claim 1 wherein said wall member incorporates one or more inserts made of a porous material which resists said gas flow to a desired extent.
Claim 5
Dependent Claim
26 words
A device according to claim 1 including transport means for moving said substrate relative to said housing in a direction substantially parallel to said wall member.
Claim 6
Dependent Claim
18 words
A device according to claim 1 including shielding means for screening unwanted electric fields generated by said coils.
Claim 7
Dependent Claim
26 words
A device according to claim 5 wherein said shielding means comprises a respective spoke-shaped conductor configuration juxtaposed with each of said coils and electrically insulated therefrom.
Claim 8
Dependent Claim
19 words
A processing arrangement comprising a plurality of devices as claimed in claim 1 assembled together and operable in concert.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-11-06 | 1999-05-08 | 1999-11-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-11-06 | 2003-05-08 | 2003-11-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-11-06 | 2007-05-08 | 2007-11-07 | $7700.00 | Window Closed / Lapsed |