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US5463269A Expired / Lapsed US ⏱️ 0.0 years remaining

Process and structure of an integrated vacuum microelectronic device

Assignee: GlobalFoundries Inc
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Filing: 1992-03-06
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Granted: 1995-10-31
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Expires: 2012-03-06
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Abstract

Abstract The present invention relates generally to a new integrated Vacuum Microelectronic Device (VMD) and a method for making the same. Vacuum Microelectronic Devices require several unique three dimensional structures: a sharp field emission tip, accurate alignment of the tip inside a control grid structure in a vacuum environment, and an anode to collect electrons emitted by the tip. Also disclosed is a new structure and a process for forming diodes, triodes, tetrodes, pentodes and other similar structures. The final structure made can also be connected to other similar VMD devices or to other electronic devices.

Inventors

  • 👤 Steven M. Zimmerman

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 13:28
CPC Classifications
H; H01; H01J; H01J9/00; H01J9/02; H01J9/022; H01J9/025; H01J21/00; H01J21/02; H01J21/06; H01J21/10; H01J21/105; H01J2201/00; H01J2201/30; H01J2201/304; H01J2201/30446; H01J2201/30453; H01J2201/30457

Claims Analysis

Total Claims: 31
Claim 1
Independent Claim 69 words
An integrated vacuum microelectronic device comprising an electron-emitting material having at least one field emission tip and at least one access hole that leads into a chamber, wherein said field emitter tip faces an anode which is in said chamber and is separated by at least one insulating material, and wherein at least a portion of said at least one access hole in said electron-emitting material faces said anode.
Claim 2
Dependent Claim 69 words
An integrated vacuum microelectronic device comprising an electron-emitting material having at least one field emission tip and at least one access hole that leads into a chamber, wherein said field emitter tip faces an anode which is in said chamber and is separated by at least one insulating material, and wherein at least a portion of said at least one access hole in said electron-emitting material faces said anode.
Claim 3
Dependent Claim 32 words
The integrated vacuum microelectronic device of claim 1, further comprises at least two devices and wherein at least a portion of one of said device is electrically connected to said second device.
Claim 4
Dependent Claim 28 words
The integrated vacuum microelectronic device of claim 1, wherein said insulating material further comprises one or more additional insulating materials separated by at least one electrically conductive material.
Claim 5
Dependent Claim 14 words
The integrated vacuum microelectronic device of claim 1, wherein said electron-emitting layer is multilayered.
Claim 6
Dependent Claim 15 words
The integrated vacuum microelectronic device of claim 1, wherein at least one tip is multilayered.
Claim 7
Dependent Claim 31 words
The integrated vacuum microelectronic device of claim 1, further comprising on the tip side of the electron-emitting layer at least one barrier layer, which is selectively removed to expose said tip.
Claim 8
Dependent Claim 19 words
The integrated vacuum microelectronic device of claim 1, wherein said tip has a coating of a second electron-emitting material.
Claim 9
Dependent Claim 13 words
The integrated vacuum microelectronic device of claim 1, wherein said tip is sharpened.
Claim 10
Dependent Claim 32 words
The integrated vacuum microelectronic device of claim 1, further comprises at least two devices, wherein at least a portion of one device is electrically isolated from a portion of said second device.
Claim 11
Dependent Claim 28 words
The integrated vacuum microelectronic device of claim 1, wherein at least a portion of said device is electrically connected to a portion of at least one passive device.
Claim 12
Dependent Claim 57 words
An integrated vacuum microelectronic device comprising an electron-emitting material having at least one field emission tip and at least one access hole that leads into a chamber, wherein said field emitter tip faces an anode which is in said chamber and is separated by at least one insulating material, and wherein said tip has a secondary cusp.
Claim 13
Dependent Claim 57 words
An integrated vacuum microelectronic device comprising an electron-emitting material having at least one field emission tip and at least one access hole that leads into a chamber, wherein said field emitter tip faces an anode which is in said chamber and is separated by at least one insulating material, and wherein said tip has a secondary cusp.
Claim 14
Dependent Claim 18 words
The integrated vacuum microelectronic device of claim 1, wherein said tip has a point or a blade profile.
Claim 15
Dependent Claim 23 words
The integrated vacuum microelectronic device of claim 1, wherein said field emission tip preferably has a radius of between 10 to 100 nm.
Claim 16
Dependent Claim 25 words
The integrated vacuum microelectronic device of claim 2, wherein at least one of said devices has a field emission tip that has a pointed projection.
Claim 17
Dependent Claim 25 words
The integrated vacuum microelectronic device of claim 2, wherein at least one of said devices has a field emission tip that has a blade profile.
Claim 18
Dependent Claim 31 words
The integrated vacuum microelectronic device of claim 1, wherein said field emission tip faces a substrate and wherein said anode is on the substrate side of said integrated vacuum microelectronic device.
Claim 19
Dependent Claim 14 words
The integrated vacuum microelectronic device of claim 1, wherein said substrate is the anode.
Claim 20
Dependent Claim 46 words
The integrated vacuum microelectronic device of claim 1, wherein said electron-emitting material is selected from a group comprising Mo, W, Ta, Re, Pt, Au, Ag, Al, Cu, Nb, Ni, Cr, Ti, Zr, Hf and alloys thereof or solid solutions containing two or more of these elements.
Claim 21
Dependent Claim 48 words
The integrated vacuum microelectronic device of claim 1, wherein the material for said anode is selected from a group comprising Mo, W, Ta, Re, Pt, Au, Ag, Al, Cu, Nb, Ni, Cr, Ti, Zr, Hf and alloys thereof or solid solutions containing two or more of these elements.
Claim 22
Dependent Claim 22 words
The integrated vacuum microelectronic device of claim 1, wherein said electron-emitting material is selected from a group comprising doped and undoped semiconductors.
Claim 23
Dependent Claim 28 words
The integrated vacuum microelectronic device of claim 1, wherein said insulating material is selected from a group comprising sapphire, glass or oxides of Si, Al, Mg and Ce.
Claim 24
Dependent Claim 20 words
The integrated vacuum microelectronic device of claim 2, wherein at least one tip of one of said device is multilayered.
Claim 25
Dependent Claim 22 words
The integrated vacuum microelectronic device of claim 1, wherein said device is stacked on top of other technology and electrically connected thereto.
Claim 26
Dependent Claim 28 words
The integrated vacuum microelectronic device of claim 1, further comprises at least two devices, and wherein one of said device is stacked on top of said second device.
Claim 27
Dependent Claim 29 words
The integrated vacuum microelectronic device of claim 1, wherein at least a portion of said chamber has a profile where the dimensions of the chamber are constant with depth.
Claim 28
Dependent Claim 28 words
The integrated vacuum microelectronic device of claim 1, wherein at least a portion of said chamber has a profile where the dimensions of the chamber vary with depth.
Claim 29
Dependent Claim 16 words
The integrated vacuum microelectronic device of claim 1, wherein said anode is of a semiconductor material.
Claim 30
Dependent Claim 35 words
The integrated vacuum microelectronic device of claim 1, wherein said anode is of a semiconductor material, and wherein said semiconductor material has electrically biased P-N junctions to create an electrically isolated region in said anode.
Claim 31
Dependent Claim 16 words
The integrated vacuum microelectronic device of claim 1, wherein said anode is on an insulative substrate.

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Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1998-10-30 1999-05-01 1999-10-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2002-10-30 2003-05-01 2003-10-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2006-10-30 2007-05-01 2007-10-31 $7700.00 Window Closed / Lapsed

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