US5460703A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Low thermal expansion clamping mechanism
Assignee: Applied Materials Inc
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Filing: 1994-10-03
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Granted: 1995-10-24
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Expires: 2014-10-03
Abstract
Abstract An improved clamping ring, useful for securing a semiconductor wafer during wafer processing, for example in a physical vapor deposition system, is made of a thermally nonconductive material having a low thermal coefficient of expansion, for example a ceramic material, such as alumina. Such material, by exhibiting only slight expansion or contraction during thermal cycling, allows the production of a clamping ring having the largest possible inner diameter, such that more wafer surface area is available for device fabrication, and such that wafer shadowing that results from metal film build-up on the clamping ring is mitigated, thereby extending the useful life of the clamp ring and reducing system downtime. Additionally, the thermal stability provided by the present invention improves wafer temperature uniformity, and therefore also improves per wafer device yield while increasing device reliability.
Inventors
- 👤 Jaim Nulman
- 👤 Robert E. Davenport
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:54
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/70; H10P72/76; H10P72/7604; H10P72/7606; C; C23; C23C; C23C14/00; C23C14/22; C23C14/50
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
115 words
An apparatus for securing a semiconductor wafer against movement during wafer processing, comprising: a doughnut-shaped clamping ring having an inner diameter defining a ring opening and having at least one continuous planar clamping surface for abutting opposition along the entire periphery of a wafer surface to effect water clamping wherein said clamping ring is made from a material selected from the group consisting of alumina, aluminum nitride, and calcium carbonate, said material having a low thermal coefficient of expansion, such that said clamping ring inner diameter remains constant or nearly constant when said ring is subjected to thermal cycling, such that wafer shadowing that results from deposited film build-up on said clamping ring is mitigated.
Claim 2
Independent Claim
115 words
An apparatus for securing a semiconductor wafer against movement during wafer processing, comprising: a doughnut-shaped clamping ring having an inner diameter defining a ring opening and having at least one continuous planar clamping surface for abutting opposition along the entire periphery of a wafer surface to effect water clamping wherein said clamping ring is made from a material selected from the group consisting of alumina, aluminum nitride, and calcium carbonate, said material having a low thermal coefficient of expansion, such that said clamping ring inner diameter remains constant or nearly constant when said ring is subjected to thermal cycling, such that wafer shadowing that results from deposited film build-up on said clamping ring is mitigated.
Claim 3
Dependent Claim
11 words
The apparatus of claim 1, wherein clamping ring is thermally nonconductive.
Claim 4
Dependent Claim
130 words
In a physical vapor deposition system, an apparatus for securing a semiconductor wafer processing, comprising: a doughnut-shaped clamping ring having an inner diameter defining a ring opening and having at least one continuous planar clamping surface for abutting opposition to said wafer surface to effect wafer clamping along the entire periphery of said wafer surface, wherein said clamping ring is made from a material selected from the group consisting of alumina, aluminum nitride, and calcium carbonate, said material having a low thermal coefficient of expansion, said material exhibiting at most only slight expansion and contraction during thermal cycling, wherein said clamping ring inner diameter remains constant or nearly constant during said thermal cycling, and such that wafer shadowing that results from deposited film build-up on said clamping ring is mitigated.
Claim 5
Dependent Claim
130 words
In a physical vapor deposition system, an apparatus for securing a semiconductor wafer processing, comprising: a doughnut-shaped clamping ring having an inner diameter defining a ring opening and having at least one continuous planar clamping surface for abutting opposition to said wafer surface to effect wafer clamping along the entire periphery of said wafer surface, wherein said clamping ring is made from a material selected from the group consisting of alumina, aluminum nitride, and calcium carbonate, said material having a low thermal coefficient of expansion, said material exhibiting at most only slight expansion and contraction during thermal cycling, wherein said clamping ring inner diameter remains constant or nearly constant during said thermal cycling, and such that wafer shadowing that results from deposited film build-up on said clamping ring is mitigated.
Claim 6
Dependent Claim
12 words
The apparatus of claim 3, wherein said clamping ring is thermally nonconductive.
Claim 7
Independent Claim
138 words
A method for securing a semiconductor wafer during wafer processing while allowing maximum exposure of wafer surface to a process environment, comprising the steps of: securing said wafer against unwanted movement with a doughnut-shaped clamping ring having at least one continuous planar clamping surface in abutting opposition along the entire periphery of a water surface and having an inner diameter which defines an area of process environment exposure for said water surface; processing said wafer; and maintaining said inner diameter constant or nearly constant during thermal cycling attendant with said wafer processing by forming said clamping ring made of a material selected from the group consisting of alumina, aluminum nitride, and calcium carbonate, said material having a low thermal coefficient of expansion, such that wafer shadowing that results from deposited film build-up on said clamping ring is mitigated.
Claim 8
Independent Claim
138 words
A method for securing a semiconductor wafer during wafer processing while allowing maximum exposure of wafer surface to a process environment, comprising the steps of: securing said wafer against unwanted movement with a doughnut-shaped clamping ring having at least one continuous planar clamping surface in abutting opposition along the entire periphery of a water surface and having an inner diameter which defines an area of process environment exposure for said water surface; processing said wafer; and maintaining said inner diameter constant or nearly constant during thermal cycling attendant with said wafer processing by forming said clamping ring made of a material selected from the group consisting of alumina, aluminum nitride, and calcium carbonate, said material having a low thermal coefficient of expansion, such that wafer shadowing that results from deposited film build-up on said clamping ring is mitigated.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-10-23 | 1999-04-24 | 1999-10-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-10-23 | 2003-04-24 | 2003-10-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-10-23 | 2007-04-24 | 2007-10-24 | $7700.00 | Window Closed / Lapsed |