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US5454847A
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Vapor deposition method for depositing a film of fluorine-containing glass on a substrate
Assignee: Oclaro North America Inc
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Filing: 1993-09-17
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Granted: 1995-10-03
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Expires: 2013-09-17
Abstract
Abstract A deposition method for vapor deposition of a film of fluorine-containing glass on a substrate in which said substrate is put into contact with fluxs of the vapors of the various constituents of said glass, wherein said vapor fluxs are emitted simultaneously from at least two crucibles, a first crucible containing a host bath and main metal fluorides that constitute said fluorine-containing glass, and at least one second crucible containing dopants constituted by at least one rare earth halide.
Inventors
- 👤 Charles Jacoboni
- 👤 Brigitte Boulard
- 👤 Olivier Perrot
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 12:53
CPC Classifications
C; C03; C03B; C03B37/00; C03B37/01; C03B37/012; C03B37/014; C03B37/018; C03B19/00; C03B19/14; C03B37/01807; C03C; C03C3/00; C03C3/32; C03C3/325; C23; C23C; C23C14/00; C23C14/06; C23C14/10; C03B2201/00; C03B2201/80; C03B2201/82; Y; Y10; Y10S; Y10S65/00; Y10S65/15; Y10S65/16
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
123 words
A deposition method for vapor deposition of a film of fluorine-containing glass on a substrate, in which said glass comprises various constituents, wherein said substrate is put into contact with vapor flows of the various constituents of said glass to form said film of fluorine-containing glass on said substrate, wherein said vapor flows are emitted simultaneously from at least two crucibles, wherein said at least two crucibles comprise a first crucible and at least one additional crucible, wherein said first crucible contains a host bath which contains mixed therein main metal fluorides that are to constitute said fluorine-containing glass, and said at least one additional crucible contains materials constituted by at least one rare earth halide to serve as dopants in the glass.
Claim 2
Dependent Claim
123 words
A deposition method for vapor deposition of a film of fluorine-containing glass on a substrate, in which said glass comprises various constituents, wherein said substrate is put into contact with vapor flows of the various constituents of said glass to form said film of fluorine-containing glass on said substrate, wherein said vapor flows are emitted simultaneously from at least two crucibles, wherein said at least two crucibles comprise a first crucible and at least one additional crucible, wherein said first crucible contains a host bath which contains mixed therein main metal fluorides that are to constitute said fluorine-containing glass, and said at least one additional crucible contains materials constituted by at least one rare earth halide to serve as dopants in the glass.
Claim 3
Dependent Claim
66 words
A deposition method according to claim 1, wherein the at least one additional crucible contains materials to serve as dopants satisfying the relationship: xYX.sub.3 +(1-x)LnX.sub.3 where: 0≦x≦1; Ln=at least one of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu; Y=yttrium; X=F or Cl; and LnX 3 represents a rare earth halide or a mixture of rare earth halides.
Claim 4
Dependent Claim
36 words
A deposition method according to claim 1, wherein the amount of said materials to serve as dopants in the glass is no more than 15% in moles relative to the amount of said main metal fluorides.
Claim 5
Dependent Claim
98 words
A deposition method according to claim 1, wherein the vapor flow emitted by said first crucible consists of the following composition (in molar %; total 100%): 30 to 50 PbF 2 30 to 50 GaF 3 or FeF 3 or CrF 3 0 to 30 ZnF 2 or CuF 2 1 to 5 MnF 2 or CdF 2 or CoF 2 1 to 5 InF 3 0 to 10 AlF 3 0 to 10 at least one metal fluoride containing a metal which is different from any other metal contained in a metal fluoride in the vapor flow.
Claim 6
Dependent Claim
81 words
A deposition method according to claim 4, wherein said first crucible contains a host bath consisting of the following composition on a molar % basis: 9 to 26 YF 3 19 to 28 BaF 2 35 to 40 InF 3 18 to 25 MnF 2 or CdF 2 or ZnF 2 or CoF 2 0 to 10 at least one metal fluoride containing a metal which is different from any other metal contained in a metal fluoride in the host bath.
Claim 7
Dependent Claim
32 words
A deposition method according to claim 5, wherein the at least one metal fluoride is selected from the group consisting of metal fluorides whose metals have octahedral coordination and alkali metal fluorides.
Claim 8
Dependent Claim
32 words
A deposition method according to claim 4, wherein the at least one metal fluoride is selected from the group consisting of metal fluorides whose metals have octahedral coordination and alkali metal fluorides.
Claim 9
Dependent Claim
27 words
A deposition method according to claim 1, wherein the material of said substrate is a fluorine-containing glass, alumina, silica, carbon, a metal, silicon, or a semiconductor material.
References Cited (Backward Citations)
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| 3.5 Years (Year 4) | 1998-10-02 | 1999-04-03 | 1999-10-03 | $2000.00 | Window Closed / Lapsed |
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