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US5453394A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for preparing semiconductor substrate by bringing first and second substrates in contact

Assignee: Canon Inc
•
Filing: 1993-01-28
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Granted: 1995-09-26
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Expires: 2013-01-28
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Abstract

Abstract A process for preparing a semiconductor substrate comprises bringing a first substrate provided with at least one of boron and phosphorus on the surface of an insulating layer formed on the surface of the substrate in contact with a second substrate, and integrating both of the substrates by a heat treatment.

Inventors

  • 👤 Takao Yonehara
  • 👤 Kenji Yamagata

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 18:05
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/60; H10P50/64; H10P50/642; H10P90/00; H10P90/19; H10P90/1904; H10P90/1906; H10P90/1914; H10P90/1922; H10W; H10W10/00; H10W10/10; H10W10/181; Y; Y10; Y10S; Y10S148/00; Y10S148/012; Y10S438/00; Y10S438/96

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 87 words
A process for preparing a semiconductor substrate comprising: providing a first substrate having a semiconductor layer and an insulating layer; forming a first layer comprising an element constituting said insulating layer and at least one of boron and phosphorus on the surface of said insulating layer; contacting the first layer with a second substrate; and integrating both of the substrates by a heat treatment to form the semiconductor substrate, wherein the boron and/or the phosphorus are provided on the surface of the insulating layer by ion implantation.
Claim 2
Dependent Claim 87 words
A process for preparing a semiconductor substrate comprising: providing a first substrate having a semiconductor layer and an insulating layer; forming a first layer comprising an element constituting said insulating layer and at least one of boron and phosphorus on the surface of said insulating layer; contacting the first layer with a second substrate; and integrating both of the substrates by a heat treatment to form the semiconductor substrate, wherein the boron and/or the phosphorus are provided on the surface of the insulating layer by ion implantation.
Claim 3
Dependent Claim 84 words
A process for preparing a semiconductor substrate which comprises bringing a first substrate and a second substrate each provided with at least one of boron and phosphorus on the surface of an insulating layer on the surface of the substrate in contact with each other so that the insulating layers are in contact with each other, and integrating both of the substrates by a heat treatment, wherein the boron and/or the phosphorus are provided on the surface of the insulating layer by ion implantation.
Claim 4
Dependent Claim 84 words
A process for preparing a semiconductor substrate which comprises bringing a first substrate and a second substrate each provided with at least one of boron and phosphorus on the surface of an insulating layer on the surface of the substrate in contact with each other so that the insulating layers are in contact with each other, and integrating both of the substrates by a heat treatment, wherein the boron and/or the phosphorus are provided on the surface of the insulating layer by ion implantation.
Claim 5
Dependent Claim 32 words
A process according to claims 1 or 2, wherein the first substrate and the second substrate are single element semiconductors, compound semiconductors or one of the first and second substrates is glass.
Claim 6
Dependent Claim 23 words
A process according to claim 1, wherein the thickness of said first layer is in a range of from 0.1 to 1.0 μm.
Claim 7
Dependent Claim 30 words
A process according to claim 1 or 2, wherein the boron and/or the phosphorus are ion implanted in an amount ranging from 1×10 20 to 5×10 21 cm -3 .

References Cited (Backward Citations)

US3909332A Cited
US4791074A Cited
JPH01189145A Cited
US5094697A Cited
EP0417838A1 Cited
JPH03173422A Cited
JPH0472608A Cited
US5213986A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1998-09-25 1999-03-27 1999-09-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2002-09-25 2003-03-27 2003-09-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2006-09-25 2007-03-27 2007-09-26 $7700.00 Window Closed / Lapsed

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