Patent US5448333A successfully refreshed from Google Patents.
US5448333A
Expired / Lapsed
US
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Exposure method
Assignee: Nikon Corp
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Filing: 1994-12-19
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Granted: 1995-09-05
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Expires: 2014-12-19
Abstract
Abstract An exposure method for aligning a plurality of shot areas arranged on a substrate with predetermined exposure positions on a predetermined coordinate system in turn and transcribing, on the substrate, a pattern formed on a mask through a projection optical system comprises the steps of measuring, on a predetermined coordinate system, coordinates of a plurality of sample shot areas selected from a plurality of shot areas, determining weight coefficients corresponding to the coordinates of the sample shot areas, performing statistical calculation based on the coordinates and the weight coefficients of the measured sample shot areas and determining coordinates of the i-th shot area on the predetermined coordinate system, controlling the movement of the substrate according to the determined coordinates of the i-th shot area to set the i-th shot area at the exposure position, and adjusting the projection magnification of the projection optical system based on a parameter expressing deformation of the shot area among a plurality of parameters obtained by statistical calculation upon determining the coordinates of the shot areas.
Inventors
- 👤 Yoshichika Iwamoto
- 👤 Hiroki Tateno
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 08:57
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7003; G03F7/00; G03F7/70; G03F7/70216; G03F7/70358; G03F7/70425
Claims Analysis
Total Claims: 32
Claim 1
Independent Claim
149 words
An exposure method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and transcribing, on said substrate, a pattern formed on a mask through a projection optical system, said exposure method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; (b) determining weight coefficients corresponding to said coordinates of said sample shot areas; (c) performing statistical calculation based on said coordinates and said weight coefficients of said sample shot areas which were measured and determining coordinates of a predetermined shot area; (d) controlling the movement of the substrate according to said determined coordinated of said predetermined shot area; and (e) adjusting an imaging characteristic of said projection optical system based on a parameter expressing deformation of said shot areas selected from a plurality of parameters obtained by said statistical calculation.
Claim 2
Dependent Claim
149 words
An exposure method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and transcribing, on said substrate, a pattern formed on a mask through a projection optical system, said exposure method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; (b) determining weight coefficients corresponding to said coordinates of said sample shot areas; (c) performing statistical calculation based on said coordinates and said weight coefficients of said sample shot areas which were measured and determining coordinates of a predetermined shot area; (d) controlling the movement of the substrate according to said determined coordinated of said predetermined shot area; and (e) adjusting an imaging characteristic of said projection optical system based on a parameter expressing deformation of said shot areas selected from a plurality of parameters obtained by said statistical calculation.
Claim 3
Dependent Claim
34 words
The method according to claim 1, wherein said parameter expressing said deformation of said shot areas corresponds to said predetermined shot area and said adjusting step (e) is executed upon exposing each shot area.
Claim 4
Dependent Claim
29 words
The method according to claim 2, wherein said parameter expressing said deformation of said shot areas is an average value of parameters expressing said deformation of said shot areas.
Claim 5
Dependent Claim
37 words
The method according to claim 1, wherein said imaging characteristic of said projection optical system includes at least one of the projection magnification of the image of said pattern and distortion of the image of said pattern.
Claim 6
Dependent Claim
23 words
The method according to claim 1, wherein said parameter expressing said deformation is an average of deformations of some of said shot areas.
Claim 7
Dependent Claim
30 words
The method according to claim 1, wherein said adjusting of said imaging optical characteristic of said projection optical system is executed before said predetermined shot area is set in position.
Claim 8
Dependent Claim
55 words
The method according to claim 1, further comprising the step of: roughly adjusting the imaging characteristic of said projection optical system based on said parameter expressing deformation of said shot areas among said parameters calculated by statistical calculation without considering said weight coefficients; and then executing said adjusting as defined in said adjusting step (e).
Claim 9
Dependent Claim
58 words
The method according to claim 1, further comprising the steps of: calculating distortion of said predetermined shot area based on coordinates of at least two shot areas adjacent to said predetermined shot area whose distortion should be calculated; and adjusting distortion of the image of said pattern corresponding to the thus calculated distortion of said predetermined shot area.
Claim 10
Dependent Claim
24 words
The method according to claim 1, wherein said weight coefficients are determined by distances between said predetermined shot area and said sample shot areas.
Claim 11
Dependent Claim
25 words
The method according to claim 1, wherein said weight coefficients are determined by distances between said predetermined shot area and a center of said substrate.
Claim 12
Dependent Claim
17 words
The method according to claim 1, wherein said sample shot areas are at least three in number.
Claim 13
Dependent Claim
47 words
The method according to claim 1, wherein said plurality of parameters are determined to minimize a square sum of the residuals between coordinates obtained by using a linear model based on the designed coordinates of said sample shot areas and measured coordinates of said sample shot areas.
Claim 14
Dependent Claim
55 words
The method according to claim 1, wherein it is decided whether or not said step (e) of adjusting an imaging optical characteristic is carried out, by comparing the coordinates of shot areas determined based on a plurality of parameters obtained by said statistical calculation and the designed values of the coordinates of those shot areas.
Claim 15
Dependent Claim
59 words
The method according to claim 1, wherein said parameter expressing said deformation is based on an average of deformations of some of said shot areas in one of a plurality of blocks into which said shot areas are divided, and said adjusting step (e) is executed based on said parameter upon exposing each shot area in said one block.
Claim 16
Dependent Claim
17 words
The method according to claim 1, wherein said adjusting step (e) is executed while moving said substrate.
Claim 17
Dependent Claim
31 words
The method according to claim 1, further comprising the step of: after said adjusting step (e), finely adjusting the imaging characteristic based on determined coordinates of some of said shot areas.
Claim 18
Dependent Claim
30 words
The method according to claim 1, further comprising the step of. adjusting another imaging characteristic of said projection optical system based on determined coordinates of some of said shot areas.
Claim 19
Independent Claim
116 words
A method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and transcribing, on the substrate, a pattern formed on a mask through a projection optical system, said exposure method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; (b) determining coordinates of the shot areas by performing statistical calculation due to the measured coordinates of said sample shot areas; and (c) adjusting an imaging characteristic of said projection optical system based on at least one parameter among a plurality of parameters obtained by said statistical calculation upon determining said coordinates of said plurality of shot areas.
Claim 20
Independent Claim
116 words
A method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and transcribing, on the substrate, a pattern formed on a mask through a projection optical system, said exposure method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; (b) determining coordinates of the shot areas by performing statistical calculation due to the measured coordinates of said sample shot areas; and (c) adjusting an imaging characteristic of said projection optical system based on at least one parameter among a plurality of parameters obtained by said statistical calculation upon determining said coordinates of said plurality of shot areas.
Claim 21
Dependent Claim
57 words
The method according to claim 18, wherein said plurality of parameters are determined to minimize a square sum of the residuals between coordinates obtained by using a linear model based on the designed coordinates of said sample shot areas and measured coordinates of said sample shot areas; and said at least one parameter includes a scaling parameter.
Claim 22
Dependent Claim
106 words
An exposure method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and forming the image of a pattern of a mask on said substrate through a projection optical system, said exposure method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; and (b) adjusting at least one of projection magnification of the image of said pattern and distortion of the image of said pattern based on at least one of a plurality of parameters of a model for deciding coordinates of said plurality of shot areas.
Claim 23
Dependent Claim
106 words
An exposure method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and forming the image of a pattern of a mask on said substrate through a projection optical system, said exposure method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; and (b) adjusting at least one of projection magnification of the image of said pattern and distortion of the image of said pattern based on at least one of a plurality of parameters of a model for deciding coordinates of said plurality of shot areas.
Claim 24
Dependent Claim
25 words
The method according to claim 20, wherein said model is a linear model and said at least one parameter includes a scaling parameter expressing distortion.
Claim 25
Dependent Claim
107 words
A micro-device manufacturing method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position forming the image of a pattern of a mask on said substrate through a projection optical system, said micro-device manufacturing method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; and (b) adjusting at least one of projection magnification of the image of said pattern and distortion of the image of said pattern based on at least one of a plurality of parameters of a model for deciding coordinates of said plurality of shot areas.
Claim 26
Dependent Claim
107 words
A micro-device manufacturing method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position forming the image of a pattern of a mask on said substrate through a projection optical system, said micro-device manufacturing method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; and (b) adjusting at least one of projection magnification of the image of said pattern and distortion of the image of said pattern based on at least one of a plurality of parameters of a model for deciding coordinates of said plurality of shot areas.
Claim 27
Dependent Claim
155 words
An exposure apparatus for aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and forming the image of a pattern of a mask on said substrate through a projection optical system, said exposure apparatus comprising: (a) a measuring device for measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; (b) a control system which determines weight coefficients of said sample shot areas, performs statistical calculation based on said coordinates and said weight coefficients of said sample shot areas and determines coordinates of said shot areas: (c) a controller for moving said substrate according to the coordinates of said shot areas which determined by said control system; and (d) an adjusting device for adjusting an imaging characteristic of said projection optical system based on a parameter expressing deformation of said shot areas selected from a plurality of parameters obtained by said statistical calculation.
Claim 28
Dependent Claim
155 words
An exposure apparatus for aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and forming the image of a pattern of a mask on said substrate through a projection optical system, said exposure apparatus comprising: (a) a measuring device for measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; (b) a control system which determines weight coefficients of said sample shot areas, performs statistical calculation based on said coordinates and said weight coefficients of said sample shot areas and determines coordinates of said shot areas: (c) a controller for moving said substrate according to the coordinates of said shot areas which determined by said control system; and (d) an adjusting device for adjusting an imaging characteristic of said projection optical system based on a parameter expressing deformation of said shot areas selected from a plurality of parameters obtained by said statistical calculation.
Claim 29
Dependent Claim
197 words
An exposure apparatus for aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and forming the image of a pattern of a mask on said substrate through a projection optical system, said exposure apparatus comprising: (a) a measuring device for measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas: (b) a control system which performs calculation based on the measured coordinates, designed coordinates of said sample shot areas and a model for deciding coordinates of said plurality of shot areas, and determines coordinates of said shot areas; and (c) an adjusting device for adjusting at least one of projection magnification of the image of said pattern and distortion of the image of said pattern based on at least one of a plurality of parameters obtained by said calculation, wherein said model is a linear model, said plurality of parameters are determined to minimize a square sum of the residuals between coordinates obtained by using said model based on the designed coordinates of said sample shot areas and measured coordinates of said sample shot areas, and said at least one parameter includes a scaling parameter.
Claim 30
Dependent Claim
197 words
An exposure apparatus for aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and forming the image of a pattern of a mask on said substrate through a projection optical system, said exposure apparatus comprising: (a) a measuring device for measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas: (b) a control system which performs calculation based on the measured coordinates, designed coordinates of said sample shot areas and a model for deciding coordinates of said plurality of shot areas, and determines coordinates of said shot areas; and (c) an adjusting device for adjusting at least one of projection magnification of the image of said pattern and distortion of the image of said pattern based on at least one of a plurality of parameters obtained by said calculation, wherein said model is a linear model, said plurality of parameters are determined to minimize a square sum of the residuals between coordinates obtained by using said model based on the designed coordinates of said sample shot areas and measured coordinates of said sample shot areas, and said at least one parameter includes a scaling parameter.
Claim 31
Dependent Claim
131 words
An exposure method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and transcribing, on said substrate, a pattern formed on a mask through a projection optical system, said exposure method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; (b) performing calculation based on the measured coordinates and designed coordinates of said sample shot areas and a model for deciding coordinates of said plurality of shot areas, and determining coordinates of said shot areas; and (c) adjusting at least one of projection magnification of the image of said pattern and distortion of the image of said pattern based on at least one of a plurality of parameters obtained by said calculation.
Claim 32
Dependent Claim
131 words
An exposure method of aligning a plurality of shot areas arranged on a substrate with a predetermined exposure position and transcribing, on said substrate, a pattern formed on a mask through a projection optical system, said exposure method comprising the steps of: (a) measuring coordinates of a plurality of sample shot areas selected from a plurality of shot areas; (b) performing calculation based on the measured coordinates and designed coordinates of said sample shot areas and a model for deciding coordinates of said plurality of shot areas, and determining coordinates of said shot areas; and (c) adjusting at least one of projection magnification of the image of said pattern and distortion of the image of said pattern based on at least one of a plurality of parameters obtained by said calculation.
References Cited (Backward Citations)
US4629313A
Cited
US4871237A
Cited
US4666273A
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US4677301A
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US4780617A
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US4833621A
Cited
US5117255A
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US5305222A
Cited
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