Patent US4616949A successfully refreshed from Google Patents.
Patent US5443689A successfully refreshed from Google Patents.
US5443689A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dry etching process utilizing a recessed electrode
Assignee: Panasonic Holdings Corp
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Filing: 1994-02-28
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Granted: 1995-08-22
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Expires: 2014-02-28
Abstract
Abstract A dry etching apparatus is provided with parallel electrodes confronting each other, and a high frequency voltage is impressed between the electrodes. The electrode for holding a base material has a recess in its surface and the surface of the electrode is covered with an insulating layer so that part of the structure constituted by the insulating layer and electrode is not in contact with the base material.
Inventors
- 👤 Tadashi Kimura
- 👤 Yoshinobu Nagano
- 👤 Kazuyuki Tomita
- 👤 Tetsu Ikeda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 23:46
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H01J2237/00; H01J2237/004
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
114 words
In a dry etching process, the improvement comprising: providing an electrode having at least one recess in a surface thereof that faces toward another electrode disposed parallel thereto, and an insulating layer covering said surface; placing a base material atop said electrode with a rear surface of the base material contacting said insulating layer and covering said at least one recess in its entirety, said rear surface having such an area that the opening ratio of the entirety of the at least one recess over which the rear surface of the base material lies is not less than 20% with respect to said rear surface; and impressing a high frequency voltage between said electrodes.
Claim 2
Dependent Claim
114 words
In a dry etching process, the improvement comprising: providing an electrode having at least one recess in a surface thereof that faces toward another electrode disposed parallel thereto, and an insulating layer covering said surface; placing a base material atop said electrode with a rear surface of the base material contacting said insulating layer and covering said at least one recess in its entirety, said rear surface having such an area that the opening ratio of the entirety of the at least one recess over which the rear surface of the base material lies is not less than 20% with respect to said rear surface; and impressing a high frequency voltage between said electrodes.
Claim 3
Dependent Claim
118 words
A dry etching process comprising: providing an electrode having at least one recess in a surface thereof that faces toward another electrode disposed parallel thereto and wherein an insulating layer covers said surface; supporting a base material having a rear surface atop said electrode with the rear surface contacting said insulating layer and overlying said at least one recess in its entirety, the rear surface having such an area that the opening ratio of said at least one recess over which the rear surface of the base material lies is not more than 20% with respect to said rear surface; creating a vacuum in a space between said electrodes; and impressing a high frequency voltage between said electrodes.
Claim 4
Dependent Claim
118 words
A dry etching process comprising: providing an electrode having at least one recess in a surface thereof that faces toward another electrode disposed parallel thereto and wherein an insulating layer covers said surface; supporting a base material having a rear surface atop said electrode with the rear surface contacting said insulating layer and overlying said at least one recess in its entirety, the rear surface having such an area that the opening ratio of said at least one recess over which the rear surface of the base material lies is not more than 20% with respect to said rear surface; creating a vacuum in a space between said electrodes; and impressing a high frequency voltage between said electrodes.
Claim 5
Dependent Claim
38 words
The dry etching process as claimed in claim 2, and further comprising subsequently translating a push-up rod through said one of the electrodes to push the base material upward from the surface of said one of the electrodes.
References Cited (Backward Citations)
JPS5555530A
Cited
JPS59181620A
Cited
US4793975A
Cited
US4897171A
Cited
US4968374A
Cited
JPH02155230A
Cited
JPH0429315A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-08-21 | 1999-02-20 | 1999-08-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-08-21 | 2003-02-20 | 2003-08-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-08-21 | 2007-02-20 | 2007-08-22 | $7700.00 | Window Closed / Lapsed |