US5429070A
Expired / Lapsed
US
⏱️ 0.0 years remaining
High density plasma deposition and etching apparatus
Assignee: SPTS Technologies Ltd
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Filing: 1992-11-20
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Granted: 1995-07-04
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Expires: 2012-11-20
Abstract
Abstract Plasma deposition or etching apparatus is provided which comprises a plasma source located above and in axial relationship to a substrate process chamber. The plasma source may include a sapphire or alumina source tube for use with plasmas containing fluorine. Surrounding the plasma source are an inner magnetic coil and an outer magnetic coil arranged in the same plane perpendicular to the axis of the plasma source and the substrate process chamber. Preferably a first current is provided through the inner coil and a second current in a direction opposite to the direction of the first current is provided through the outer coil. The inner and outer coils are wrapped with a thin sheet of conducting material to shield the coils from RF signal generated by the plasma source. The result is to advantageously shape the magnetic field in the process chamber to achieve extremely uniform processing, particularly when a unique diamond shaped pattern of gas feed lines is used wherein the diamond is arranged to be approximately tangent at four places to the outer circumference of the workpiece being processed in the apparatus.
Inventors
- 👤 Gregor A. Campbell
- 👤 Robert W. Conn
- 👤 Dan Katz
- 👤 N. William Parker
- 👤 Alexis de Chambrier
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 20:31
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/513; H01J37/32009; H01J37/32082; H01J37/321; H01J37/3211; H01J37/3266; H01J37/32688
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
108 words
Structure for use in generating a high density plasma for use in the processing of a substrate, said structure comprising: a plasma generation chamber; an inner magnet and an outer magnet surrounding said plasma generation chamber, said inner magnet having a smaller diameter than the diameter of said outer magnet such that said outer magnet is located around said inner magnet and in the same plane as said inner magnet, thereby to produce a magnetic field for use with said plasma generation chamber; and means for shielding each of said inner and outer magnets such that radio frequency energy is not absorbed by said inner and outer magnets.
Claim 2
Dependent Claim
108 words
Structure for use in generating a high density plasma for use in the processing of a substrate, said structure comprising: a plasma generation chamber; an inner magnet and an outer magnet surrounding said plasma generation chamber, said inner magnet having a smaller diameter than the diameter of said outer magnet such that said outer magnet is located around said inner magnet and in the same plane as said inner magnet, thereby to produce a magnetic field for use with said plasma generation chamber; and means for shielding each of said inner and outer magnets such that radio frequency energy is not absorbed by said inner and outer magnets.
Claim 3
Dependent Claim
23 words
Structure as in claim 1, wherein: the substrate comprises polysilicon, metal or metal compound; and the plasma generation chamber is made of quartz.
Claim 4
Dependent Claim
21 words
Structure as in claim 1, wherein: the plasma comprises gases containing fluorine; and the plasma generation chamber is made of alumina.
Claim 5
Dependent Claim
21 words
Structure as in claim 1, wherein: the plasma comprises gases containing fluorine; and the plasma generation chamber is made of sapphire.
Claim 6
Dependent Claim
79 words
Structure as in claim 1, further comprising a process chamber for holding a substrate to be operated upon by the plasma, wherein: said plasma generation chamber is located above said process chamber such that said inner magnet and outer magnet are located around said plasma generation chamber above said process chamber; and a surface of said substrate to be operated upon by the plasma is located between 100 and 200 millimeters from an upper surface of said process chamber.
Claim 7
Dependent Claim
14 words
Structure as in claim 5, further comprising a magnetic bucket surrounding the process chamber.
Claim 8
Dependent Claim
16 words
Structure as in claim 6, wherein the magnetic bucket includes between 18 and 28 magnets inclusive.
Claim 9
Dependent Claim
12 words
Structure as in claim 7, wherein the magnetic bucket includes 24 magnets.
Claim 10
Dependent Claim
25 words
Structure as in claim 1, wherein said means for shielding comprises a sheet of conductive material wrapped around each of said inner and outer magnets.
Claim 11
Dependent Claim
14 words
Structure as in claim 9, wherein said sheet of conductive material is aluminum tape.
Claim 12
Dependent Claim
61 words
Structure for use in generating a high density plasma for use in the processing of a substrate, said structure comprising: a plasma generation chamber; a magnet surrounding said plasma generation chamber, thereby to produce a magnetic field for use with said plasma generation chamber; and means for shielding said magnet such that radio frequency energy is not absorbed by said magnet.
Claim 13
Dependent Claim
61 words
Structure for use in generating a high density plasma for use in the processing of a substrate, said structure comprising: a plasma generation chamber; a magnet surrounding said plasma generation chamber, thereby to produce a magnetic field for use with said plasma generation chamber; and means for shielding said magnet such that radio frequency energy is not absorbed by said magnet.
Claim 14
Dependent Claim
20 words
Structure as in claim 11, wherein said means for shielding comprises a sheet of conductive material wrapped around said magnet.
Claim 15
Dependent Claim
14 words
Structure as in claim 12, wherein said sheet of conductive material is aluminum tape.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-07-03 | 1999-01-02 | 1999-07-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-07-03 | 2003-01-02 | 2003-07-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-07-03 | 2007-01-02 | 2007-07-04 | $7700.00 | Window Closed / Lapsed |