Patent JPS6120835A successfully refreshed from Google Patents.
US5414221A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Embedded ground plane and shielding structures using sidewall insulators in high frequency circuits having vias
Assignee: Intel Corp
•
Filing: 1993-07-15
•
Granted: 1995-05-09
•
Expires: 2013-07-15
Abstract
Abstract A process for fabricating embedded ground plane and shielding structures using sidewall insulators in high frequency circuits having vias or contacts. A conductive ground plane disposed between two dielectric layers has vias formed by removing insulating dielectric and conductive ground plane material according to a single photo-lithography masking operation. A sidewall insulator formed on vertical sidewalls of the vias, electrically isolates the ground plane from interconnect metal passing from a lower interconnect layer to an upper interconnect layer through the vias. Alternatively, shielding structures incorporating multiple sidewall insulators and upper and lower shielding may be fabricated to entirely encapsulate the lower interconnect metal from external environments. Process efficiency and yield are increased due to the simplified processing of the embedded ground plane and shielding structures. A variety of deposition methods are set forth including methods employing an anisotropic etch and methods employing an etch-stop/masking layer. Resulting structures are also described.
Inventors
- 👤 Donald S. Gardner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 15:37
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/41; H10W20/423; H10W20/42; H10W20/435; H10W20/495; H10W20/496; Y; Y10; Y10S; Y10S438/00; Y10S438/97
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
76 words
A multi-layer structure comprising: a substrate having a top surface having first and second portions; a first dielectric layer, an electrically conducting layer, and a second dielectric layer, formed in parallel on said first portion of said substrate leaving an aperture having substantially vertical sidewalls around said second portion of said substrate; and an insulating layer extending along said substantially vertical sidewalls of said aperture from said substrate to a top surface of said second dielectric.
Claim 2
Dependent Claim
76 words
A multi-layer structure comprising: a substrate having a top surface having first and second portions; a first dielectric layer, an electrically conducting layer, and a second dielectric layer, formed in parallel on said first portion of said substrate leaving an aperture having substantially vertical sidewalls around said second portion of said substrate; and an insulating layer extending along said substantially vertical sidewalls of said aperture from said substrate to a top surface of said second dielectric.
Claim 3
Dependent Claim
31 words
The multi-layer structure of claim 1 further comprising: a conducting material filling said aperture and extending from said second portion of said substrate to said top surface of said second dielectric.
Claim 4
Dependent Claim
129 words
A multi-layer structure comprising: a substrate having a top surface having first and second portions; a first dielectric and a conducting layer formed in parallel on said second portion of said substrate; a second dielectric formed on a top portion of said conducting layer and having substantially vertical sidewalls adjacent to said first portion of said top surface of said substrate; and a second dielectric formed on a top portion of said conducting layer, said second dielectric extending along vertical side edges of said first dielectric and said electrically conducting layer to said first portion of said substrate and extending along a portion of said second portion of said substrate, with said second dielectric having a substantially L-shaped cross section taken perpendicular to said top surface of said substrate.
Claim 5
Dependent Claim
129 words
A multi-layer structure comprising: a substrate having a top surface having first and second portions; a first dielectric and a conducting layer formed in parallel on said second portion of said substrate; a second dielectric formed on a top portion of said conducting layer and having substantially vertical sidewalls adjacent to said first portion of said top surface of said substrate; and a second dielectric formed on a top portion of said conducting layer, said second dielectric extending along vertical side edges of said first dielectric and said electrically conducting layer to said first portion of said substrate and extending along a portion of said second portion of said substrate, with said second dielectric having a substantially L-shaped cross section taken perpendicular to said top surface of said substrate.
Claim 6
Dependent Claim
38 words
The multi-layer structure of claim 3 further comprising: a conducting material formed on said second portion of said top surface of said substrate, said conducting material extending between a pair of opposing L-shaped portions of said second dielectric.
Claim 7
Dependent Claim
29 words
The multi-layer structure of claim 4 further comprising a conducting layer formed on a top surface of said second dielectric and on a top surface of said conducting material.
Claim 8
Dependent Claim
23 words
The multi-layer structure of claim 5 further comprising a metal interconnect connecting a portion of said upper conducting layer to said conducting layer.
Claim 9
Dependent Claim
189 words
A multi-layer structure comprising: a substrate having a top surface with first and second portions; a first dielectric and a conducting layer formed in parallel on said second portion of said substrate and having substantially vertical side edges adjacent to said first portion of said substrate; a second dielectric layer having a first portion extending along a first portion of a top surface of said conducting layer, said first portion of said second dielectric extending along said substantially vertical side edges of said conducting layer and said first dielectric, and extending along a portion of said second portion of said substrate; wherein said second dielectric has a second portion extending along a second portion of a top surface of said conducting layer to a position offset from a side edge of said conducting layer thereby exposing a portion of said conducting layer; and a conducting material formed on said second portion of said substrate between said vertical portion of said first portion of said second dielectric and a side edge of said second portion of said second dielectric, said conducting material contacting said second portion of said conducting material.
Claim 10
Dependent Claim
189 words
A multi-layer structure comprising: a substrate having a top surface with first and second portions; a first dielectric and a conducting layer formed in parallel on said second portion of said substrate and having substantially vertical side edges adjacent to said first portion of said substrate; a second dielectric layer having a first portion extending along a first portion of a top surface of said conducting layer, said first portion of said second dielectric extending along said substantially vertical side edges of said conducting layer and said first dielectric, and extending along a portion of said second portion of said substrate; wherein said second dielectric has a second portion extending along a second portion of a top surface of said conducting layer to a position offset from a side edge of said conducting layer thereby exposing a portion of said conducting layer; and a conducting material formed on said second portion of said substrate between said vertical portion of said first portion of said second dielectric and a side edge of said second portion of said second dielectric, said conducting material contacting said second portion of said conducting material.
Claim 11
Dependent Claim
110 words
A multi-layer structure comprising: a substrate having a top surface with first and second portions; a first dielectric layer and a conducting layer formed in parallel on said first portion of said top surface of said substrate; and a second dielectric layer formed along a top surface of said conducting layer, said second dielectric extending along said vertical sidewalls of said first dielectric and said conducting layer to said second portion of said top surface of said substrate, said second dielectric layer having portions formed on said second portion of said top surface of said substrate but offset from said sidewalls of said first dielectric layer and said conducting layer.
Claim 12
Dependent Claim
110 words
A multi-layer structure comprising: a substrate having a top surface with first and second portions; a first dielectric layer and a conducting layer formed in parallel on said first portion of said top surface of said substrate; and a second dielectric layer formed along a top surface of said conducting layer, said second dielectric extending along said vertical sidewalls of said first dielectric and said conducting layer to said second portion of said top surface of said substrate, said second dielectric layer having portions formed on said second portion of said top surface of said substrate but offset from said sidewalls of said first dielectric layer and said conducting layer.
Claim 13
Dependent Claim
49 words
A multi-layer structure comprising: a substrate; a ground plane coveting a substantially L-shaped portion of a top surface of said substrate; and an interconnect covering a substantially L-shaped portion of a top surface of said ground plane, said interconnect being offset from opposing side edges of said ground plane.
Claim 14
Dependent Claim
49 words
A multi-layer structure comprising: a substrate; a ground plane coveting a substantially L-shaped portion of a top surface of said substrate; and an interconnect covering a substantially L-shaped portion of a top surface of said ground plane, said interconnect being offset from opposing side edges of said ground plane.
References Cited (Backward Citations)
US4023197A
Cited
US4931411A
Cited
US4628406A
Cited
US5165166A
Cited
US4803450A
Cited
US5079670A
Cited
US5056216A
Cited
US5210379A
Cited
US5262596A
Cited
US5126794A
Cited
US5139971A
Cited
US5308929A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-05-08 | 1998-11-07 | 1999-05-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-05-08 | 2002-11-07 | 2003-05-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-05-08 | 2006-11-07 | 2007-05-09 | $7700.00 | Window Closed / Lapsed |