Patent US5409789A successfully refreshed from Google Patents.
US5409789A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure mask comprising translucent and transparent phase shifters
Assignee: Toshiba Corp
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Filing: 1993-07-15
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Granted: 1995-04-25
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Expires: 2013-07-15
Abstract
Abstract This invention provides an exposure mask having mask patterns formed on a transparent substrate, the mask patterns including translucent phase shift patterns having a light path length for exposure light differentiated by 180° from that of transparent areas of said transparent substrate and transparent phase shift patterns. Such an exposure mask can be advantageously used to realize highly defined patterns.
Inventors
- 👤 Shin-ichi Ito
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 09:23
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/30; G03F1/32
Claims Analysis
Total Claims: 25
Claim 1
Independent Claim
66 words
An exposure mask comprising mask patterns formed on a transparent substrate, said mask patterns comprising translucent phase shift patterns having a light path length for at least exposure light differentiated by 180° from that of transparent areas of said transparent substrate and transparent phase shift patterns, wherein said mask patterns have areas where said transparent phase shift patterns partly overlap with corresponding translucent phase shift patterns.
Claim 2
Dependent Claim
66 words
An exposure mask comprising mask patterns formed on a transparent substrate, said mask patterns comprising translucent phase shift patterns having a light path length for at least exposure light differentiated by 180° from that of transparent areas of said transparent substrate and transparent phase shift patterns, wherein said mask patterns have areas where said transparent phase shift patterns partly overlap with corresponding translucent phase shift patterns.
Claim 3
Dependent Claim
51 words
The exposure mask according to claim 1, wherein said translucent phase shift patterns are made of one selected from the group consisting of silicon, germanium, gallium arsenide, titanium, aluminum, chromium, tin, indium, nickel, cobalt and tantalum as well as their oxides, nitrides, hydrides carbides, halogenides and mixtures of any of these.
Claim 4
Dependent Claim
21 words
The exposure mask according to claim 1, wherein said translucent phase shift patterns have an amplitude transmissivity between 10 and 30%.
Claim 5
Dependent Claim
23 words
The exposure mark according to claim 1, wherein said transparent phase shift patterns have a transmissivity not lower than 95% for exposure light.
Claim 6
Dependent Claim
42 words
The exposure mask according to claim 4, wherein said transparent phase shift patterns are made of one selected from the group consisting of SiO 2 , Si 3 N 4 , CaF 2 , Al 2 O 3 and MgF 2 .
Claim 7
Dependent Claim
25 words
The exposure mask according to claim 1, further comprising an opaque film on areas outside said transparent phase shift patterns and translucent phase shift patterns.
Claim 8
Dependent Claim
38 words
The exposure mask according to claim 1, wherein said transparent substrate is made of one selected from the group consisting of quartz, Si 3 N 4 , Al 2 O 3 , MgF 2 and CaF 2 .
Claim 9
Dependent Claim
72 words
An exposure mask comprising: a transparent substrate capable of transmitting exposure light; transparent phase shift areas formed by burying into said transparent substrate a substance having a refractive index different from that of the transparent substrate relative to exposure light and planarizing the surface of said transparent substrate; and translucent phase shift patterns on the planarized surface of said transparent substrate in areas covering the boundaries of said transparent phase shift areas.
Claim 10
Dependent Claim
72 words
An exposure mask comprising: a transparent substrate capable of transmitting exposure light; transparent phase shift areas formed by burying into said transparent substrate a substance having a refractive index different from that of the transparent substrate relative to exposure light and planarizing the surface of said transparent substrate; and translucent phase shift patterns on the planarized surface of said transparent substrate in areas covering the boundaries of said transparent phase shift areas.
Claim 11
Dependent Claim
50 words
The exposure mask according to claim 8, wherein said transparent phase shift areas are formed by partly engraving the surface of said transparent substrate so that said transparent phase shift areas show a light path length for exposure light differentiated from that of the remaining areas of said transparent substrate.
Claim 12
Dependent Claim
24 words
The exposure mask according to claim 9, wherein a transparent plate is arranged on said transparent substrate to close said transparent phase shift areas.
Claim 13
Dependent Claim
40 words
The exposure mask according to claim 10, wherein said transparent plate is made of one selected from the group consisting of SiO 2 , Si 3 N 4 , Al 2 O 3 , CaF 2 and MgF 2 .
Claim 14
Dependent Claim
63 words
An exposure mask comprising mask patterns formed on a transparent substrate, said mask patterns comprising translucent phase shift patterns having a light path length for at least exposure light differentiated by 180° from that of transparent areas of said transparent substrate and transparent phase shift patterns, wherein said transparent phase shift patterns are on areas of corresponding translucent phase shift patterns including edges.
Claim 15
Dependent Claim
63 words
An exposure mask comprising mask patterns formed on a transparent substrate, said mask patterns comprising translucent phase shift patterns having a light path length for at least exposure light differentiated by 180° from that of transparent areas of said transparent substrate and transparent phase shift patterns, wherein said transparent phase shift patterns are on areas of corresponding translucent phase shift patterns including edges.
Claim 16
Dependent Claim
51 words
The exposure mask according to claim 8, wherein said translucent phase shift patterns are made of one selected from the group consisting of silicon, germanium, gallium arsenide, titanium, aluminum, chromium, tin, indium, nickel, cobalt and tantalum as well as their oxides, nitrides, hydrides, carbides, halogenides and mixtures of any of these.
Claim 17
Dependent Claim
21 words
The exposure mask according to claim 12, wherein said translucent phase shift patterns have an amplitude transmissivity between 10 and 30%.
Claim 18
Dependent Claim
23 words
The exposure mask according to claim 12, wherein said translucent phase shift patterns have a transmissivity not lower than 95% for exposure light.
Claim 19
Dependent Claim
42 words
The exposure mask according to claim 15, wherein said transparent phase shift patterns are made of one selected from the group consisting of SiO 2 , Si 3 N 4 , CaF 2 , Al 2 O 3 and MgF 2 .
Claim 20
Dependent Claim
25 words
The exposure mask according to claim 12, further comprising an opaque film on areas outside said transparent phase shift patterns and translucent phase shift patterns.
Claim 21
Dependent Claim
38 words
The exposure mask according to claim 12, wherein said transparent substrate is made of one selected from the group consisting of quartz, Si 3 N 4 , Al 2 O 3 , MgF 2 and CaF 2 .
Claim 22
Dependent Claim
82 words
An exposure mask comprising: translucent phase shift patterns formed on a transparent substrate in areas corresponding to unexposed areas of the substrate and having a light path length for exposure light differentiated by 180° from that of transparent areas of said transparent substrate; and transparent phase shift patterns selectively on said transparent substrate in areas corresponding to exposure areas of the substrate, wherein said mask patterns have areas where said transparent phase shift patterns partly overlap with corresponding translucent phase shift patterns.
Claim 23
Dependent Claim
82 words
An exposure mask comprising: translucent phase shift patterns formed on a transparent substrate in areas corresponding to unexposed areas of the substrate and having a light path length for exposure light differentiated by 180° from that of transparent areas of said transparent substrate; and transparent phase shift patterns selectively on said transparent substrate in areas corresponding to exposure areas of the substrate, wherein said mask patterns have areas where said transparent phase shift patterns partly overlap with corresponding translucent phase shift patterns.
Claim 24
Dependent Claim
78 words
An exposure mask comprising: translucent phase shift patterns on a transparent substrate in areas corresponding to unexposed areas of the substrate and having a light path length for exposure light differentiated by 180° from that of transparent areas of said transparent substrate; and transparent phase shift patterns selectively on said transparent substrate in areas corresponding to exposure areas of the substrate, wherein said translucent phase shift patterns are on areas of corresponding translucent phase shift patterns including edges.
Claim 25
Dependent Claim
78 words
An exposure mask comprising: translucent phase shift patterns on a transparent substrate in areas corresponding to unexposed areas of the substrate and having a light path length for exposure light differentiated by 180° from that of transparent areas of said transparent substrate; and transparent phase shift patterns selectively on said transparent substrate in areas corresponding to exposure areas of the substrate, wherein said translucent phase shift patterns are on areas of corresponding translucent phase shift patterns including edges.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-04-24 | 1998-10-24 | 1999-04-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-04-24 | 2002-10-24 | 2003-04-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-04-24 | 2006-10-24 | 2007-04-25 | $7700.00 | Window Closed / Lapsed |