← Back to Patent Explorer
US5408121A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor device, an image sensor device, and methods for producing the same

Assignee: Panasonic Holdings Corp
•
Filing: 1993-10-04
•
Granted: 1995-04-18
•
Expires: 2013-10-04
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A semiconductor device according to the present invention includes: a light-transmitting substrate having a first surface and a second surface; a circuit conductor layer formed on the first surface of the light-transmitting substrate; a semiconductor chip having electrodes formed on a surface thereof, the semiconductor device being mounted face-down on the first surface of the light-transmitting substrate; a photo-thermal cross-linkable insulating resin layer for fixing the semiconductor chip on the light-transmitting substrate; a plated metal layer formed on at least a portion of the circuit conductor layer, the electrodes of the semiconductor chip being connected to the circuit conductor layer through the plated metal layer; an alloy layer formed in an abutting portion between each plated metal layer and the circuit conductor layer; and a second alloy layer formed in an abutting portion between each electrode and each plated metal layer, the alloy layers being formed by melting and recoagulating the plated metal layer upon the circuit conductor layer.

Inventors

  • 👤 Tetsuro Nakamura
  • 👤 Eiichiro Tanaka
  • 👤 Shinji Fujiwara
  • 👤 Masahiro Nakagawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 17:31
CPC Classifications
H; H10; H10F; H10F77/00; H10F77/50; H10W; H10W74/00; H10W74/01; H10W74/012; H10W74/10; H10W74/15; H10W72/00; H10W72/071; H10W72/072; H10W72/07231; H10W72/07236; H10W72/073; H10W72/07331; H10W72/07335; H10W72/07337; H10W72/07338; H10W72/20; H10W72/241; H10W72/251; H10W72/252; H10W72/851; H10W72/853; H10W72/856; H10W90/00; H10W90/701; H10W90/721; H10W90/724; H10W90/731; H10W90/734; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49117; Y10T29/49124; Y10T29/49128; Y10T29/4913; Y10T29/49144

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 159 words
A semiconductor device comprising: a light-transmitting substrate having a first surface and a second surface; a circuit conductor layer formed on the first surface of the light-transmitting substrate; a semiconductor chip having electrodes formed on a surface thereof, the semiconductor device being mounted face-down on the first surface of the light-transmitting substrate; a photo-thermal cross-linkable insulating resin layer for fixing the semiconductor chip on the light-transmitting substrate; a plated metal layer formed on at least a portion of the circuit conductor layer, the electrodes of the semiconductor chip being connected to the circuit conductor layer through the plated metal layer; and an alloy layer formed between each plated metal layer and the circuit conductor layer, the alloy layer being formed by melting and recoagulating the plated metal layer upon the circuit conductor layer, wherein a sum total of a thickness of the light-transmitting substrate and a thickness of the photo-thermal cross-linkable insulating resin layer is 150 μm or less.
Claim 2
Dependent Claim 159 words
A semiconductor device comprising: a light-transmitting substrate having a first surface and a second surface; a circuit conductor layer formed on the first surface of the light-transmitting substrate; a semiconductor chip having electrodes formed on a surface thereof, the semiconductor device being mounted face-down on the first surface of the light-transmitting substrate; a photo-thermal cross-linkable insulating resin layer for fixing the semiconductor chip on the light-transmitting substrate; a plated metal layer formed on at least a portion of the circuit conductor layer, the electrodes of the semiconductor chip being connected to the circuit conductor layer through the plated metal layer; and an alloy layer formed between each plated metal layer and the circuit conductor layer, the alloy layer being formed by melting and recoagulating the plated metal layer upon the circuit conductor layer, wherein a sum total of a thickness of the light-transmitting substrate and a thickness of the photo-thermal cross-linkable insulating resin layer is 150 μm or less.
Claim 3
Dependent Claim 22 words
A semiconductor device according to claim 1, further comprising a second alloy layer formed between each electrode and each plated metal layer.
Claim 4
Dependent Claim 16 words
A semiconductor device according to claim 1, wherein the plated metal layer is made of solder.
Claim 5
Dependent Claim 64 words
A semiconductor device according to claim 1, further comprising a metal bump formed on each electrode, each metal bump being connected to the circuit conductor layer through each plated metal layer; and a second alloy layer formed in an abutting portion between each metal bump and each plated metal layer, the second alloy layer being formed by melting and recoagulating the plated metal layer.
Claim 6
Dependent Claim 15 words
A semiconductor device according to claim 4, wherein the metal bumps are made of Au.
Claim 7
Dependent Claim 33 words
A semiconductor device according to claim 1, wherein a sum total of the thickness of the light-transmitting substrate and the thickness of the photo-thermal cross-linkable insulating resin layer is 100 μm or less.
Claim 8
Dependent Claim 170 words
An image sensor device comprising: a light-transmitting substrate having a first surface and a second surface; a circuit conductor layer formed on the first surface of the light-transmitting substrate; an image sensor chip having electrodes and at least one light-sensitive element formed on a surface thereof, the image sensor device being mounted face-down on the first surface of the light-transmitting substrate; a photo-thermal cross-linkable insulating resin layer for fixing the image sensor chip on the light-transmitting substrate; a plated metal layer formed on at least a portion of the circuit conductor layer, the electrodes of the image sensor chip being connected to the circuit conductor layer through the plated metal layer; and an alloy layer formed between each plated metal layer and the circuit conductor layer, the alloy layer being formed by melting and recoagulating the plated metal layer upon the circuit conductor layer, wherein a sum total of a thickness of the light-transmitting substrate and a thickness of the photo-thermal cross-linkable insulating resin layer is 150 μm or less.
Claim 9
Dependent Claim 170 words
An image sensor device comprising: a light-transmitting substrate having a first surface and a second surface; a circuit conductor layer formed on the first surface of the light-transmitting substrate; an image sensor chip having electrodes and at least one light-sensitive element formed on a surface thereof, the image sensor device being mounted face-down on the first surface of the light-transmitting substrate; a photo-thermal cross-linkable insulating resin layer for fixing the image sensor chip on the light-transmitting substrate; a plated metal layer formed on at least a portion of the circuit conductor layer, the electrodes of the image sensor chip being connected to the circuit conductor layer through the plated metal layer; and an alloy layer formed between each plated metal layer and the circuit conductor layer, the alloy layer being formed by melting and recoagulating the plated metal layer upon the circuit conductor layer, wherein a sum total of a thickness of the light-transmitting substrate and a thickness of the photo-thermal cross-linkable insulating resin layer is 150 μm or less.
Claim 10
Dependent Claim 23 words
An image sensor device according to claim 7, further comprising a second alloy layer formed between each electrode and each plated metal layer.
Claim 11
Dependent Claim 17 words
An image sensor device according to claim 7, wherein the plated metal layer is made of solder.
Claim 12
Dependent Claim 65 words
An image sensor device according to claim 7, further comprising: a metal bump formed on each electrode, each metal bump being connected to the circuit conductor layer through each plated metal layer; and a second alloy layer formed in an abutting portion between each metal bump and each plated metal layer, the second alloy layer being formed by melting and recoagulating the plated metal layer.
Claim 13
Dependent Claim 16 words
An image sensor device according to claim 10, wherein the metal bumps are made of Au.
Claim 14
Dependent Claim 34 words
An image sensor device according to claim 7, wherein a sum total of the thickness of the light-transmitting substrate and the thickness of the photo-thermal cross-linkable insulating resin layer is 100 μm or less.

References Cited (Backward Citations)

EP0262580A2 Cited
US4749120A Cited
EP0393206A1 Cited
US5065006A Cited
US5138145A Cited
EP0388011A2 Cited
JPH04137663A Cited
JPH04155866A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1998-04-17 1998-10-17 1999-04-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2002-04-17 2002-10-17 2003-04-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2006-04-17 2006-10-17 2007-04-18 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag