Claims Analysis
Total Claims: 46
Claim 1
Independent Claim
13 words
An ALRIM PSM consisting of rim phase shifters and reversed rim phase shifters.
Claim 2
Dependent Claim
13 words
An ALRIM PSM consisting of rim phase shifters and reversed rim phase shifters.
Claim 3
Dependent Claim
25 words
An ALRIM PSM in accordance with claim 1 where absorptive blockers are present and said absorptive blockers are removed for originally narrow isolated absorber lines.
Claim 4
Dependent Claim
23 words
An ALRIM PSM in accordance with claim 2 where the reversed rim phase shifters are placed alternately with the normal rim phase shifters.
Claim 5
Dependent Claim
21 words
An ALRIM PSM in accordance with claim 3 where the normal rim phase shifters and reverse rim phase shifters are exchanged.
Claim 6
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 4 built on a substrate consisting of an absorber layer on a distinct phase shifter layer on the mask substrate.
Claim 7
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 5 built on a substrate consisting of an absorber layer on two distinct phase shifter layers on the mask substrate.
Claim 8
Dependent Claim
21 words
An ALRIM PSM in accordance with claim 4 built on a substrate consisting of an absorber layer on the mask substrate.
Claim 9
Dependent Claim
20 words
One of said distinct phase shifter layers in claim 7 is of similar material to that of the mask substrate.
Claim 10
Dependent Claim
20 words
An ALRIM PSM in accordance with claim 4 where 360° phase shift is used in combination of 0° and 180°.
Claim 11
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 4 built on a substrate consisting of an absorber etch mask layer on an absorber layer on the mask substrate.
Claim 12
Dependent Claim
16 words
The ALRIM PSM in claim 4 where the patterns are adjusted by a constant size change.
Claim 13
Dependent Claim
15 words
The ALRIM PSM in accordance with claim 4 where the size change is adjusted individually.
Claim 14
Dependent Claim
12 words
The mask of claim 12 wherein the size change include intra-feature change.
Claim 15
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 3 built on a substrate consisting of an absorber layer on a distinct phase shifter layer on the mask substrate.
Claim 16
Dependent Claim
21 words
An ALRIM PSM in accordance with claim 3 built on a substrate consisting of an absorber layer on the mask substrate.
Claim 17
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 3 built on a substrate consisting of an absorber etch mask layer on an absorber layer on the mask substrate.
Claim 18
Dependent Claim
16 words
The ALRIM PSM in claim 3 where the patterns are adjusted by a constant size change.
Claim 19
Dependent Claim
15 words
The ALRIM PSM in accordance with claim 3 where the size change is adjusted individually.
Claim 20
Dependent Claim
12 words
The mask of claim 18 wherein the size change include intra-feature change.
Claim 21
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 2 built on a substrate consisting of an absorber layer on a distinct phase shifter layer on the mask substrate.
Claim 22
Dependent Claim
21 words
An ALRIM PSM in accordance with claim 2 built on a substrate consisting of an absorber layer on the mask substrate.
Claim 23
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 2 built on a substrate consisting of an absorber etch mask layer on an absorber layer on the mask substrate.
Claim 24
Dependent Claim
16 words
The ALRIM PSM in claim 2 where the patterns are adjusted by a constant size change.
Claim 25
Dependent Claim
15 words
The ALRIM PSM in accordance with claim 2 where the size change is adjusted individually.
Claim 26
Dependent Claim
13 words
The mask of claim 24 where in the size change include intra-feature change.
Claim 27
Dependent Claim
23 words
An ALRIM PSM in accordance with claim 1 where the reversed rim phase shifters are placed alternately with the normal rim phase shifters.
Claim 28
Dependent Claim
21 words
An ALRIM PSM in accordance with claim 26 where the normal rim phase shifters and reverse rim phase shifters are exchanged.
Claim 29
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 27 built on a substrate consisting of an absorber layer on a distinct phase shifter layer on the mask substrate.
Claim 30
Dependent Claim
21 words
An ALRIM PSM in accordance with claim 27 built on a substrate consisting of an absorber layer on the mask substrate.
Claim 31
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 27 built on a substrate consisting of an absorber etch mask layer on an absorber layer on the mask substrate.
Claim 32
Dependent Claim
16 words
The ALRIM PSM in claim 27 where the patterns are adjusted by a constant size change.
Claim 33
Dependent Claim
15 words
The ALRIM PSM in accordance with claim 27 where the size change is adjusted individually.
Claim 34
Dependent Claim
12 words
The mask of claim 32 wherein the size change include intra-feature change.
Claim 35
Dependent Claim
27 words
An ALRIM PSM in accordance with claims 26 built on a substrate consisting of an absorber layer on a distinct phase shifter layer on the mask substrate.
Claim 36
Dependent Claim
21 words
An ALRIM PSM in accordance with claim 26 built on a substrate consisting of an absorber layer on the mask substrate.
Claim 37
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 26 built on a substrate consisting of an absorber etch mask layer on an absorber layer on the mask substrate.
Claim 38
Dependent Claim
16 words
The ALRIM PSM in claim 26 where the patterns are adjusted by a constant size change.
Claim 39
Dependent Claim
15 words
The ALRIM PSM in accordance with claim 26 where the size change is adjusted individually.
Claim 40
Dependent Claim
12 words
The mask of claim 38 wherein the size change include intra-feature change.
Claim 41
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 1 built on a substrate consisting of an absorber layer on a distinct phase shifter layer on the mask substrate.
Claim 42
Dependent Claim
21 words
An ALRIM PSM in accordance with claim 1 built on a substrate consisting of an absorber layer on the mask substrate.
Claim 43
Dependent Claim
27 words
An ALRIM PSM in accordance with claim 1 built on a substrate consisting of an absorber etch mask layer on n absorber layer on the mask substrate.
Claim 44
Dependent Claim
16 words
The ALRIM PSM in claim 1 where the patterns are adjusted by a constant size change.
Claim 45
Dependent Claim
15 words
The ALRIM PSM in accordance with claim 1 where the size change is adjusted individually.
Claim 46
Dependent Claim
12 words
The mask of claim 44 wherein the size change include intra-feature change.