Patent US5403435A successfully refreshed from Google Patents.
US5403435A
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Process for selectively etching integrated circuit devices having deep trenches or troughs or elevated features with re-entrant profiles
Assignee: Micron Technology Inc
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Filing: 1994-02-14
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Granted: 1995-04-04
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Expires: 2014-02-14
Abstract
Abstract An improved process for selectively etching integrated circuit devices having deep trenches or troughs or elevated features with re-entrant profiles is disclosed. The process is capable of producing photoresist patterns having line and space dimensions which are less than 3 microns. Such patterns may be employed to produce high-resolution etched patterns within the functional layers comprising those circuits. The process proceeds without the formation of unwanted residual photoresist material in deep trenches and troughs and in recesses along the sidewalls of raised features having re-entrant sidewall profiles. No auxiliary, critical-dimension-shrinking etch step is required to remove such residual photoresist in those locations. The process is particularly useful for in-process integrated circuit having either a plurality of elevated features or a plurality of trenches or troughs, in combination with at least one conductivity-providing layer, which covers the raised features or lines the trenches or troughs. The process involves forming an etch mask pattern on the in-process circuit using negative photoresist as the mask material, with the pattern covering certain portions of the conductivity-providing layer and exposing other portions of the conductivity-providing layer. The exposed portions of the conductivity-providing layer are then etched.
Inventors
- 👤 David A. Cathey
- 👤 J. Brett Rolfson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 11:16
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/60; H10D1/68; H10P; H10P50/00; H10P50/69; H10P50/691; H10P50/692; H10P50/71; H10P50/73; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/978
Claims Analysis
Total Claims: 30
Claim 1
Independent Claim
104 words
An etch process for use in the manufacture of integrated circuit devices which eliminates the formation of conductive stringers adjacent elevated features having re-entrant profiles, said process comprising the steps of: (a) providing an in-process integrated circuit having both a plurality of elevated features with re-entrant sidewall profiles, and at least one conductivity-providing layer, which covers said elevated features; (b) forming an etch mask pattern on said in-process circuit using negative photoresist material as the mask material, said pattern covering certain portions of the conductivity-providing layer and exposing other portions of the conductivity-providing layer; and (c) etching the exposed portions of the conductivity-providing layer.
Claim 2
Dependent Claim
104 words
An etch process for use in the manufacture of integrated circuit devices which eliminates the formation of conductive stringers adjacent elevated features having re-entrant profiles, said process comprising the steps of: (a) providing an in-process integrated circuit having both a plurality of elevated features with re-entrant sidewall profiles, and at least one conductivity-providing layer, which covers said elevated features; (b) forming an etch mask pattern on said in-process circuit using negative photoresist material as the mask material, said pattern covering certain portions of the conductivity-providing layer and exposing other portions of the conductivity-providing layer; and (c) etching the exposed portions of the conductivity-providing layer.
Claim 3
Dependent Claim
119 words
An etch process for use in the manufacture of an integrated circuit comprising the steps of: (a) providing an in-process semiconductor wafer on which have been formed a plurality of superjacent primary structural layers, at least one of which has been etched in selected regions to form elevated features which have acquired reentrant sidewall profiles during processing; (b) forming a secondary layer which, when patterned, will serve a conductive function in the circuit, said secondary layer covering said elevated features; (c) forming an etch mask pattern on said secondary layer with negative photoresist, said pattern covering certain portions of the conductive layer, and exposing other portions of the conductive layer; and (d) etching exposed portions of said secondary layer.
Claim 4
Dependent Claim
119 words
An etch process for use in the manufacture of an integrated circuit comprising the steps of: (a) providing an in-process semiconductor wafer on which have been formed a plurality of superjacent primary structural layers, at least one of which has been etched in selected regions to form elevated features which have acquired reentrant sidewall profiles during processing; (b) forming a secondary layer which, when patterned, will serve a conductive function in the circuit, said secondary layer covering said elevated features; (c) forming an etch mask pattern on said secondary layer with negative photoresist, said pattern covering certain portions of the conductive layer, and exposing other portions of the conductive layer; and (d) etching exposed portions of said secondary layer.
Claim 5
Dependent Claim
27 words
The process of claim 2, wherein said etch mask pattern comprises at least one mask feature having one or more lateral dimension of less than 2 microns.
Claim 6
Dependent Claim
27 words
The process of claim 2, wherein said etch mask pattern comprises at least one mask feature having one or more lateral dimension of less than 1 micron.
Claim 7
Dependent Claim
27 words
The process of claim 2, wherein said etch mask pattern comprises at least one mask feature having one or more lateral dimension of less than 1/2 micron.
Claim 8
Dependent Claim
32 words
The process of claim 2, wherein said etch mask pattern comprises mask features, with adjacent mask features being separated by a space that is less than 2 microns in a lateral direction.
Claim 9
Dependent Claim
32 words
The process of claim 2, wherein said etch mask pattern comprises mask features, with adjacent mask features being separated by a space that is less than 1 micron in a lateral direction.
Claim 10
Dependent Claim
32 words
The process of claim 2, wherein said etch mask pattern comprises mask features, with adjacent mask features being separated by a space that is less than 1/2 micron in a lateral direction.
Claim 11
Dependent Claim
114 words
An etch process for use in the manufacture of dynamic random access memories of stacked capacitor design, said process comprising the steps of: (a) providing an in-process dynamic random access memory constructed on a substrate, which has been subjected to deposition and etching steps in order to form a plurality of generally parallel wordlines which are coated with a dielectric layer, said coated wordlines having re-entrant sidewall profiles; (b) depositing a conductivity-providing layer over the coated wordlines; (c) forming an etch mask pattern on said in-process memory, said pattern covering certain portions of the conductivity-providing layer, and exposing other portions of the conductivity-providing layer; and (d) etching the exposed portions of the conductivity-providing layer.
Claim 12
Dependent Claim
114 words
An etch process for use in the manufacture of dynamic random access memories of stacked capacitor design, said process comprising the steps of: (a) providing an in-process dynamic random access memory constructed on a substrate, which has been subjected to deposition and etching steps in order to form a plurality of generally parallel wordlines which are coated with a dielectric layer, said coated wordlines having re-entrant sidewall profiles; (b) depositing a conductivity-providing layer over the coated wordlines; (c) forming an etch mask pattern on said in-process memory, said pattern covering certain portions of the conductivity-providing layer, and exposing other portions of the conductivity-providing layer; and (d) etching the exposed portions of the conductivity-providing layer.
Claim 13
Dependent Claim
108 words
An etch process for use in the manufacture of integrated circuits, said process comprising the steps of: (a) providing an in-process integrated circuit constructed on a semiconductor substrate, said in-process integrated circuit having a plurality of elevated features which have been etched from a stack of structural layers which were formed on said substrate, said features having been subjected to processing which has endowed them with re-entrant sidewall profiles; (b) forming an etch mask pattern on said in-process integrated circuit with negative photoresist material, said pattern covering certain portions of the in-process circuit, and exposing other portions thereof; and (c) etching the exposed portions of the in-process circuit.
Claim 14
Dependent Claim
108 words
An etch process for use in the manufacture of integrated circuits, said process comprising the steps of: (a) providing an in-process integrated circuit constructed on a semiconductor substrate, said in-process integrated circuit having a plurality of elevated features which have been etched from a stack of structural layers which were formed on said substrate, said features having been subjected to processing which has endowed them with re-entrant sidewall profiles; (b) forming an etch mask pattern on said in-process integrated circuit with negative photoresist material, said pattern covering certain portions of the in-process circuit, and exposing other portions thereof; and (c) etching the exposed portions of the in-process circuit.
Claim 15
Dependent Claim
27 words
The process of claim 10, wherein said etch mask pattern comprises at least one mask feature having one or more lateral dimension of less than 2 microns.
Claim 16
Dependent Claim
27 words
The process of claim 10, wherein said etch mask pattern comprises at least one mask feature having one or more lateral dimension of less than 1 micron.
Claim 17
Dependent Claim
27 words
The process of claim 10, wherein said etch mask pattern comprises at least one mask feature having one or more lateral dimension of less than 1/2 micron.
Claim 18
Dependent Claim
32 words
The process of claim 10, wherein said etch mask pattern comprises mask features, with adjacent mask features being separated by a space that is less than 2 microns in a lateral direction.
Claim 19
Dependent Claim
32 words
The process of claim 10, wherein said etch mask pattern comprises mask features, with adjacent mask features being separated by a space that is less than 1 micron in a lateral direction.
Claim 20
Dependent Claim
32 words
The process of claim 10, wherein said etch mask pattern comprises mask features, with adjacent mask features being separated by a space that is less than 1/2 micron in a lateral direction.
Claim 21
Dependent Claim
116 words
An etch process for use in the manufacture of integrated circuits comprising the steps of: (a) providing an in-process semiconductor wafer on which have been formed a plurality of primary structural layers, said primary structural layers having been etched in selected regions to form a wafer topography comprising elevated features and recessed regions, said elevated features having acquired re-entrant sidewall profiles during previous processing steps; (b) forming a secondary structural layer, which covers said elevated features; (c) forming an etch mask pattern on said wafer with negative photoresist, said pattern covering certain portions of said secondary structural layer, and exposing other portions of said secondary structural layer; and (d) etching exposed portions of the secondary layer.
Claim 22
Dependent Claim
116 words
An etch process for use in the manufacture of integrated circuits comprising the steps of: (a) providing an in-process semiconductor wafer on which have been formed a plurality of primary structural layers, said primary structural layers having been etched in selected regions to form a wafer topography comprising elevated features and recessed regions, said elevated features having acquired re-entrant sidewall profiles during previous processing steps; (b) forming a secondary structural layer, which covers said elevated features; (c) forming an etch mask pattern on said wafer with negative photoresist, said pattern covering certain portions of said secondary structural layer, and exposing other portions of said secondary structural layer; and (d) etching exposed portions of the secondary layer.
Claim 23
Dependent Claim
28 words
The process of claim 17, wherein the shortest lateral distance between adjacent features is less than two-thirds the average height of said adjacent features above the recessed regions.
Claim 24
Dependent Claim
28 words
The process of claim 17, wherein the shortest lateral distance between adjacent features is less than half the average height of said adjacent features above the recessed regions.
Claim 25
Dependent Claim
28 words
The process of claim 17, wherein the shortest lateral distance between adjacent features is less than one-third the average height of said adjacent features above the recessed regions.
Claim 26
Dependent Claim
179 words
An etch process for use in the manufacture of an integrated circuit comprising the steps of: (a) providing an in-process semiconductor wafer on which have been sequentially formed a plurality of structural layers, said plurality of structural layers including a polycrystalline silicon (poly) layer, a metal silicide layer superjacent the polycrystalline silicon layer, and a silicon dioxide (oxide) layer superjacent the metal silicide layer, said plurality of structural layers having been selectively etched such that the edges of the poly, silicide, and oxide layers were simultaneously exposed to an etching environment in order to form elevated poly-silicide-oxide sandwich features; (b) forming a dielectric coating at the edges of at least the exposed edges of the poly layer and the silicide layer, said dielectric coating endowing each feature with a re-entrant sidewall profile; (c) depositing a conductivity-providing layer, which blankets the wafer; (d) forming an etch mask pattern on said wafer with negative photoresist, said pattern covering certain portions of the conductivity-providing layer, and exposing other portions of the conductivity-providing layer; and (e) etching exposed portions of the conductivity-providing layer.
Claim 27
Dependent Claim
179 words
An etch process for use in the manufacture of an integrated circuit comprising the steps of: (a) providing an in-process semiconductor wafer on which have been sequentially formed a plurality of structural layers, said plurality of structural layers including a polycrystalline silicon (poly) layer, a metal silicide layer superjacent the polycrystalline silicon layer, and a silicon dioxide (oxide) layer superjacent the metal silicide layer, said plurality of structural layers having been selectively etched such that the edges of the poly, silicide, and oxide layers were simultaneously exposed to an etching environment in order to form elevated poly-silicide-oxide sandwich features; (b) forming a dielectric coating at the edges of at least the exposed edges of the poly layer and the silicide layer, said dielectric coating endowing each feature with a re-entrant sidewall profile; (c) depositing a conductivity-providing layer, which blankets the wafer; (d) forming an etch mask pattern on said wafer with negative photoresist, said pattern covering certain portions of the conductivity-providing layer, and exposing other portions of the conductivity-providing layer; and (e) etching exposed portions of the conductivity-providing layer.
Claim 28
Dependent Claim
39 words
The process of claim 21, wherein said dielectric coating is formed by exposing the edges of the poly layer and the silicide layer to an oxidizing environment which converts silicon near the edge of each layer to silicon dioxide.
Claim 29
Dependent Claim
15 words
The process of claim 21, wherein said dielectric coating is formed using chemical vapor deposition.
Claim 30
Dependent Claim
16 words
The process of claim 21, wherein said dielectric coating is formed using plasma-enhanced chemical vapor deposition.
References Cited (Backward Citations)
US5223083A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-04-03 | 1998-10-03 | 1999-04-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-04-03 | 2002-10-03 | 2003-04-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-04-03 | 2006-10-03 | 2007-04-04 | $7700.00 | Window Closed / Lapsed |