US5399236A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for manufacturing a semiconductor device
Assignee: SK Hynix Inc
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Filing: 1993-07-06
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Granted: 1995-03-21
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Expires: 2013-07-06
Abstract
Abstract A method for manufacturing a semiconductor device including the steps of forming a photoresist pattern on a metal layer and forming a wiring by etching a metal composed of aluminum or aluminum alloy with plasma including chlorine and eliminating said photoresist pattern while simultaneously eliminating residual chlorine on the wiring by adding alkyl ketone or alkyl ether in an oxygen plasma ash chamber. The present invention can provide a method for manufacturing a semiconductor device, which can eliminate residual chlorine and a photoresist pattern by adding alkyl ketone or alkyl ether so that wiring corrosion may be prevented.
Inventors
- 👤 Jae H. Ha
- 👤 Hee K. Park
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 19:16
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/20; H10P70/27; H10P70/273; C; C23; C23F; C23F4/00; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/267; H10W; H10W20/00; H10W20/01; H10W20/031
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
58 words
A method for manufacturing a semiconductor device comprising the steps of: forming a photoresist pattern on a metal layer comprising one of aluminum and aluminum alloy; forming wiring by etching said metal layer with plasma including chlorine; and removing said photoresist pattern and residual chlorine on said wiring by adding alkyl ketone in an oxygen plasma ash chamber.
Claim 2
Independent Claim
58 words
A method for manufacturing a semiconductor device comprising the steps of: forming a photoresist pattern on a metal layer comprising one of aluminum and aluminum alloy; forming wiring by etching said metal layer with plasma including chlorine; and removing said photoresist pattern and residual chlorine on said wiring by adding alkyl ketone in an oxygen plasma ash chamber.
Claim 3
Independent Claim
42 words
A method according to 1, wherein an alkyl radical of said alkyl ketone added in said oxygen plasma ash chamber is one of CH 3 , C 2 H 5 , C 3 H 7 , and C 2 H 6 .
Claim 4
Independent Claim
42 words
A method according to 1, wherein an alkyl radical of said alkyl ketone added in said oxygen plasma ash chamber is one of CH 3 , C 2 H 5 , C 3 H 7 , and C 2 H 6 .
Claim 5
Independent Claim
57 words
A method for manufacturing a semiconductor device comprising the steps of: forming photoresist pattern on a metal layer comprising one of aluminum and aluminum alloy; forming wiring by etching said metal layer with plasma including chlorine; and removing said photoresist pattern and residual chlorine on said wiring by adding alkyl ether in an oxygen plasma ash chamber.
Claim 6
Independent Claim
57 words
A method for manufacturing a semiconductor device comprising the steps of: forming photoresist pattern on a metal layer comprising one of aluminum and aluminum alloy; forming wiring by etching said metal layer with plasma including chlorine; and removing said photoresist pattern and residual chlorine on said wiring by adding alkyl ether in an oxygen plasma ash chamber.
Claim 7
Independent Claim
42 words
A method according to 3, wherein an alkyl radical of said alkyl ether added in said oxygen plasma ash chamber is one of CH 3 , C 2 H 5 , C 3 H 7 , and C 2 H 6 .
Claim 8
Independent Claim
42 words
A method according to 3, wherein an alkyl radical of said alkyl ether added in said oxygen plasma ash chamber is one of CH 3 , C 2 H 5 , C 3 H 7 , and C 2 H 6 .
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-03-20 | 1998-09-19 | 1999-03-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-03-20 | 2002-09-19 | 2003-03-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-03-20 | 2006-09-19 | 2007-03-21 | $7700.00 | Window Closed / Lapsed |