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US5397962A Expired / Lapsed US ⏱️ 0.0 years remaining

Source and method for generating high-density plasma with inductive power coupling

Assignee: Texas Instruments Inc
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Filing: 1992-06-29
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Granted: 1995-03-14
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Expires: 2012-06-29
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Abstract

Abstract A source and method for generating high density plasma with inductive radio-frequency power coupling is provided in which coil antenna sections (34) within a plasma source (12) are used to generate a high-density uniform plasma. This plasma is then guided into transferred in a transfer chamber (14) and then to a processing chamber (16). Within the processing chamber (16), the plasma reacts with a semiconductor wafer (18) or another workpiece for plasma-enhanced deposition or etch processing.

Inventors

  • 👤 Mehrdad M. Moslehi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 05:45
CPC Classifications
H; H05; H05H; H05H1/00; H05H1/24; H05H1/46

Claims Analysis

Total Claims: 21
Claim 1
Independent Claim 100 words
A high density plasma source, comprising: a plasma formation chamber having inlets for injecting plasma gases; a magnet disposed around said plasma formation chamber and operable to generate an axial magnetic field within said plasma formation chamber; and a plurality of coil antenna sections disposed within said plasma formation chamber operable to generate a second magnetic field, such that a plasma is generated, said second magnetic field inductively coupled to said plasma and wherein said plurality of coil antenna sections are interconected such that said second magnetic field rotates relative to said axial magnetic field and said plasma formation chamber.
Claim 2
Dependent Claim 100 words
A high density plasma source, comprising: a plasma formation chamber having inlets for injecting plasma gases; a magnet disposed around said plasma formation chamber and operable to generate an axial magnetic field within said plasma formation chamber; and a plurality of coil antenna sections disposed within said plasma formation chamber operable to generate a second magnetic field, such that a plasma is generated, said second magnetic field inductively coupled to said plasma and wherein said plurality of coil antenna sections are interconected such that said second magnetic field rotates relative to said axial magnetic field and said plasma formation chamber.
Claim 3
Dependent Claim 13 words
The plasma source of claim 1, wherein said magnet comprises a permanent magnet.
Claim 4
Dependent Claim 12 words
The plasma source of claim 1, wherein said magnet comprises an electromagnet.
Claim 5
Dependent Claim 26 words
The plasma source of claim 1, wherein said plasma formation chamber is substantially cylindrical and said magnet is disposed substantially concentrically around said plasma formation chamber.
Claim 6
Dependent Claim 33 words
The plasma source of claim 1, wherein said plasma formation chamber is substantially cylindrical, and wherein said plurality of coil antenna sections are spaced apart and disposed axially within said plasma formation chamber.
Claim 7
Dependent Claim 24 words
The plasma source of claim 5, wherein said plurality of coil antenna sections are substantially equidistant from an axis of said plasma formation chamber.
Claim 8
Dependent Claim 28 words
The plasma source of claim 1, wherein said plurality of coil antenna sections are interconnected such that said second magnetic field is transverse to said axial magnetic field.
Claim 9
Dependent Claim 38 words
The plasma source of claim 1, wherein said plurality of coil antenna sections are coupled to a plurality of radio-frequency power sources having a frequency such that said second magnetic field rotates at the rate of said frequency.
Claim 10
Dependent Claim 25 words
The plasma source of claim 1, wherein said plurality of coil antenna sections are coupled to a plurality of out of phase radio-frequency power sources.
Claim 11
Dependent Claim 32 words
The plasma source of claim 1, wherein said plasma formation chamber further comprises an end plate, said end plate having a plurality of electrical feedthroughs for said plurality of coil antenna sections.
Claim 12
Dependent Claim 23 words
The plasma source of claim 1, wherein said plasma formation chamber comprises channels, said channels operable to flow a coolant to dissipate heat.
Claim 13
Dependent Claim 26 words
The plasma source of claim 1, wherein said coil antenna sections are hollow, said hollow coil antenna sections operable to flow a coolant to dissipate heat.
Claim 14
Dependent Claim 23 words
The plasma source of claim 1, wherein each of said coil antenna sections are disposed within one of a plurality of non-reactive tubes.
Claim 15
Dependent Claim 22 words
The plasma source of claim 1, wherein said coil antenna sections terminate in a connector ring disposed within said plasma formation chamber.
Claim 16
Independent Claim 70 words
A method of generating a high-density plasma, comprising the steps of: injecting plasma gases into a plasma formation chamber; generating an axial magnetic field, the magnetic field having components within the plasma formation chamber; and generating a second magnetic field inductively coupled to the high-density plasma, the second magnetic field generated within the plasma formation chamber and wherein said second magnetic field rotates with respect to said axial magnetic field.
Claim 17
Independent Claim 70 words
A method of generating a high-density plasma, comprising the steps of: injecting plasma gases into a plasma formation chamber; generating an axial magnetic field, the magnetic field having components within the plasma formation chamber; and generating a second magnetic field inductively coupled to the high-density plasma, the second magnetic field generated within the plasma formation chamber and wherein said second magnetic field rotates with respect to said axial magnetic field.
Claim 18
Independent Claim 69 words
A method of generating a high-density plasma, comprising the steps of: injecting plasma gases into a plasma formation chamber; generating an axial magnetic field, the magnetic field having components within the plasma formation chamber; and generating a second magnetic field inductively coupled to the high-density plasma, the second magnetic field generated within the plasma formation chamber wherein said second magnetic field rotates with respect to said axial magnetic field.
Claim 19
Independent Claim 69 words
A method of generating a high-density plasma, comprising the steps of: injecting plasma gases into a plasma formation chamber; generating an axial magnetic field, the magnetic field having components within the plasma formation chamber; and generating a second magnetic field inductively coupled to the high-density plasma, the second magnetic field generated within the plasma formation chamber wherein said second magnetic field rotates with respect to said axial magnetic field.
Claim 20
Dependent Claim 17 words
The method of claim 16, wherein the second magnetic field is transverse to the axial magnetic field.
Claim 21
Dependent Claim 19 words
The method of claim 16, and further comprising the step of cooling the plasma formation chamber with a coolant.

References Cited (Backward Citations)

US3814983A Cited
US4496448A Cited
US4810935A Cited
US4871421A Cited
US4990229A Cited
US5091049A Cited
US5122251A Cited
US4948458A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1998-03-13 1998-09-12 1999-03-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2002-03-13 2002-09-12 2003-03-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2006-03-13 2006-09-12 2007-03-14 $7700.00 Window Closed / Lapsed

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