Patent US5384076A successfully refreshed from Google Patents.
← Back to Patent Explorer
US5384076A Expired / Lapsed US ⏱️ 0.0 years remaining

Resistive film-forming composition and electronic components using the same

Assignee: Fujifilm Business Innovation Corp
•
Filing: 1992-03-03
•
Granted: 1995-01-24
•
Expires: 2012-03-03
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A resistive film-forming composition to be coated on a substrate and calcined to form a resistive film is disclosed, which contains an organic iridium compound selected from a compound represented by formula (I): ##STR1## wherein R 1 represents a hydrogen atom, an alkyl group, or an alkoxy group, a compound represented by formula (II): Ir(R.sup.4 COCR.sup.3 COR.sup.5).sub.3 wherein R 3 represents a hydrogen atom or an alkyl group; and R 4 and R 5 each represent an alkyl group. A uniform resistive film having excellent electrical characteristics can be formed with good adhesion to a substrate.

Inventors

  • 👤 Katsuhiro Sato
  • 👤 Kaoru Torikoshi
  • 👤 Hiroyuki Tanaka
  • 👤 Fumiaki Tambo
  • 👤 Yutaka Akasaki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:15
CPC Classifications
H; H01; H01C; H01C17/00; H01C17/06; H01C17/065; H01C17/06506; H01C1/00; H01C1/02

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 77 words
A resistive film-forming composition to be coated on a substrate and calcined to form a resistive film, which contains an organic iridium compound selected from a compound represented by formula (I): ##STR5## wherein R 1 represents a hydrogen atom, an alkyl group, or an alkoxy group, a compound represented by formula (II): Ir(R.sup.4 COCR.sup.3 COR.sup.5).sub.3 wherein R 3 represents a hydrogen atom or an alkyl group; and R 4 and R 5 each represent an alkyl group.
Claim 2
Dependent Claim 77 words
A resistive film-forming composition to be coated on a substrate and calcined to form a resistive film, which contains an organic iridium compound selected from a compound represented by formula (I): ##STR5## wherein R 1 represents a hydrogen atom, an alkyl group, or an alkoxy group, a compound represented by formula (II): Ir(R.sup.4 COCR.sup.3 COR.sup.5).sub.3 wherein R 3 represents a hydrogen atom or an alkyl group; and R 4 and R 5 each represent an alkyl group.
Claim 3
Dependent Claim 21 words
A resistive film-forming composition as claimed in claim 1, which further contains a solvent capable of dissolving said organic iridium compound.
Claim 4
Dependent Claim 15 words
A resistive film-forming composition as claimed in claim 2, which further contains a viscosity adjustor.
Claim 5
Dependent Claim 25 words
A resistive film-forming composition as claimed in claim 3, which further contains an organometallic or organo-non-metallic compound for adjustment of resistivity of a resistive film.
Claim 6
Dependent Claim 37 words
A resistive film-forming composition as claimed in claim 4, wherein said organometallic or organo-non-metallic compound contains at least one element selected from the group consisting of silicon, bismuth, lead, aluminum, zirconium, calcium, tin, boron, titanium, and barium.
Claim 7
Dependent Claim 33 words
A resistive-film-forming composition as claimed in claim 1, wherein said organic iridium compound is contained in an amount of 1 to 50 wt % based on the weight of the resistive film-forming composition.
Claim 8
Dependent Claim 32 words
A resistive film-forming composition as claimed in claim 5, wherein said organometallic or organo-non-metallic compound is contained in an amount of 0.1 to 10 moles per mole of said organic iridium compound.
Claim 9
Dependent Claim 15 words
A resistive film-forming composition as claimed in claim 1, wherein said iridium compound is ##STR6##
Claim 10
Dependent Claim 19 words
A resistive film-forming composition as claimed in claim 1, wherein the organic iridium compound is Ir(R.sup.4 COCR.sup.3 COR.sup.5).sub.3 (II)
Claim 11
Dependent Claim 55 words
A resistive film-forming composition as claimed in claim 1, wherein said organic iridium compound is a tris benzylideneanthranilate selected from the group consisting of Iridium propionate, Iridium n-butylate, Iridium 2-methylpropionate, Iridium n-pentanoate, Iridium 2-methylbutyrate, Iridium 3-methylbutyrate, Iridium pivalate, Iridium n-hexanoate, Iridium n-octanoate, Iridium n-decanoate, Iridium n-dodecanoate, Iridium n-tetradecanoate, Iridium n-hexadecanoate, Iridium n-octadecanoate and Iridium oleate.
Claim 12
Dependent Claim 56 words
A resistive film-forming composition as claimed in claim 1, wherein said organic iridium compound is a dionate selected from the group consisting of Iridium acetylacetonate, Iridium 3,5-heptanedionate, Iridium 4,6-nonanedionate, Iridium 2,6-dimethyl-3,5-heptanedionate, Iridium 5,7-undecanedionate, Iridium 3,7-dimethyl-4,6-nonanedionate, Iridium 2,8-dimethyl-4,6-nonanedionate, Iridium 2,2,6,6-tetramethyl-3,5-heptanedionate, Iridium 3-methyl-2,4-pentanedionate, Iridium 4-methyl-3,5-pentanedionate, Iridium 5-methyl-4,6-nonanedionate, Iridium 2,4,6-trimethyl-3,5-pentanedionate, Iridium 6-methyl-5,7-undecanedionate, Iridium 3,5,7-trimethyl-4,6-nonanedionate, Iridium 2,5,8-trimethyl-4,6-nonanedionate, and Iridium 2,2,4,6,6-pentamethyl-3,5-heptanedionate.

References Cited (Backward Citations)

JPS6454710A Cited
JPH01220402A Cited
JPH01286401A Cited
US5001598A Cited
US5122777A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1998-01-23 1998-07-25 1999-01-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2002-01-23 2002-07-25 2003-01-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2006-01-23 2006-07-25 2007-01-24 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag