US5381807A
Expired / Lapsed
US
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Method of stripping resists from substrates using hydroxylamine and alkanolamine
Assignee: EKC Technology Inc
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Filing: 1993-10-28
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Granted: 1995-01-17
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Expires: 2013-10-28
Abstract
Abstract A stripping composition for removing resists from substrates containing hydroxylamine and at least one alkanolamine is described. Optionally, one or more polar solvents can also be included in the stripping composition. The stripping composition is especially suitable for removing a photoresist from a substrate during the manufacture of semiconductor integrated circuits and for removing cured polymer coatings, such as polyimide coatings.
Inventors
- 👤 Wai M. Lee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 21:51
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/20; H10P70/27; H10P70/273; B; B24; B24B; B24B37/00; B24B37/04; B24B37/042; C; C09; C09D; C09D9/00; C11; C11D; C11D3/00; C11D3/16; C11D3/20; C11D3/2003; C11D3/2041; C11D3/2058; C11D3/2065; C11D3/2075; C11D3/2086; C11D3/26; C11D3/30; C11D3/34; C11D3/3427; C11D3/3472; C11D3/43; C11D7/00; C11D7/22; C11D7/26; C11D7/261; C11D7/262; C11D7/263; C11D7/265; C11D7/267; C11D7/32; C11D7/3209; C11D7/3218; C11D7/3227; C11D7/3245; C11D7/3254; C11D7/3263; C11D7/3272; C11D7/3281; C11D7/34; C11D7/50; C11D7/5004; C11D7/5013; C23; C23G; C23G1/00; C23G1/02; C23G1/10; C23G1/103; C23G1/14; C23G1/20; C23G1/205; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/423; G03F7/425; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; H10P70/23; H10P70/234; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/063; H10W20/071; H10W20/081; C11D2111/00; C11D2111/10; C11D2111/14; C11D2111/22; C11D2111/24; H10P70/10; H10P70/15
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
57 words
A method of removing a resist from a substrate comprising contacting a substrate having a resist coating present thereon with a composition consisting essentially of hydroxylamine and at least one alkanolamine which is miscible with said hydroxylamine in an amount sufficient and at a temperature and for a time sufficient to remove said resist from said substrate.
Claim 2
Independent Claim
57 words
A method of removing a resist from a substrate comprising contacting a substrate having a resist coating present thereon with a composition consisting essentially of hydroxylamine and at least one alkanolamine which is miscible with said hydroxylamine in an amount sufficient and at a temperature and for a time sufficient to remove said resist from said substrate.
Claim 3
Dependent Claim
12 words
A method according to claim 1 wherein said resist is a photoresist.
Claim 4
Dependent Claim
13 words
A method according to claim 1 wherein said resist is a polyimide coating.
Claim 5
Dependent Claim
20 words
A method according to claim 1 wherein said hydroxylamine is present in an amount of from about 5%-90% by weight.
Claim 6
Dependent Claim
23 words
A method according to claim 1 wherein said at least one alkanolamine is present in an amount of from about 10%-95% by weight.
Claim 7
Dependent Claim
17 words
A method according to claim 1 wherein said stripping composition further comprises at least one polar solvent.
Claim 8
Dependent Claim
24 words
A method according to claim 6 wherein said at least one polar solvent is present in an amount of at least 5%-85% by weight.
Claim 9
Dependent Claim
57 words
A method according to claim 6 or claim 7 wherein said at least one polar solvent is selected from the group consisting essentially of ethylene glycol, ethylene glycol alkyl ether, diethylene glycol alkyl ether, triethylene glycol alkyl ether, propylene glycol, propylene glycol alkyl ether, dipropylene glycol alkyl ether, tripropylene glycol alkyl ether, N-substituted pyrrolidone, ethylenediamine, and ethylenetriamine.
Claim 10
Dependent Claim
23 words
A method according to claim 1 wherein the alkanol group of said at least one alkanolamine contains from 1 to 5 carbon atoms.
Claim 11
Dependent Claim
24 words
A method according to claim 1 wherein said at least one alkanolamine is selected from a group consisting essentially of monoamines, diamines, and triamines.
Claim 12
Dependent Claim
57 words
A method according to claim 1 wherein said at least one alkanolamine has the formula R 1 R 2 --N--CH 2 CH 2 --O--R 3 wherein R 1 and R 2 can be H, CH 3 , CH 3 CH 2 , or CH 2 CH 2 OH and R 3 is CH 2 CH 2 OH.
Claim 13
Dependent Claim
13 words
A method according to claim 1 wherein said substrate is a semiconductor wafer.
Claim 14
Dependent Claim
20 words
A method according to claim 1 wherein said temperature is in the range of from 50° C. to 150° C.
Claim 15
Dependent Claim
19 words
A method according to claim 1 wherein said time is in the range of from 2 to 30 minutes.
References Cited (Backward Citations)
US4824763A
Cited
US4873136A
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1998-01-16 | 1998-07-18 | 1999-01-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-01-16 | 2002-07-18 | 2003-01-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-01-16 | 2006-07-18 | 2007-01-17 | $7700.00 | Window Closed / Lapsed |