US5380609A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for fabricating photomasks having a phase shift layer comprising the use of a positive to negative resist, substrate imaging and heating
Assignee: Dai Nippon Printing Co Ltd
•
Filing: 1993-07-29
•
Granted: 1995-01-10
•
Expires: 2013-07-29
Abstract
Abstract The invention relates to a method for forming a resist pattern for dry etching a phase shifter layer in which a phase shifter pattern portion and a portion for protecting the surface of a light-blocking pattern are formed by a single photolithographic step. A light-blocking patter 40 is formed on a phase shifter layer 33, followed by the formation of a positive to negative image reversible resist thin film 41. A given region of the resist thin film 41 that includes a part of the unpatterned region thereof is exposed to ionizing radiation 42. Post-exposure baking for image reversal is carried out. Subsequently, the whole back side of the substrate is exposed to ultraviolet light 44 using the light-blocking pattern as a mask, thereby enabling only an unexposed region of the unpatterned resist to be soluble in a developer. The resist thin film 41 is developed to form a resist pattern 45.
Inventors
- 👤 Hiroshi Fujita
- 👤 Masaaki Kurihara
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 22:36
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2022; H; H10; H10P; H10P76/00; G03F1/00; G03F1/26; G03F1/30
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
178 words
A method for fabricating a photomask having a phase shift layer, in which a transparent substrate is provided thereon with a phase shifter pattern and a light-blocking pattern in this order, characterized by: forming the light-blocking pattern on a phase shifter layer, followed by the formation of a positive to negative image reversible resist thin film, exposing to ionizing radiation a given region of the resist thin film that includes a part of the unpatterned region thereof, carrying out post-exposure baking for image reversal, exposing the whole back side of the substrate to ultraviolet light using the light-blocking pattern as a mask, thereby enabling only a region of the unpatterned resist, as patterned per the first ionizing radiation exposure, that was not exposed during the first ionizing radiation exposure and was exposed during the ultraviolet light exposure, to be soluble in a developer, developing the resist thin film to form a resist pattern, and using the resist pattern as a mask to etch an unmasked region of the phase shifter layer, whereby the phase shifter pattern is formed.
Claim 2
Independent Claim
178 words
A method for fabricating a photomask having a phase shift layer, in which a transparent substrate is provided thereon with a phase shifter pattern and a light-blocking pattern in this order, characterized by: forming the light-blocking pattern on a phase shifter layer, followed by the formation of a positive to negative image reversible resist thin film, exposing to ionizing radiation a given region of the resist thin film that includes a part of the unpatterned region thereof, carrying out post-exposure baking for image reversal, exposing the whole back side of the substrate to ultraviolet light using the light-blocking pattern as a mask, thereby enabling only a region of the unpatterned resist, as patterned per the first ionizing radiation exposure, that was not exposed during the first ionizing radiation exposure and was exposed during the ultraviolet light exposure, to be soluble in a developer, developing the resist thin film to form a resist pattern, and using the resist pattern as a mask to etch an unmasked region of the phase shifter layer, whereby the phase shifter pattern is formed.
Claim 3
Dependent Claim
30 words
A method for fabricating a photomask having a phase shift layer as claimed in claim 1, characterized in that said phase shifter pattern is formed by etching a quartz substrate.
Claim 4
Independent Claim
46 words
A method for fabricating a photomask having a phase shift layer as claimed in any one of claims 1-2, characterized in that a novolak resin base resist using naphthoquinone-diazido-4-sulfonic acid ester as the photosensitive material is used for said positive to negative image reversible type resist.
Claim 5
Dependent Claim
34 words
A method for fabricating a photomask having a phase shift layer as claimed in claim 3, characterized in that said novolak resin base resist further contains 0.2 to 15% by weight of polyethylene glycol.
Claim 6
Dependent Claim
47 words
A method for fabricating a photomask having a phase shift layer as claimed in claim 3, characterized in that the resist thin film obtained after the coating of said novolak resin base resist is coated with, or dipped in, polyethylene glycol, followed by exposure to ionizing radiation,
Claim 7
Independent Claim
41 words
A method for fabricating a photomask having a phase shift layer as claimed in any one of claims 1-2, characterized in that a positive type of chemical amplification resin is used as said positive to negative image reversible resist thin film.
Claim 8
Independent Claim
188 words
A method for fabricating a photomask having a phase shift layer in which a transparent substrate is provided thereon with a light-blocking pattern and a phase shifter pattern in this order, characterized by: forming the light-blocking pattern on the substrate, followed by the formation of a phase shifter layer to form the phase shifter pattern, forming a positive to negative image reversible type resist thin film, exposing to ionizing radiation a given region of the resist thin film that includes a part of the unpatterned region thereof, carrying out post-exposure baking for image reversal, exposing the whole back side of the substrate to ultraviolet light using the light-blocking pattern as a mask, thereby enabling only a region of the unpatterned resist, as patterned per the first ionizing radiation exposure, that was not exposed during the first ionizing radiation exposure and was exposed during the ultraviolet light exposure, to be soluble in a developer, developing the resist thin film to form a resist pattern, and using the resist pattern as a mask to etch an unmasked region of the phase shifter layer, whereby the phase shifter pattern is formed.
Claim 9
Independent Claim
188 words
A method for fabricating a photomask having a phase shift layer in which a transparent substrate is provided thereon with a light-blocking pattern and a phase shifter pattern in this order, characterized by: forming the light-blocking pattern on the substrate, followed by the formation of a phase shifter layer to form the phase shifter pattern, forming a positive to negative image reversible type resist thin film, exposing to ionizing radiation a given region of the resist thin film that includes a part of the unpatterned region thereof, carrying out post-exposure baking for image reversal, exposing the whole back side of the substrate to ultraviolet light using the light-blocking pattern as a mask, thereby enabling only a region of the unpatterned resist, as patterned per the first ionizing radiation exposure, that was not exposed during the first ionizing radiation exposure and was exposed during the ultraviolet light exposure, to be soluble in a developer, developing the resist thin film to form a resist pattern, and using the resist pattern as a mask to etch an unmasked region of the phase shifter layer, whereby the phase shifter pattern is formed.
References Cited (Backward Citations)
US4948706A
Cited
US5244759A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-01-09 | 1998-07-11 | 1999-01-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-01-09 | 2002-07-11 | 2003-01-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-01-09 | 2006-07-11 | 2007-01-10 | $7700.00 | Window Closed / Lapsed |