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US5379150A
Expired / Lapsed
US
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Method of manufacturing a spatial frequency filter for use in a pattern defect detection device
Assignee: Mitsubishi Electric Corp
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Filing: 1993-12-30
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Granted: 1995-01-03
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Expires: 2013-12-30
Abstract
Abstract A spatial frequency filter used in a pattern defect detection device, including a pattern which includes a black spot having a diameter expanded by a controlled amount in comparison with the diameter of a black spot on a photosensitive plate obtained by exposure by diffracted light from a pattern on a model specimen.
Inventors
- 👤 Yoko Miyazaki
- 👤 Toshimasa Tomoda
- 👤 Hitoshi Tanaka
- 👤 Nobuyuki Kosaka
- 👤 Toyomi Ohshige
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 15:46
CPC Classifications
G; G01; G01B; G01B11/00; G01B11/24; G01N; G01N21/00; G01N21/84; G01N21/88; G01N21/95; G01N21/956; G01N21/95623; G06; G06V; G06V10/00; G06V10/88
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
74 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light to a pattern on a model specimen, focusing diffracted light from said pattern by a lens onto a photosensitive plate to expose said photosensitive plate, while changing the tilt-azimuth angle of said specimen so that the incident angle of said light varies within a predetermined range, and developing the exposed photosensitive plate.
Claim 2
Independent Claim
74 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light to a pattern on a model specimen, focusing diffracted light from said pattern by a lens onto a photosensitive plate to expose said photosensitive plate, while changing the tilt-azimuth angle of said specimen so that the incident angle of said light varies within a predetermined range, and developing the exposed photosensitive plate.
Claim 3
Independent Claim
77 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light from a light source to a mirror, focusing diffracted light from a pattern an a model specimen to a photosensitive plate by a lens to expose said photosensitive plate, while moving said mirror so that the incident angle of said light to said pattern varies within a predetermined range, and developing the exposed photosensitive plate.
Claim 4
Independent Claim
77 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light from a light source to a mirror, focusing diffracted light from a pattern an a model specimen to a photosensitive plate by a lens to expose said photosensitive plate, while moving said mirror so that the incident angle of said light to said pattern varies within a predetermined range, and developing the exposed photosensitive plate.
Claim 5
Independent Claim
73 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light to a pattern on a model specimen, focusing diffracted light from said pattern to a photosensitive plate by a lens, exposing said photosensitive plate with said diffracted light while moving said photosensitive plate within a predetermined range in two dimensional directions traversing said diffracted light, and developing the exposed photosensitive plate.
Claim 6
Independent Claim
73 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light to a pattern on a model specimen, focusing diffracted light from said pattern to a photosensitive plate by a lens, exposing said photosensitive plate with said diffracted light while moving said photosensitive plate within a predetermined range in two dimensional directions traversing said diffracted light, and developing the exposed photosensitive plate.
Claim 7
Independent Claim
66 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light to a pattern on a model specimen, exposing a plurality of superimposed photosensitive plates by diffracted light from said pattern, developing the exposed said plurality of superimposed photosensitive plates, to obtain a spatial frequency filter including a plurality of plates of developed photosensitive plates.
Claim 8
Independent Claim
66 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light to a pattern on a model specimen, exposing a plurality of superimposed photosensitive plates by diffracted light from said pattern, developing the exposed said plurality of superimposed photosensitive plates, to obtain a spatial frequency filter including a plurality of plates of developed photosensitive plates.
Claim 9
Independent Claim
77 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light to a pattern, exposing a first photosensitive plate by diffracted light from said pattern, developing said exposed first photosensitive plate, exposing a second photosensitive plate superimposed behind said developed first photosensitive plate by said diffracted light, developing the exposed second photosensitive plate, to obtain a spatial frequency filter including developed first and second photosensitive plates.
Claim 10
Independent Claim
77 words
A method of manufacturing a spatial frequency filter used in a pattern defect detection device, comprising the steps of: directing coherent light to a pattern, exposing a first photosensitive plate by diffracted light from said pattern, developing said exposed first photosensitive plate, exposing a second photosensitive plate superimposed behind said developed first photosensitive plate by said diffracted light, developing the exposed second photosensitive plate, to obtain a spatial frequency filter including developed first and second photosensitive plates.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1998-01-02 | 1998-07-04 | 1999-01-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-01-02 | 2002-07-04 | 2003-01-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-01-02 | 2006-07-04 | 2007-01-03 | $7700.00 | Window Closed / Lapsed |