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US5373462A Expired / Lapsed US ⏱️ 0.0 years remaining

Non-volatile storage cell of the metal - ferroelectric - semiconductor type

Assignee: Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
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Filing: 1993-02-16
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Granted: 1994-12-13
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Expires: 2013-02-16
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Abstract

Abstract A process for producing an improved non-volatile storage cell of the metal-ferroelectric-semiconductor type is provided. The non-volatile storage cell has at least one metal-ferroelectric-semiconductor transistor formed in a semiconductor substrate and having a source (5), a drain (6), and a gate (4). The gate is insulated from the source and the drain by a ferroelectric layer (2). The transistor has at least one lateral programming electrode (BL) in contact with the ferroelectric layer and insulated from the gate. In a preferred embodiment the cell also has a dielectric layer (7) interposed between the ferroelectric layer and the substrate. Particular utility for the present invention is found in the area of static memory devices, although other utilities are contemplated.

Inventors

  • 👤 Herve Achard
  • 👤 Jean-Pierre Joly

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 01:16
CPC Classifications
G; G11; G11C; G11C11/00; G11C11/21; G11C11/22; G11C11/223

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 77 words
A non-volatile storage cell having at least one metal-ferroelectric-semiconductor transistor having a drain, a source, and a gate, said gate being insulated from said source and drain by a ferroelectric layer disposed upon a substrate, said cell comprising at least one lateral programming electrode in contact with a vertical wall of said ferroelectric layer but electrically discontinuous from said gate, and respective source and drain electrodes, said programming electrode being separate from said source and drain electrodes.
Claim 2
Dependent Claim 77 words
A non-volatile storage cell having at least one metal-ferroelectric-semiconductor transistor having a drain, a source, and a gate, said gate being insulated from said source and drain by a ferroelectric layer disposed upon a substrate, said cell comprising at least one lateral programming electrode in contact with a vertical wall of said ferroelectric layer but electrically discontinuous from said gate, and respective source and drain electrodes, said programming electrode being separate from said source and drain electrodes.
Claim 3
Dependent Claim 22 words
A cell according to claim 1, and further comprising a layer of insulating material interposed between said ferroelectric layer and said substrate.

References Cited (Backward Citations)

US2791759A Cited
US3832700A Cited
FR2323228A1 Cited
US4888630A Cited
US5198994A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-12-12 1998-06-13 1998-12-13 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-12-12 2002-06-13 2002-12-13 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-12-12 2006-06-13 2006-12-13 $7700.00 Window Closed / Lapsed

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