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US5364743A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for fabrication of bubble jet using positive resist image reversal for lift off of passivation layer

Assignee: Xerox Corp
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Filing: 1992-12-31
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Granted: 1994-11-15
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Expires: 2012-12-31
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Abstract

Abstract In bubble jet heater dies, a photolithographic process is disclosed to form patterned photoresist structures having re-entrant angles to facilitate an improved lift-off structure for anti-cavitation layer deposition. A substrate is coated with a photoresist which includes 0.5% to 1.0% Monazoline C. When exposed to Ultra-Violet light and developed, apertures in the photoresist have inverted side walls. Anti-cavitation material, such as tantalum, is then sputtered onto the substrate and the photoresist to form patterned metal. structures. The lift-off of the patterned photoresist is easily performed leaving behind the patterned metal structures. The use of this lift-off deposition method prevents stress-cracking in the anti-cavitation layer seen in deposition and etch methods.

Inventors

  • 👤 James F. O'Neill

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 12:50
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2022; G03F7/004; G03F7/022; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49401

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 177 words
A method of forming patterned anti-cavitation damage layers in isolated regions in a thermal ink jet print head in order to avoid stress cracking, said thermal ink jet print head comprising heaters, said method comprising: coating a heater on a substrate of said thermal ink jet print head with modified photoresist to form a photoresist layer; exposing said photoresist layer, said heater and said substrate with electromagnetic radiation through a mask, said mask comprising areas transparent and opaque to said electromagnetic radiation; baking said substrate, said heater and photoresist layer for a period of time; blanket exposing said substrate, said heater and photoresist layer for a period of time; developing said photoresist layer sufficiently to form patterned structures in said photoresist layer, said patterned structures having inverted side walls; depositing metal onto said heater and photoresist layer sufficiently to form a patterned anti-cavitation damage layer in isolated regions of said substrate such that stress cracking in said anti-cavitation damage layer is avoided; and removing said photoresist layer, such that said patterned anti-cavitation layer remains on said heater.
Claim 2
Independent Claim 177 words
A method of forming patterned anti-cavitation damage layers in isolated regions in a thermal ink jet print head in order to avoid stress cracking, said thermal ink jet print head comprising heaters, said method comprising: coating a heater on a substrate of said thermal ink jet print head with modified photoresist to form a photoresist layer; exposing said photoresist layer, said heater and said substrate with electromagnetic radiation through a mask, said mask comprising areas transparent and opaque to said electromagnetic radiation; baking said substrate, said heater and photoresist layer for a period of time; blanket exposing said substrate, said heater and photoresist layer for a period of time; developing said photoresist layer sufficiently to form patterned structures in said photoresist layer, said patterned structures having inverted side walls; depositing metal onto said heater and photoresist layer sufficiently to form a patterned anti-cavitation damage layer in isolated regions of said substrate such that stress cracking in said anti-cavitation damage layer is avoided; and removing said photoresist layer, such that said patterned anti-cavitation layer remains on said heater.
Claim 3
Dependent Claim 20 words
The method of claim 1, wherein in said coating step, said photoresist includes 0.5% to 1.0% of a 1-hydroxyethyl-2 alkylimidazoline.
Claim 4
Dependent Claim 14 words
The method of claim 2 wherein in said depositing step, said metal is tantalum.
Claim 5
Dependent Claim 18 words
The method of claim 2 wherein in said baking step, said period of time is approximately ten minutes.
Claim 6
Dependent Claim 27 words
The method of claim 2 wherein in said baking step, said substrate and patterned photoresist layer are heated to a temperature between 95° C. and 100° C.
Claim 7
Dependent Claim 16 words
The method of claim 2 wherein in said exposing step, said electromagnetic radiation is Ultra-Violet light.
Claim 8
Independent Claim 244 words
A method of forming patterned anti-cavitation damage layers in isolated regions in a thermal ink jet print head in order to avoid stress cracking by physical forces that act upon a blanket coated layer, said thermal ink jet print head comprising heaters, said method comprising: providing a substrate of a thermal ink jet print head; said substrate having a plurality of heaters being equally spaced apart and having a density of between 150 and 1200 heater per inch; coating said plurality of heaters on said substrate of said thermal ink jet print head with modified photoresist to form a photoresist layer; exposing said photoresist layer, said heaters and said substrate with electromagnetic radiation through a mask, said mask comprising areas transparent and opaque to said electromagnetic radiation; baking said substrate, said heaters and photoresist layer for a period of time; blanket exposing said substrate, said heaters and photoresist layer for a period of time; developing said photoresist layer sufficiently to form patterned structures in said photoresist layer, said patterned structures having inverted side walls; depositing metal onto said heater and photoresist layer sufficiently to form a patterned anti-cavitation damage layer in isolated regions of said substrate over each of said heaters such that stress cracking in said anti-cavitation damage layer due to blanket coating said anti-cavitation damage layer over a relatively large area of said substrate is avoided; and removing said photoresist layer, such that said each patterned anti-cavitation layer remains on said heater.
Claim 9
Independent Claim 244 words
A method of forming patterned anti-cavitation damage layers in isolated regions in a thermal ink jet print head in order to avoid stress cracking by physical forces that act upon a blanket coated layer, said thermal ink jet print head comprising heaters, said method comprising: providing a substrate of a thermal ink jet print head; said substrate having a plurality of heaters being equally spaced apart and having a density of between 150 and 1200 heater per inch; coating said plurality of heaters on said substrate of said thermal ink jet print head with modified photoresist to form a photoresist layer; exposing said photoresist layer, said heaters and said substrate with electromagnetic radiation through a mask, said mask comprising areas transparent and opaque to said electromagnetic radiation; baking said substrate, said heaters and photoresist layer for a period of time; blanket exposing said substrate, said heaters and photoresist layer for a period of time; developing said photoresist layer sufficiently to form patterned structures in said photoresist layer, said patterned structures having inverted side walls; depositing metal onto said heater and photoresist layer sufficiently to form a patterned anti-cavitation damage layer in isolated regions of said substrate over each of said heaters such that stress cracking in said anti-cavitation damage layer due to blanket coating said anti-cavitation damage layer over a relatively large area of said substrate is avoided; and removing said photoresist layer, such that said each patterned anti-cavitation layer remains on said heater.
Claim 10
Dependent Claim 35 words
The method of claim 7 wherein said heaters are placed on said substrate with a density of 300 heaters per inch, such that each anti-cavitation damage layer as a width between 61 and 81 μm.
Claim 11
Dependent Claim 16 words
The method of claim 8 wherein each anti-cavitation damage layer has a length of 144 μm.
Claim 12
Dependent Claim 30 words
The method of claim 9 wherein said providing step includes providing a substrate wherein each of said heaters are substantially identical in configuration, rectangularly shaped, and arranged in parallel fashion.

References Cited (Backward Citations)

US4104070A Cited
US4659650A Cited
US4710263A Cited
US5049231A Cited
JPS6377027A Cited
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US4947193A Cited
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US5063655A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-11-14 1998-05-16 1998-11-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-11-14 2002-05-16 2002-11-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-11-14 2006-05-16 2006-11-15 $7700.00 Window Closed / Lapsed

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