Apparatus for processing photosensitive material

Claim 2

In an apparatus for processing photosensitive material, the apparatus having, a processing chamber, said chamber having an entrance and an exit for allowing a photosensitive material to travel through the processing chamber, first supply means for supplying processing fluid to the processing chamber to create a first fluid layer on one side of the photosensitive material, a first drain for removing processing fluid from the first fluid layer, second supply means for supplying processing fluid to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, the first drain comprises a first duct having an inlet and outlet, the inlet of the first duct being connected to the first drain and the outlet of the first duct being fluidly connected to a sump tank, the improvement comprising: means for minimizing oxidation of the processing solution, comprising a blanket placed in the first duct for covering the processing solution passing therethrough.

Claim 3

In an apparatus according to claim 1 wherein said blanket is made of a closed cellular material.

Claim 4

In, an apparatus according to claim 2 wherein said blanket is made of polypropylene.

Claim 5

In an apparatus for processing photosensitive material, the apparatus having, a processing chamber, said chamber having an entrance and an exit for allowing a photosensitive material to travel through the processing chamber, first supply means for supplying processing fluid to the processing chamber to create a first fluid layer on one side of the photosensitive material, a first drain for removing processing fluid from the first fluid layer, second supply means for supplying processing fluid to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, the first drain comprises a first duct having an inlet and outlet, the inlet of the first duct being connected to the first drain and the outlet of the first duct being fluidly connected to a sump tank, the improvement comprising: means for minimizing oxidation of the processing solution, and a pair of nip rollers disposed adjacent the exit and entrance, said means for minimizing oxidation comprising a weir formed between the nip rollers and the side of the adjacent tank, said weir being designed so as to prevent turbulent flow of processing solution adjacent thereto and having a) first means for regulating overflow of processing solution out the weir when no photosensitive material is passing through the nip rollers, said first means comprising an outlet in the bottom of the weir, and b) second means for regulating the overflow of processing solution when photosensitive material is being passed through the nip rollers.

Claim 6

In an apparatus for processing photosensitive material, the apparatus having, a processing chamber, said chamber having an entrance and an exit for allowing a photosensitive material to travel through the processing chamber, first supply means for supplying processing fluid to the processing chamber to create a first fluid layer on one side of the photosensitive material, a first drain for removing processing fluid from the first fluid layer, second supply means for supplying processing fluid to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, the first drain comprises a first duct having an inlet and outlet, the inlet of the first duct being connected to the first drain and the outlet of the first duct being fluidly connected to a sump tank, the improvement comprising: means for minimizing oxidation of the processing solution, and a pair of nip rollers disposed adjacent the exit and entrance, said means for minimizing oxidation comprising a weir formed between the nip rollers and the side of the adjacent tank, said weir being designed so as to prevent turbulent flow of processing solution adjacent thereto and having a) first means for regulating overflow of processing solution out the weir when no photosensitive material is passing through the nip rollers, said first means comprising an outlet in the bottom of the weir, and b) second means for regulating the overflow of processing solution when photosensitive material is being passed through the nip rollers.

Claim 7

In an apparatus for processing photosensitive material, the apparatus having, a process chamber, said chamber having an entrance and an exit for allowing a photosensitive material to travel through the processing chamber, first supply means for supplying processing fluid to the processing chamber to create a first fluid layer on one side of the photosensitive material, a first drain for removing processing fluid from the first fluid layer, second supply means for supplying processing fluid to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, the first drain comprises a first duct having an inlet and outlet, the inlet of the first duct being connected to the first drain and the outlet of the first duct being fluidly connected to a sump tank, the improvement comprising: means for minimizing oxidation of the processing solution, including a dam disposed below the bottom roller of said nip rollers.

Claim 8

In an apparatus for processing photosensitive material, the apparatus having, a process chamber, said chamber having an entrance and an exit for allowing a photosensitive material to travel through the processing chamber, first supply means for supplying processing fluid to the processing chamber to create a first fluid layer on one side of the photosensitive material, a first drain for removing processing fluid from the first fluid layer, second supply means for supplying processing fluid to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, the first drain comprises a first duct having an inlet and outlet, the inlet of the first duct being connected to the first drain and the outlet of the first duct being fluidly connected to a sump tank, the improvement comprising: means for minimizing oxidation of the processing solution, including a dam disposed below the bottom roller of said nip rollers.

Claim 9

In an apparatus according to claim 5 wherein said dam and said bottom roller are spaced a distance apart of about 0.025 inches (0.0635 cm).

Claim 10

In an apparatus for processing photosensitive material, the apparatus having an upper tank for retaining a processing fluid and a lower tank for retaining the processing fluid, a processing chamber located between the upper tank and lower tanks, said processing chamber having an entrance and an exit for allowing the photosensitive material to travel through the chamber, first supply means for supplying processing fluid from the upper tank to the processing chamber to create a first fluid layer on one side of the photosensitive material, a first drain located for removing processing fluid from the first fluid layer, second supply means for supplying processing fluid from the lower tank to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, a pair of nip rollers located adjacent the entrance and exit for moving the photosensitive material through the chamber; the improvement comprising: means located adjacent the nip rollers for minimizing oxidation of the processing solution, comprising, a weir formed between the nip rollers and the side of the adjacent tank designed so as to prevent turbulent flow of processing solution adjacent thereto, said weir having first means for regulating overflow of processing solution out the weirs when no photosensitive material is passing through the nip rollers.

Claim 11

In an apparatus for processing photosensitive material, the apparatus having an upper tank for retaining a processing fluid and a lower tank for retaining the processing fluid, a processing chamber located between the upper tank and lower tanks, said processing chamber having an entrance and an exit for allowing the photosensitive material to travel through the chamber, first supply means for supplying processing fluid from the upper tank to the processing chamber to create a first fluid layer on one side of the photosensitive material, a first drain located for removing processing fluid from the first fluid layer, second supply means for supplying processing fluid from the lower tank to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, a pair of nip rollers located adjacent the entrance and exit for moving the photosensitive material through the chamber; the improvement comprising: means located adjacent the nip rollers for minimizing oxidation of the processing solution, comprising, a weir formed between the nip rollers and the side of the adjacent tank designed so as to prevent turbulent flow of processing solution adjacent thereto, said weir having first means for regulating overflow of processing solution out the weirs when no photosensitive material is passing through the nip rollers.

Claim 12

In an apparatus according to claim 7 wherein said first means for regulating overflow of processing solution out of the weir comprises an outlet in the bottom of the weir.

Claim 13

In an apparatus according to claim 8 wherein said outlet is an circular opening having a diameter of about 0.31 inches (7.9 mm).

Claim 14

In an apparatus according to claim 7 wherein said weir is further provided with second means for regulating the over flow of processing solution when photosensitive material is being passed through the nip rollers.

Claim 15

In an apparatus according to claim 10 wherein said second means for regulating over flow of processing solution when photosensitive material is being passed through the nip rollers comprises at least one opening provided in the sides of each weir located that excess processing solution passes out the weir.

Claim 16

In an apparatus for processing photosensitive material, the apparatus having an upper tank for retaining a processing fluid and a lower tank for retaining the processing fluid, a processing chamber located between the upper tank and lower tanks, said processing chamber having an entrance and an exit for allowing the photosensitive material to travel through the chamber, first supply means for supplying processing fluid from the upper tank to the processing chamber to create a first fluid layer on one side of the photosensitive material, a first drain located for removing processing fluid from the first fluid layer, second supply means for supplying processing fluid from the lower tank to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, a pair of nip rollers located adjacent the entrance and exit for removing the photosensitive material through the chamber; the improvement comprising: means located adjacent the nip rollers for minimizing oxidation of the processing solution and a first duct having an inlet and outlet, the inlet of the first duct being connected to the first drain and the outlet of the first duct being fluidly connected to a sump tank.

Claim 17

In an apparatus for processing photosensitive material, the apparatus having an upper tank for retaining a processing fluid and a lower tank for retaining the processing fluid, a processing chamber located between the upper tank and lower tanks, said processing chamber having an entrance and an exit for allowing the photosensitive material to travel through the chamber, first supply means for supplying processing fluid from the upper tank to the processing chamber to create a first fluid layer on one side of the photosensitive material, a first drain located for removing processing fluid from the first fluid layer, second supply means for supplying processing fluid from the lower tank to the processing chamber to create a second fluid layer on the opposite side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, a pair of nip rollers located adjacent the entrance and exit for removing the photosensitive material through the chamber; the improvement comprising: means located adjacent the nip rollers for minimizing oxidation of the processing solution and a first duct having an inlet and outlet, the inlet of the first duct being connected to the first drain and the outlet of the first duct being fluidly connected to a sump tank.

Claim 18

In an apparatus according to claim 12 wherein said means of minimizing oxidation of the processing solution further comprises a blanket placed in the first duct for covering the processing solution passing therethrough.

Claim 19

In an apparatus according to claim 13 wherein said blanket is made of a closed cellular material.

Claim 20

In an apparatus according to claim 13 wherein said blanket is made of polypropylene.

Claim 21

In an apparatus for processing photosensitive material, a narrow processing chamber having an entrance and an exit for allowing the photosensitive material to travel through the chamber, means for supplying a pair of nip rollers located adjacent the entrance and exit for moving the photosensitive material through the chamber; the improvement comprising: means located adjacent the nip rollers for minimizing oxidation of the processing solution and comprising a weir formed between the nip rollers and the entrance and/or exit of the processing chamber so as to prevent turbulent flow of processing solution adjacent thereto, said weir having first means for regulating overflow of processing solution out the weirs when no photosensitive material is passing through the nip rollers.

Claim 22

In an apparatus for processing photosensitive material, a narrow processing chamber having an entrance and an exit for allowing the photosensitive material to travel through the chamber, means for supplying a pair of nip rollers located adjacent the entrance and exit for moving the photosensitive material through the chamber; the improvement comprising: means located adjacent the nip rollers for minimizing oxidation of the processing solution and comprising a weir formed between the nip rollers and the entrance and/or exit of the processing chamber so as to prevent turbulent flow of processing solution adjacent thereto, said weir having first means for regulating overflow of processing solution out the weirs when no photosensitive material is passing through the nip rollers.

Claim 23

In an apparatus according to claim 16 wherein said first means for regulating overflow of processing solution out of the weir comprises an outlet in the bottom of the weir.

Claim 24

In an apparatus according to claim 17 wherein said outlet is a circular opening having a diameter of about 0.31 inches (7.9 mm).

Claim 25

In an apparatus according to claim 17 wherein said weir is further provided with second means for regulating the overflow of processing solution when photosensitive material is being passed through the nip rollers.

Claim 26

In an apparatus according to claim 19 wherein said second means for regulating overflow of processing solution when photosensitive material is being passed through the nip rollers comprises at least one opening provided in the sides of said weir located such that excess processing solution passes out the weir.

Claim 27

In an apparatus for processing photosensitive material, a narrow processing chamber having an entrance and an exit for allowing the photosensitive material to travel through the chamber, means for supplying a pair of nip rollers located adjacent the entrance and exit for moving the photosensitive material through the chamber; the improvement comprising: means located adjacent the nip rollers for minimizing oxidation of the processing solution and comprising a weir formed between the nip rollers and the entrance and/or exit of the processing chamber so as to prevent turbulent flow of processing solution adjacent thereto, said weir including a dam disposed below the bottom roller of said nip rollers.

Claim 28

In an apparatus for processing photosensitive material, a narrow processing chamber having an entrance and an exit for allowing the photosensitive material to travel through the chamber, means for supplying a pair of nip rollers located adjacent the entrance and exit for moving the photosensitive material through the chamber; the improvement comprising: means located adjacent the nip rollers for minimizing oxidation of the processing solution and comprising a weir formed between the nip rollers and the entrance and/or exit of the processing chamber so as to prevent turbulent flow of processing solution adjacent thereto, said weir including a dam disposed below the bottom roller of said nip rollers.

Claim 29

In an apparatus according to claim 21 wherein said dam and said bottom roller are spaced a distance apart of about 0.025 inches (0.0635 ) cms).