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US5353296A Expired / Lapsed US ⏱️ 0.0 years remaining

Materials processing with a high repetition rate isotopic carbon dioxide laser

Assignee: Coherent Inc
•
Filing: 1993-07-12
•
Granted: 1994-10-04
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Expires: 2013-07-12
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Abstract

Abstract An laser system is disclosed for materials processing. The system includes an RF excited, conduction cooled, sealed gas laser. The lasing species in the gas mixture is an isotope of carbon dioxide and in the preferred embodiment is defined by the 13CO2 isotope. The use of the 13CO2 isotope functions to shorten the rise and fall times of the laser pulses. By this arrangement, the laser may be operated at higher repetition rates with a full depth of power modulation.

Inventors

  • 👤 Dale E. Koop

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 05:39
CPC Classifications
H; H01; H01S; H01S3/00; H01S3/09; H01S3/097; H01S3/0975; B; B23; B23K; B23K26/00; B23K26/02; B23K26/06; B23K26/0604; B23K26/062; B23K26/0622; H01S3/14; H01S3/22; H01S3/223; H01S3/2232

Claims Analysis

Total Claims: 45
Claim 1
Independent Claim 117 words
A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected to provide a depth of modulation of said laser output of at least eighty percent at pulse repetition rates up to 20 Khz.
Claim 2
Dependent Claim 117 words
A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected to provide a depth of modulation of said laser output of at least eighty percent at pulse repetition rates up to 20 Khz.
Claim 3
Dependent Claim 45 words
A laser as recited in claim 1 wherein the rise and fall times of each pulse are at least 1.6 times as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species.
Claim 4
Dependent Claim 30 words
A laser as recited in claim 1 wherein said gas mixture includes nitrogen and wherein the pressure of the isotopic carbon dioxide is greater than the pressure of the nitrogen.
Claim 5
Dependent Claim 20 words
A laser as recited in claim 1 wherein said gas mixture consists primarily of isotopic carbon dioxide, helium and xenon.
Claim 6
Dependent Claim 17 words
A laser as recited in claim 1 wherein the lasing species is the 13 CO 2 isotope.
Claim 7
Dependent Claim 133 words
A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected so that the rise and fall times of each pulse are at least 1.6 times as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species.
Claim 8
Dependent Claim 133 words
A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected so that the rise and fall times of each pulse are at least 1.6 times as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species.
Claim 9
Dependent Claim 30 words
A laser as recited in claim 6 wherein said gas mixture includes nitrogen and wherein the pressure of the isotopic carbon dioxide is greater than the pressure of the nitrogen.
Claim 10
Dependent Claim 20 words
A laser as recited in claim 6 wherein said gas mixture consists primarily of isotopic carbon dioxide, helium and xenon.
Claim 11
Dependent Claim 17 words
A laser as recited in claim 6 wherein the lasing species is the 13 CO 2 isotope.
Claim 12
Dependent Claim 29 words
A laser as recited in claim 6 wherein the depth of modulation of said laser output is at least eighty percent at pulse repetition rates greater than 20 Khz.
Claim 13
Dependent Claim 69 words
A laser system for materials processing comprising: a sealed gas discharge laser for generating a pulsed output beam and with the lasing gas being predominantly an isotope of carbon dioxide, whereby said laser can be operated at repetition rates in a range between 10 and 20 Khz while maintaining a depth of modulation between the output pulses; and means for directing the beam to the material to be processed.
Claim 14
Dependent Claim 69 words
A laser system for materials processing comprising: a sealed gas discharge laser for generating a pulsed output beam and with the lasing gas being predominantly an isotope of carbon dioxide, whereby said laser can be operated at repetition rates in a range between 10 and 20 Khz while maintaining a depth of modulation between the output pulses; and means for directing the beam to the material to be processed.
Claim 15
Dependent Claim 18 words
A laser system as recited in claim 11 wherein said lasing gas is excited with an RF signal.
Claim 16
Dependent Claim 46 words
A laser system as recited in claim 11 wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the gas mixture includes nitrogen and wherein the pressure of the isotopic carbon dioxide is greater than the pressure of the nitrogen.
Claim 17
Dependent Claim 35 words
A laser system as recited in claim 11 wherein the gas in the sealed discharge laser is defined by a gas mixture wherein the gas mixture consists primarily of isotopic carbon dioxide, helium and xenon.
Claim 18
Dependent Claim 18 words
A laser system as recited in claim 11 wherein the lasing species is the 13 CO 2 isotope.
Claim 19
Dependent Claim 26 words
A laser system as recited in claim 11 further including a means for directing a standard carbon dioxide assist gas to the material to be processed.
Claim 20
Dependent Claim 95 words
A laser system for materials processing comprising: a sealed gas discharge laser for generating a pulsed output beam and with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected to provide a depth of modulation of said laser output of at least eighty percent at pulse repetition rates up to 20 Khz; and means for directing the beam to the material to be processed.
Claim 21
Dependent Claim 95 words
A laser system for materials processing comprising: a sealed gas discharge laser for generating a pulsed output beam and with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected to provide a depth of modulation of said laser output of at least eighty percent at pulse repetition rates up to 20 Khz; and means for directing the beam to the material to be processed.
Claim 22
Dependent Claim 18 words
A laser system as recited in claim 17 wherein the lasing species is the 13 CO 2 isotope.
Claim 23
Dependent Claim 111 words
A laser system for materials processing comprising: a sealed gas discharge laser for generating a pulsed output beam and with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected so that the rise and fall times of each pulse are at least 1.6 times as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species; and means for directing the beam to the material to be processed.
Claim 24
Dependent Claim 111 words
A laser system for materials processing comprising: a sealed gas discharge laser for generating a pulsed output beam and with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected so that the rise and fall times of each pulse are at least 1.6 times as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species; and means for directing the beam to the material to be processed.
Claim 25
Dependent Claim 18 words
A laser system as recited in claim 19 wherein the lasing species is the 13 CO 2 isotope.
Claim 26
Independent Claim 69 words
A method for processing materials comprising: generating a pulsed laser beam from a gas discharge laser, with the lasing gas being predominantly an isotope of carbon dioxide, whereby said laser can be operated at repetition rates in a range between 10 and 20 Khz while maintaining a depth of modulation of at least ninety percent between the output pulses; and directing the beam to the material to be processed.
Claim 27
Independent Claim 69 words
A method for processing materials comprising: generating a pulsed laser beam from a gas discharge laser, with the lasing gas being predominantly an isotope of carbon dioxide, whereby said laser can be operated at repetition rates in a range between 10 and 20 Khz while maintaining a depth of modulation of at least ninety percent between the output pulses; and directing the beam to the material to be processed.
Claim 28
Dependent Claim 16 words
A method as recited in claim 21 wherein the laser is excited by an RF signal.
Claim 29
Dependent Claim 12 words
A method as recited in claim 21 wherein the laser is sealed.
Claim 30
Dependent Claim 45 words
A method as recited in claim 23 wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the gas mixture includes nitrogen and wherein the pressure of the isotopic carbon dioxide is greater than the pressure of the nitrogen.
Claim 31
Dependent Claim 34 words
A method as recited in claim 23 wherein the gas in the sealed discharge laser is defined by a gas mixture wherein the gas mixture consists primarily of isotopic carbon dioxide, helium and xenon.
Claim 32
Dependent Claim 17 words
A method as recited in claim 25 wherein the lasing species is the 13 CO 2 isotope.
Claim 33
Dependent Claim 17 words
A method as recited in claim 21 wherein the lasing species is the 13 CO 2 isotope.
Claim 34
Dependent Claim 34 words
A method as recited in claim 21 further including the step of directing a flow of an assist gas to the material to be processed and wherein the assist gas is standard carbon dioxide.
Claim 35
Independent Claim 91 words
A method for processing materials comprising: generating a pulsed laser beam from a sealed gas discharge laser, with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected to provide a depth of modulation of said laser output of at least eighty percent at pulse repetition rates up to 20 Khz; and directing the beam to the material to be processed.
Claim 36
Independent Claim 91 words
A method for processing materials comprising: generating a pulsed laser beam from a sealed gas discharge laser, with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected to provide a depth of modulation of said laser output of at least eighty percent at pulse repetition rates up to 20 Khz; and directing the beam to the material to be processed.
Claim 37
Dependent Claim 17 words
A method as recited in claim 29 wherein the lasing species is the 13 CO 2 isotope.
Claim 38
Independent Claim 107 words
A method for processing materials comprising: generating a pulsed laser beam from a sealed gas discharge laser, with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected so that the rise and fall times of each pulse are at least 1.6 time as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species; and directing the beam to the material to be processed.
Claim 39
Independent Claim 107 words
A method for processing materials comprising: generating a pulsed laser beam from a sealed gas discharge laser, with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected so that the rise and fall times of each pulse are at least 1.6 time as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species; and directing the beam to the material to be processed.
Claim 40
Dependent Claim 121 words
A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected to provide a depth of modulation of said laser output of at least ninety percent at pulse repetition rates in the range of 10 to 20 Khz.
Claim 41
Dependent Claim 121 words
A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected to provide a depth of modulation of said laser output of at least ninety percent at pulse repetition rates in the range of 10 to 20 Khz.
Claim 42
Dependent Claim 17 words
A laser as recited in claim 32 wherein the lasing species is the 13 CO 2 isotope.
Claim 43
Dependent Claim 117 words
A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected to provide a depth of modulation of said laser output of at least ninety-five percent at pulse repetition rates up to 10 Khz.
Claim 44
Dependent Claim 117 words
A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected to provide a depth of modulation of said laser output of at least ninety-five percent at pulse repetition rates up to 10 Khz.
Claim 45
Dependent Claim 17 words
A laser as recited in claim 34 wherein the lasing species is the 13 CO 2 isotope.

References Cited (Backward Citations)

US4061921A Cited
USRE30898E Cited
US4163199A Cited
US4839330A Cited
US5062842A Cited
US5131003A Cited

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Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-10-03 1998-04-04 1998-10-04 $2000.00 Window Closed / Lapsed
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