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US5348588A Expired / Lapsed US ⏱️ 0.0 years remaining

Evaporative treatment of inorganic saponifier wash water

Assignee: Church and Dwight Co Inc
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Filing: 1993-09-30
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Granted: 1994-09-20
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Expires: 2013-09-30
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Abstract

Abstract The aqueous effluent from the wash cycle of a process for cleaning electronic circuit assemblies of rosin flux and other organic residues with an aqueous alkaline cleaning solution comprises evaporating the effluent to cause separation of an aqueous vapor phase and a solid phase comprising residues of the rosin flux and residues of the cleaning solution including alkaline salts such as alkali metal carbonates and bicarbonates and organic adjuvants such as surfactants which do not vaporize.

Inventors

  • 👤 Anthony E. Winston

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 17:32
CPC Classifications
C; C23; C23G; C23G1/00; C23G1/36; C02; C02F; C02F1/00; C02F1/52; C02F1/5236; C02F1/001; C02F1/28; C02F1/283; C02F1/30; C02F1/32; C02F1/42; C02F2001/422; C02F2001/425; C02F2101/00; C02F2101/10; C02F2101/20; C02F2103/00; C02F2103/16; C02F2103/34; C02F2103/346; C02F9/00; H; H05; H05K; H05K3/00; H05K3/22; H05K3/26

Claims Analysis

Total Claims: 16
Claim 1
Independent Claim 75 words
A process for treating an aqueous cleaning effluent derived from the wash cycle of a process for cleaning electronic circuit assemblies with an aqueous alkaline cleaning solution having a pH from about 10 to about 13 and containing rosin flux residues, and inorganic alkaline salt residues and substantially no volatile organic compounds comprises: evaporating said effluent to form an aqueous vapor phase and a solid residue comprising said rosin flux and said inorganic alkaline salt.
Claim 2
Dependent Claim 75 words
A process for treating an aqueous cleaning effluent derived from the wash cycle of a process for cleaning electronic circuit assemblies with an aqueous alkaline cleaning solution having a pH from about 10 to about 13 and containing rosin flux residues, and inorganic alkaline salt residues and substantially no volatile organic compounds comprises: evaporating said effluent to form an aqueous vapor phase and a solid residue comprising said rosin flux and said inorganic alkaline salt.
Claim 3
Dependent Claim 12 words
The process of claim 1 further comprising condensing said aqueous vapor phase.
Claim 4
Dependent Claim 31 words
The process of claim 1 wherein said aqueous cleaning effluent is an effluent from the wash cycle of a process for cleaning electronic circuit assemblies with an aqueous alkaline cleaning solution.
Claim 5
Dependent Claim 27 words
The process of claim 1 wherein said inorganic alkaline salt residues are part of said cleaning solution and comprise alkali metal carbonates, alkali metal bicarbonates or both.
Claim 6
Dependent Claim 22 words
The process of claim 1 wherein said aqueous cleaning effluent further contains alkali metal silicates originally present in said alkaline cleaning solution.
Claim 7
Dependent Claim 35 words
The process of claim 1 wherein said aqueous cleaning effluent further contains non-volatile organic ajuvants originally present in said cleaning solution, said organic adjuvants being separated from said effluent as part of said solid residue.
Claim 8
Dependent Claim 54 words
The process of claim 1 wherein the process for cleaning said electronic circuit assemblies further includes a rinse cycle in which said cleaned assemblies are rinsed with water to form a rinse effluent, said effluent from said wash cycle being subjected to said evaporation and said effluent from said rinse cycle bypassing said evaporation.
Claim 9
Dependent Claim 97 words
The process of claim 7 wherein said effluent from said rinse cycle contains said rosin flux residues and metal ions washed from said electronic circuit assemblies and alkali metal salts and organic adjuvants from said cleaning solution and wherein said effluent from said rinse cycle is passed through an activated carbon bed to effect removal of said rosin flux residues and organic adjuvants to form a substantially organic-free effluent and wherein said substantially organic-free effluent is passed through an ion exchange resin bed to remove said metal ions and alkali metal cations from said alkali metal salts.
Claim 10
Dependent Claim 45 words
The process of claim 8 further comprising condensing said aqueous vapor phase and combining the said aqueous condensate with the rinse cycle effluent subsequent to treatment in said ion exchange resin bed and recycling the combined effluent to said wash cycle, rinse cycle or both.
Claim 11
Dependent Claim 26 words
The process of claim 9 wherein heat removed from said aqueous vapor phase during said condensing is captured and directed to heat said alkaline cleaning solution.
Claim 12
Dependent Claim 22 words
The process of claim 4 wherein said aqueous cleaning effluent further contains alkali metal silicates originally present in said alkaline cleaning solution.
Claim 13
Dependent Claim 35 words
The process as claim 4 wherein said aqueous cleaning effluent further contains non-volatile organic adjuvants originally present in said cleaning solution, said organic adjuvants being separated from said effluent as part of said solid residue.
Claim 14
Dependent Claim 35 words
The process of claim 11 wherein said aqueous cleaning effluent further contains non-volatile organic adjuvants originally present in said cleaning solution, said organic adjuvants being separated from said effluent as part of said solid residue.
Claim 15
Dependent Claim 24 words
The process of claim 6 wherein said organic adjuvants are selected from the group consisting of surfactants, anti-foam agents, carboxylated polymers or mixtures thereof.
Claim 16
Dependent Claim 24 words
The process of claim 13 wherein said organic adjuvants are selected from the group consisting of surfactants, anti-foam agents, carboxylated polymers or mixtures thereof.

References Cited (Backward Citations)

US3772082A Cited
US3899348A Cited
US3979220A Cited
US4197139A Cited
US4244506A Cited
US4468257A Cited
US4676908A Cited
US4983224A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-09-19 1998-03-21 1998-09-20 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-09-19 2002-03-21 2002-09-20 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-09-19 2006-03-21 2006-09-20 $7700.00 Window Closed / Lapsed

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