US5340637A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Optical device diffraction gratings and a photomask for use in the same
Assignee: Hitachi Ltd
•
Filing: 1992-06-05
•
Granted: 1994-08-23
•
Expires: 2012-06-05
Abstract
Abstract A method of fabricating diffraction gratings wherein a photomask is arranged on a substrate which is coated with a photoresist, light is to be incident thereupon at an acute angle relative to the normal direction of the photomask, and a bright/dark pattern is formed on said photoresist by the interference of the transmission light that has passed through the photomask and the diffraction light. The invention further deals with a photomask used for the above method.
Inventors
- 👤 Makoto Okai
- 👤 Shinji Tsuji
- 👤 Akio Ohishi
- 👤 Motohisa Hirao
- 👤 Hiroyoshi Matsumura
- 👤 Tatsuo Harada
- 👤 Toshiaki Kita
- 👤 Hideki Taira
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 15:15
CPC Classifications
G; G02; G02B; G02B5/00; G02B5/18; G02B5/1847; G02B5/1857; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24479; Y10T428/2457; Y10T428/24612; Y10T428/24942
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
198 words
An optical device comprising: a first semiconductor region on which a grating comprising a plurality of grooves is formed, the grating having a first region, a second region and a phase shift region of predetermined length arranged between the first and second region, a periodicity of grooves of the phase shift region being shorter than that of grooves of the first and second region, wherein said grating is formed on said first semiconductor region by arranging a grating photomask above said first semiconductor region, said grating photomask comprising a substrate and a thin film containing grooves disposed thereon, each of said grooves having a transmission factor control film on only one side thereof, permitting light to be incident upon said photomask so as to form a bright/dark pattern by interference with light, and forming said grating on said first semiconductor region, a pattern of the grating corresponding to said bright/dark pattern; a second semiconductor region formed on the first semiconductor region; an active region formed on the second semiconductor region; a third semiconductor region disposed on the active region; a first electrode electrically connected to the first semiconductor; and a second electrode electrically connected to the third semiconductor.
Claim 2
Dependent Claim
198 words
An optical device comprising: a first semiconductor region on which a grating comprising a plurality of grooves is formed, the grating having a first region, a second region and a phase shift region of predetermined length arranged between the first and second region, a periodicity of grooves of the phase shift region being shorter than that of grooves of the first and second region, wherein said grating is formed on said first semiconductor region by arranging a grating photomask above said first semiconductor region, said grating photomask comprising a substrate and a thin film containing grooves disposed thereon, each of said grooves having a transmission factor control film on only one side thereof, permitting light to be incident upon said photomask so as to form a bright/dark pattern by interference with light, and forming said grating on said first semiconductor region, a pattern of the grating corresponding to said bright/dark pattern; a second semiconductor region formed on the first semiconductor region; an active region formed on the second semiconductor region; a third semiconductor region disposed on the active region; a first electrode electrically connected to the first semiconductor; and a second electrode electrically connected to the third semiconductor.
Claim 3
Dependent Claim
15 words
The device as set forth in claim 1, wherein the grating is a λ/4-shifted grating.
Claim 4
Dependent Claim
27 words
The device as set forth in claim 1, wherein the first and the second and the active regions are etched so as to form a mesa structure.
Claim 5
Dependent Claim
22 words
The device as set forth in claim 1, wherein the third semiconductor region includes a plurality of semiconductor layers having different conductivities.
Claim 6
Dependent Claim
24 words
The device as set forth in claim 1, wherein an index of reflection on an end surface of the device is smaller than 1%.
Claim 7
Dependent Claim
23 words
The device as set forth in claim 5, wherein said index of reflection is accomplished by setting a film on said end surface.
Claim 8
Dependent Claim
15 words
The device as set forth in claim 6, wherein said film is a double-layer film.
Claim 9
Dependent Claim
18 words
The device as set forth in claim 7, wherein said double-layer film is made of SiO 2 /SiN.
Claim 10
Dependent Claim
21 words
The device as set forth in claim 1, further including a clad region and a cap region on the active region.
Claim 11
Dependent Claim
17 words
The device as set forth in claim 1, further including a buffer region on the active region.
Claim 12
Dependent Claim
15 words
The device as set forth in claim 1, wherein the device is a DFB laser.
References Cited (Backward Citations)
US3728117A
Cited
US4178604A
Cited
US4017158A
Cited
US4360586A
Cited
US4462658A
Cited
JPS59172723A
Cited
US4605606A
Cited
US4726031A
Cited
US4806454A
Cited
US4806442A
Cited
US4792197A
Cited
US4751707A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-08-22 | 1998-02-21 | 1998-08-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-08-22 | 2002-02-21 | 2002-08-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-08-22 | 2006-02-21 | 2006-08-23 | $7700.00 | Window Closed / Lapsed |