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US5326979A
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Electron beam lithography system
Assignee: Hitachi Ltd
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Filing: 1992-09-25
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Granted: 1994-07-05
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Expires: 2012-09-25
Abstract
Abstract An electron beam lithography system which generates phase shift pattern data relating to main patterns, and exposes the phase shift pattern on a mask plate by using an electron beam in accordance with instruction from a computer. An electron beam lithography system is provided which can remarkably decrease a time needed for preparing phase shift pattern data. The apparatus is furnished with a parameter table for storing equations to generate phase shift pattern data, and generates the phase shift pattern data by assigning original pattern data into equations in accordance with a corresponding instruction for applying a phase shift method, and automatically exposes the phase shift pattern.
Inventors
- 👤 Katsuhiro Kawasaki
- 👤 Takashi Matsuzaka
- 👤 Hiroya Ohta
- 👤 Toshihiko Kohno
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 14:55
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/302; H01J37/3023; H01J37/3026
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
46 words
An electron beam lithography system comprising: a means for generating an electron beam, a means for forming a predetermined pattern on a target by scanning of said electron beam on the target, and a means for generating a phase shift pattern relating to said predetermined pattern.
Claim 2
Dependent Claim
46 words
An electron beam lithography system comprising: a means for generating an electron beam, a means for forming a predetermined pattern on a target by scanning of said electron beam on the target, and a means for generating a phase shift pattern relating to said predetermined pattern.
Claim 3
Dependent Claim
75 words
An electron beam lithography system comprising: a means for generating an electron beam, a means for forming a predetermined main pattern on a target by scanning of said electron beam on the target, and a means for generating a phase shift pattern relating to said main pattern, wherein said means for generating said phase shift pattern includes a means for obtaining data which feature said phase shift pattern by calculation based on said main pattern.
Claim 4
Dependent Claim
75 words
An electron beam lithography system comprising: a means for generating an electron beam, a means for forming a predetermined main pattern on a target by scanning of said electron beam on the target, and a means for generating a phase shift pattern relating to said main pattern, wherein said means for generating said phase shift pattern includes a means for obtaining data which feature said phase shift pattern by calculation based on said main pattern.
Claim 5
Dependent Claim
32 words
An electron beam lithography system as claimed in claim 2, wherein said data which feature said phase shift pattern include a position data and a shape data of said phase shift pattern.
Claim 6
Dependent Claim
72 words
An electron beam lithography system as claimed in claim 3, wherein: said means for generating said phase shift pattern includes a means for storing equations to calculate the position and the shape of the phase shift pattern, and said means for storing said equations which feature the phase shift pattern calculating the position and the shape of the phase shift pattern by assigning the data of the main pattern into said equations.
Claim 7
Dependent Claim
67 words
An electron beam lithography system as claimed in claim 2, which further comprises: a means for generating data of said main pattern, and a means for selecting any one of said means for generating said data of the main pattern and said means for generating said phase shift pattern in order to form any one of said main pattern and said phase shift pattern on said target.
Claim 8
Dependent Claim
146 words
An electron beam lithography system comprising: a means for generating an electron beam, a means for irradiating a target with said electron beam, a means for deflecting said electron beam so as to scan said target with said electron beam to form a main pattern, a means for controlling said irradiation and said deflection of said electron beam, a means for generating data of said main pattern, a means for generating data of said phase shift pattern relating to said data of said main pattern, and a means for selectively connecting either said means for generating data of said main pattern or said means for generating data of said phase shift pattern to said means for controlling so as to selectively form either a means for generating phase shift pattern relating to said main pattern, said main pattern or said phase shift pattern on said target.
Claim 9
Dependent Claim
146 words
An electron beam lithography system comprising: a means for generating an electron beam, a means for irradiating a target with said electron beam, a means for deflecting said electron beam so as to scan said target with said electron beam to form a main pattern, a means for controlling said irradiation and said deflection of said electron beam, a means for generating data of said main pattern, a means for generating data of said phase shift pattern relating to said data of said main pattern, and a means for selectively connecting either said means for generating data of said main pattern or said means for generating data of said phase shift pattern to said means for controlling so as to selectively form either a means for generating phase shift pattern relating to said main pattern, said main pattern or said phase shift pattern on said target.
Claim 10
Dependent Claim
73 words
An electron beam lithography system as claimed in claim 6, wherein said means for generating said data of said phase shift pattern further comprises: a means for obtaining data of a position and a shape of said phase shift pattern, and a means for storing equations to calculate said data of said position and said shape of said phase shift pattern by assigning said data obtained from said main pattern into said equations.
Claim 11
Dependent Claim
69 words
An electron beam lithography system for exposing LSI main patterns on a phase shift mask plate by scanning an electron beam comprising: a means for generating pattern data from said LSI main patterns scanned by said electron beam, a means for generating a phase shift instruction, and a means for generating a phase shift pattern by using said pattern data from said main patterns in accordance with said instruction.
Claim 12
Dependent Claim
69 words
An electron beam lithography system for exposing LSI main patterns on a phase shift mask plate by scanning an electron beam comprising: a means for generating pattern data from said LSI main patterns scanned by said electron beam, a means for generating a phase shift instruction, and a means for generating a phase shift pattern by using said pattern data from said main patterns in accordance with said instruction.
Claim 13
Dependent Claim
49 words
An electron beam lithography system as claimed in claim 8, wherein said means for generating said phase shift pattern is furnished with a means for obtaining data of a position and a shape of corresponding to said phase shift pattern by using said pattern data from said main patterns.
Claim 14
Dependent Claim
71 words
An electron beam lithography system as claimed in claim 9, wherein: said means for generating said phase shift pattern is furnished with a means for storing equations for calculating said position and said shape data of said phase shift patterns, and for calculating said data of said position and said shape of corresponding to said phase shift patterns by assigning said pattern data obtained from said main patterns into said equations.
Claim 15
Dependent Claim
21 words
An electron beam lithography system as claimed in claim 10, wherein: said phase shift patterns are contact holes and VIA holes.
Claim 16
Dependent Claim
80 words
An electron beam lithography system as claimed in claim 10, wherein: said means for generating said data from said LSI main patterns and said means for generating said phase shift pattern are furnished separately, and a means for selectively switching a connection of an output of said means for generating said data from said LSI main patterns and an output of said means for generating said phase shift pattern to form said LSI main patterns or said phase shift pattern.
References Cited (Backward Citations)
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1997-07-04 | 1998-01-03 | 1998-07-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-07-04 | 2002-01-03 | 2002-07-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-07-04 | 2006-01-03 | 2006-07-05 | $7700.00 | Window Closed / Lapsed |