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US5320878A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

Assignee: Lockheed Martin Energy Systems Inc
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Filing: 1992-01-10
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Granted: 1994-06-14
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Expires: 2012-01-10
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Abstract

Abstract Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film.

Inventors

  • 👤 Leon Maya

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 12:31
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/34; C23C16/342

Claims Analysis

Total Claims: 33
Claim 1
Independent Claim 59 words
A method of depositing boron nitride onto a substrate comprising the steps of: a. providing a substrate, having a surface, said substrate being held at a sufficient temperature to effect decomposition of cyanoborane; and, b. contacting said heated substrate with cyanoborane vapor so that a film comprising boron nitride is deposited on said surface to produce a coated substrate.
Claim 2
Independent Claim 59 words
A method of depositing boron nitride onto a substrate comprising the steps of: a. providing a substrate, having a surface, said substrate being held at a sufficient temperature to effect decomposition of cyanoborane; and, b. contacting said heated substrate with cyanoborane vapor so that a film comprising boron nitride is deposited on said surface to produce a coated substrate.
Claim 3
Dependent Claim 18 words
The method of claim 1 wherein said contacting step is carried out under pressure less than atmospheric pressure.
Claim 4
Dependent Claim 23 words
The method of claim 1 wherein said sufficient temperature is a temperature in the range of about 400° C. to about 800° C.
Claim 5
Dependent Claim 23 words
The method of claim 3 wherein said sufficient temperature is a temperature in the range of about 500° C. to about 700° C.
Claim 6
Dependent Claim 36 words
The method of claim 1 further comprising the additional step of contacting said coated substrate with ammonia, said coated substrate being held at a temperature in the range of about 700° C. to about 1200° C.
Claim 7
Dependent Claim 25 words
The method of claim 5 wherein said coated substrate is held at a temperature in the range of about 750° C. to about 850° C.
Claim 8
Independent Claim 69 words
A method of depositing boron nitride onto a substrate comprising the steps of: a. providing a substrate, having a surface, said substrate being held at a sufficient temperature to effect decomposition of cyanoborane; b. thermally vaporizing cyanoborane to form a cyanoborane vapor; and, c. contacting said heated substrate with said cyanoborane vapor so that a film comprising boron nitride is deposited on said surface to produce a coated substrate.
Claim 9
Independent Claim 69 words
A method of depositing boron nitride onto a substrate comprising the steps of: a. providing a substrate, having a surface, said substrate being held at a sufficient temperature to effect decomposition of cyanoborane; b. thermally vaporizing cyanoborane to form a cyanoborane vapor; and, c. contacting said heated substrate with said cyanoborane vapor so that a film comprising boron nitride is deposited on said surface to produce a coated substrate.
Claim 10
Dependent Claim 18 words
The method of claim 7 wherein said vaporizing step is carried out under pressure less than atmospheric pressure.
Claim 11
Dependent Claim 18 words
The method of claim 7 wherein said contacting step is carried out under pressure less than atmospheric pressure.
Claim 12
Dependent Claim 26 words
The method of claim 7 wherein said vaporizing step is carried out at a temperature in the range of about 80° C. to about 300° C.
Claim 13
Dependent Claim 26 words
The method of claim 10 wherein said vaporizing step is carried out at a temperature in the range of about 140° C. to about 200° C.
Claim 14
Dependent Claim 26 words
The method of claim 7 wherein said contacting step is carried out at a temperature in the range of about 400° C. to about 800° C.
Claim 15
Dependent Claim 26 words
The method of claim 12 wherein said contacting step is carried out at a temperature in the range of about 500° C. to about 700° C.
Claim 16
Dependent Claim 36 words
The method of claim 7 further comprising the additional step of contacting said coated substrate with ammonia, said coated substrate being held at a temperature in the range of about 700° C. to about 1200° C.
Claim 17
Dependent Claim 25 words
The method of claim 14 wherein said coated substrate is held at a temperature in the range of about 750° C. to about 850° C.
Claim 18
Independent Claim 60 words
A method of depositing boron nitride onto a substrate comprising the steps of: a. placing a substrate in a plasma of inert gas, said substrate having a surface; and, b. contacting said substrate with a cyanoborane vapor so that said plasma decomposes said cyanoborane vapor to form a film comprising boron nitride on said surface to produce a coated substrate.
Claim 19
Independent Claim 60 words
A method of depositing boron nitride onto a substrate comprising the steps of: a. placing a substrate in a plasma of inert gas, said substrate having a surface; and, b. contacting said substrate with a cyanoborane vapor so that said plasma decomposes said cyanoborane vapor to form a film comprising boron nitride on said surface to produce a coated substrate.
Claim 20
Dependent Claim 13 words
The method of claim 16 wherein said plasma is generated with electromagnetic radiation.
Claim 21
Dependent Claim 12 words
The method of claim 17 wherein said electromagnetic radiation comprises microwave radiation.
Claim 22
Dependent Claim 12 words
The method of claim 17 wherein said electromagnetic radiation comprises RF radiation.
Claim 23
Dependent Claim 10 words
The method of claim 16 wherein said plasma comprises nitrogen.
Claim 24
Independent Claim 71 words
A method of depositing boron nitride onto a substrate comprising the steps of: a. providing a substrate, having a surface, said substrate being placed in a plasma of inert gas; b. thermally vaporizing cyanoborane to form a cyanoborane vapor; and, c. contacting said substrate with said cyanoborane vapor so that said plasma decomposes said cyanoborane vapor to form a film comprising boron nitride on said surface to produce a coated substrate.
Claim 25
Independent Claim 71 words
A method of depositing boron nitride onto a substrate comprising the steps of: a. providing a substrate, having a surface, said substrate being placed in a plasma of inert gas; b. thermally vaporizing cyanoborane to form a cyanoborane vapor; and, c. contacting said substrate with said cyanoborane vapor so that said plasma decomposes said cyanoborane vapor to form a film comprising boron nitride on said surface to produce a coated substrate.
Claim 26
Dependent Claim 26 words
The method of claim 21 wherein said vaporizing step is carried out at a temperature in the range of about 80° C. to about 300° C.
Claim 27
Dependent Claim 26 words
The method of claim 22 wherein said vaporizing step is carried out at a temperature in the range of about 140° C. to about 200° C.
Claim 28
Dependent Claim 13 words
The method of claim 21 wherein said plasma is generated with electromagnetic radiation.
Claim 29
Dependent Claim 12 words
The method of claim 24 wherein said electromagnetic radiation comprises microwave radiation.
Claim 30
Dependent Claim 12 words
The method of claim 24 wherein said electromagnetic radiation comprises RF radiation.
Claim 31
Dependent Claim 10 words
The method of claim 21 wherein said plasma comprises nitrogen.
Claim 32
Dependent Claim 36 words
The method of claim 21 further comprising the additional step of contacting said coated substrate with ammonia, said coated substrate being held at a temperature in the range of about 700° C. to about 1200° C.
Claim 33
Dependent Claim 25 words
The method of claim 28 wherein said coated substrate is held at a temperature in the range of about 750° C. to about 850° C.

References Cited (Backward Citations)

US5023213A Cited
US4758539A Cited
US4970095A Cited
US5030744A Cited
US5169613A Cited
US5175020A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-06-13 1997-12-13 1998-06-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-06-13 2001-12-13 2002-06-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-06-13 2005-12-13 2006-06-14 $7700.00 Window Closed / Lapsed

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