US5316276A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Thickness compensation actuator system
Assignee: Ultratech Inc
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Filing: 1992-12-18
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Granted: 1994-05-31
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Expires: 2012-12-18
Abstract
Abstract A system capable of automatically compensating for the thickness of a workpiece which comprises: at least one actuator assembly which comprises a vacuum chuck capable of supporting a workpiece thereon vacuum means capable of providing the vacuum chuck with sufficient vacuum for maintain the workpiece in contact with the vacuum chuck, the vacuum means including a centrally located vacuum conduit portion, means for adjustably securing the vacuum chuck to the vacuum conduit portion, actuator means rotatably disposed about the vacuum conduit portion, and means for reciprocally moving the actuator means such that its movement produces a similar reciprocal movement by the vacuum chuck; motor means and gear assembly connected to the means for reciprocally moving the actuator means; means for detecting the thickness of the workpiece; and means for controlling the motor means and gear assembly so as to move the actuator means, whereby the height of the workpiece can be automatically and continuously adjusted to the variable thickness of the workpiece.
Inventors
- 👤 Konrad Heinle
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 19:32
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/707; B; B23; B23B; B23B31/00; B23B31/02; B23B31/24; B23B31/30; B23B31/307; G03F9/00; G03F9/70; H; H10; H10P; H10P72/00; H10P72/70; H10P72/78; Y; Y10; Y10S; Y10S269/00; Y10S269/903
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
182 words
A thickness compensation actuator system for enabling automatic, coarse adjustment of wafer height in combination with a stepper mechanism for imposing image patterns on said wafer which comprises: a vacuum chuck capable of supporting a wafer thereon; vacuum applying means capable of providing said vacuum chuck with sufficient vacuum to maintain said wafer in contact with said vacuum chuck, said vacuum applying means including a centrally located vacuum conduit portion; means for adjustably securing said vacuum chuck to said vacuum applying means; an actuator means rotatably disposed about said vacuum conduit portion; and means, including a motor, for reciprocally moving said actuator means such that its movement produces a similar reciprocal movement by said vacuum chuck; and feedback means, including a focus sensor means, a microprocessor, and said motor, said feedback means being operative for automatically, coarsely adjusting the height of said vacuum chuck in response to the thickness variation of said wafer, such that the upper surface of said wafer will lie in a predetermined plane, said thickness variation exceeding the total range of focus accommodation built into the stepper mechanism.
Claim 2
Dependent Claim
182 words
A thickness compensation actuator system for enabling automatic, coarse adjustment of wafer height in combination with a stepper mechanism for imposing image patterns on said wafer which comprises: a vacuum chuck capable of supporting a wafer thereon; vacuum applying means capable of providing said vacuum chuck with sufficient vacuum to maintain said wafer in contact with said vacuum chuck, said vacuum applying means including a centrally located vacuum conduit portion; means for adjustably securing said vacuum chuck to said vacuum applying means; an actuator means rotatably disposed about said vacuum conduit portion; and means, including a motor, for reciprocally moving said actuator means such that its movement produces a similar reciprocal movement by said vacuum chuck; and feedback means, including a focus sensor means, a microprocessor, and said motor, said feedback means being operative for automatically, coarsely adjusting the height of said vacuum chuck in response to the thickness variation of said wafer, such that the upper surface of said wafer will lie in a predetermined plane, said thickness variation exceeding the total range of focus accommodation built into the stepper mechanism.
Claim 3
Dependent Claim
34 words
The system according to claim 1, further comprising a support means disposed about said actuator means such that said actuator means is capable of reciprocally moving along the inner surface of said support means.
Claim 4
Dependent Claim
42 words
The system according to claim 1, wherein a spring is disposed between female threading on said actuator means and female threading on said support means to permit continuous reciprocal movement by said actuator means along the inner surface of the support means.
Claim 5
Dependent Claim
20 words
The system according to claim 1, further comprising a swivel means disposed between said vacuum chuck and said actuator means.
Claim 6
Dependent Claim
24 words
The system according to claim 1, wherein said means for adjustably securing said vacuum chuck to said vacuum conduit portion is a spring means.
Claim 7
Dependent Claim
24 words
The system according to claim 1, wherein said means for reciprocally moving said actuator means is a gear means connected to said actuator means.
Claim 8
Dependent Claim
19 words
The system according to claim 1, further comprising a wafer chuck disposed between said vacuum chuck and said wafer.
Claim 9
Dependent Claim
23 words
The system according to claim 1, wherein said focus sensor means comprises an array of air gauge focus sensors spaced from said wafer.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-05-30 | 1997-11-29 | 1998-05-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-05-30 | 2001-11-29 | 2002-05-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-05-30 | 2005-11-29 | 2006-05-31 | $7700.00 | Window Closed / Lapsed |