US5312716A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for producing a semiconductor
Assignee: AGC Inc
•
Filing: 1992-06-05
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Granted: 1994-05-17
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Expires: 2012-06-05
Abstract
Abstract A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a photoresist solution containing a surfactant, followed by exposure, development and etching for fine processing of the fluorine resin.
Inventors
- 👤 Masao Unoki
- 👤 Shunsuke Yokotsuka
- 👤 Masaru Nakamura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 07:38
CPC Classifications
H; H10; H10W; H10W74/00; H10W74/01; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; H10W74/40; H10W74/47
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
47 words
A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a photoresist solution containing a surfactant, followed by exposure, development and etching for fine processing of the fluorine resin.
Claim 2
Dependent Claim
47 words
A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a photoresist solution containing a surfactant, followed by exposure, development and etching for fine processing of the fluorine resin.
Claim 3
Dependent Claim
26 words
The process according to claim 1, wherein the thin film of a fluorine resin is a thin film of a fluorine resin formed by spin coating.
Claim 4
Dependent Claim
24 words
The process according to claim 1, wherein the fluorine resin is a fluorine resin having a fluorine-containing aliphatic cyclic structure in its backbone chain.
Claim 5
Dependent Claim
33 words
The process according to claim 1, wherein the fluorine resin is a polymer obtained by cyclic polymerization of a monomer selected from the group consisting of perfluoroallyl vinyl ether and perfluorobutenyl vinyl ether.
Claim 6
Dependent Claim
17 words
The process according to claim 1, wherein the fluorine resin is a copolymer of perfluoro(2,2-dimethyl-1,3-dioxole) and tetrafluoroethylene.
Claim 7
Dependent Claim
13 words
The process according to claim 1, wherein the surfactant is a fluorine-containing surfactant.
Claim 8
Dependent Claim
14 words
The process according to claim 1, wherein the surfactant is a nonionic fluorine-containing surfactant.
Claim 9
Dependent Claim
16 words
The process according to claim 1, wherein the surfactant is an acrylate oligomer having polyfluoroalkyl groups.
Claim 10
Dependent Claim
53 words
A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a liquid containing a surfactant, then coating a solution of a photoresist, followed by exposure, development and etching for fine processing of the fluorine resin.
Claim 11
Dependent Claim
53 words
A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a liquid containing a surfactant, then coating a solution of a photoresist, followed by exposure, development and etching for fine processing of the fluorine resin.
Claim 12
Dependent Claim
26 words
The process according to claim 9, wherein the thin film of a fluorine resin is a thin film of a fluorine resin formed by spin coating.
Claim 13
Dependent Claim
24 words
The process according to claim 9, wherein the fluorine resin is a fluorine resin having a fluorine-containing aliphatic cyclic structure in the backbone chain.
Claim 14
Dependent Claim
33 words
The process according to claim 9, wherein the fluorine resin is a polymer prepared by cyclic polymerization of a monomer selected from the group consisting of perfluoroallyl vinyl ether and perfluorobutenyl vinyl ether.
Claim 15
Dependent Claim
17 words
The process according to claim 9, wherein the fluorine resin is a copolymer of perfluoro(2,2-dimethyl-1,3-dioxole) and tetrafluoroethylene.
Claim 16
Dependent Claim
13 words
The process according to claim 9, wherein the surfactant is a fluorine-containing surfactant.
Claim 17
Dependent Claim
14 words
The process according to claim 9, wherein the surfactant is a nonionic fluorine-containing surfactant.
Claim 18
Dependent Claim
16 words
The process according to claim 9, wherein the surfactant is an acrylate oligomer having polyfluoroalkyl groups.
Claim 19
Dependent Claim
19 words
The process according to claim 9, wherein the liquid containing a surfactant is an adhesion-improving agent containing a surfactant.
References Cited (Backward Citations)
US5117272A
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1997-05-16 | 1997-11-15 | 1998-05-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-05-16 | 2001-11-15 | 2002-05-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-05-16 | 2005-11-15 | 2006-05-17 | $7700.00 | Window Closed / Lapsed |