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US5312490A Expired / Lapsed US ⏱️ 0.0 years remaining

Gas seal for continuous chemical vapor deposition reactors

Assignee: Texas Instruments Inc
•
Filing: 1992-01-29
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Granted: 1994-05-17
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Expires: 2012-01-29
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Abstract

Abstract Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.

Inventors

  • 👤 Thomas F. Wilkinson

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 02:14
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; C; C23; C23C; C23C16/00; C23C16/44; C23C16/54

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 97 words
A seal for preventing reactive gas flow out of a chemical reaction chamber to the atmosphere through an interface where said reaction chamber is attached to a reaction chamber junction, said seal comprising: a first gas inlet communicating between a source of reaction gas and said reaction chamber; and a second gas inlet coupled to a source of a second gas and positioned to introduce said second gas into said reaction chamber between said first gas inlet and said interface, said second gas source being at a pressure greater than the pressure of said reaction gas source.
Claim 2
Dependent Claim 97 words
A seal for preventing reactive gas flow out of a chemical reaction chamber to the atmosphere through an interface where said reaction chamber is attached to a reaction chamber junction, said seal comprising: a first gas inlet communicating between a source of reaction gas and said reaction chamber; and a second gas inlet coupled to a source of a second gas and positioned to introduce said second gas into said reaction chamber between said first gas inlet and said interface, said second gas source being at a pressure greater than the pressure of said reaction gas source.
Claim 3
Dependent Claim 14 words
The seal according to claim 1, wherein said second gas is an inert gas.
Claim 4
Dependent Claim 23 words
The seal according to claim 1, wherein said first gas inlet and said second gas inlet are located in said reaction chamber junction.
Claim 5
Dependent Claim 22 words
The seal according to claim 3, further including an exhaust port located between said first gas inlet and said second gas inlet.
Claim 6
Dependent Claim 99 words
A seal for preventing reactive gas flow out of a chemical reaction chamber to the atmosphere through an interface where said reaction chamber is attached to a reaction chamber junction, said seal comprising; a first gas inlet communicating between a source or reaction gas and said reaction chamber; and a second gas inlet coupled to a source of an inert second gas and positioned to introduce said inert second gas into said reaction chamber between said first gas inlet and said interface, said second gas source being at a pressure greater than the pressure of said reaction gas source.
Claim 7
Dependent Claim 99 words
A seal for preventing reactive gas flow out of a chemical reaction chamber to the atmosphere through an interface where said reaction chamber is attached to a reaction chamber junction, said seal comprising; a first gas inlet communicating between a source or reaction gas and said reaction chamber; and a second gas inlet coupled to a source of an inert second gas and positioned to introduce said inert second gas into said reaction chamber between said first gas inlet and said interface, said second gas source being at a pressure greater than the pressure of said reaction gas source.
Claim 8
Dependent Claim 128 words
In a continuous chemical vapor deposition reactor having at least one reaction chamber open at two ends and each open end of the reaction chamber connected to and sealed with a reaction chamber junction, a seal for sealing the chemical reaction chamber from the atmosphere at the interface where the reaction chamber open ends are attached to the reaction chamber junction, said seal comprising: a first gas inlet communicating between a source of reaction gas and said reaction chamber; and a second gas inlet coupled to a source of a second gas and positioned to introduce said second gas into said reaction chamber between said first gas inlet and said interface, said second gas source being at a pressure greater than the pressure of said reaction gas source.
Claim 9
Dependent Claim 128 words
In a continuous chemical vapor deposition reactor having at least one reaction chamber open at two ends and each open end of the reaction chamber connected to and sealed with a reaction chamber junction, a seal for sealing the chemical reaction chamber from the atmosphere at the interface where the reaction chamber open ends are attached to the reaction chamber junction, said seal comprising: a first gas inlet communicating between a source of reaction gas and said reaction chamber; and a second gas inlet coupled to a source of a second gas and positioned to introduce said second gas into said reaction chamber between said first gas inlet and said interface, said second gas source being at a pressure greater than the pressure of said reaction gas source.
Claim 10
Dependent Claim 14 words
The seal according to claim 6, wherein said second gas is an inert gas.
Claim 11
Dependent Claim 22 words
The seal according to claim 6, wherein said first gas inlet and said second gas are located in said reaction chamber junction.
Claim 12
Dependent Claim 22 words
The seal according to claim 8, further including an exhaust port located between said first gas inlet and said second gas inlet.

References Cited (Backward Citations)

US4048955A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-05-16 1997-11-15 1998-05-17 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-05-16 2001-11-15 2002-05-17 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-05-16 2005-11-15 2006-05-17 $7700.00 Window Closed / Lapsed

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