US5310583A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Vapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxide
Assignee: Dow Silicones Corp
•
Filing: 1992-11-02
•
Granted: 1994-05-10
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Expires: 2012-11-02
Abstract
Abstract Silicon and oxygen containing coatings are deposited by the chemical vapor deposition of hydrogen silsesquioxane in an environment comprising nitrous oxide.
Inventors
- 👤 Marie N. Eckstein
- 👤 David S. Ballance
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 14:38
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/401
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
44 words
A method of depositing a coating containing silicon and oxygen on a substrate comprising: introducing a gas comprising hydrogen silsesquioxane into a deposition chamber containing the substrate and a reactive environment comprising nitrous oxide; and inducing reaction of the gas to form the coating.
Claim 2
Independent Claim
44 words
A method of depositing a coating containing silicon and oxygen on a substrate comprising: introducing a gas comprising hydrogen silsesquioxane into a deposition chamber containing the substrate and a reactive environment comprising nitrous oxide; and inducing reaction of the gas to form the coating.
Claim 3
Dependent Claim
30 words
The method of claim 1 wherein the hydrogen silsesquioxane comprises a sample in which greater than about 75 % of the species have a molecular weight less than about 2000.
Claim 4
Dependent Claim
30 words
The method of claim 1 wherein the hydrogen silsesquioxane comprises a sample in which greater than about 75 % of the species have a molecular weight less than about 1200.
Claim 5
Dependent Claim
32 words
The method of claim 1 wherein the hydrogen silsesquioxane comprises a sample in which greater than about 75 % of the species have a molecular weight between about 400 and about 1000.
Claim 6
Dependent Claim
15 words
The method of claim 1 wherein the hydrogen silsesquioxane is diluted in a carrier gas.
Claim 7
Dependent Claim
46 words
The method of claim 1 wherein the hydrogen silsesquioxane is induced to react by a means selected from the group consisting of chemical vapor deposition, low pressure chemical vapor deposition, subatmospheric chemical vapor deposition, plasma enhanced chemical vapor deposition, electron cyclotron resonance, and jet vapor deposition.
Claim 8
Dependent Claim
19 words
The method of claim 1 wherein the hydrogen silsesquioxane is induced to react by exposure to an elevated temperature.
Claim 9
Dependent Claim
18 words
The method of claim 7 in which the temperature is in the range of about 100 °-1OOO° C.
Claim 10
Dependent Claim
19 words
The method of claim 1 wherein the hydrogen silsesquioxane resin is induced to react by exposure to a plasma.
Claim 11
Dependent Claim
16 words
The method of claim 9 in which the plasma comprises radio frequency energy or microwave energy.
Claim 12
Dependent Claim
32 words
The method of claim 1 wherein the deposition chamber is maintained at a pressure of less than about (5) torr and a temperature in the range of about (100° to 1200)° C.
Claim 13
Dependent Claim
32 words
The method of claim 1 wherein the deposition chamber is maintained at a pressure of less than about 1 atmosphere and a temperature in the range of about (100° to 1200)° C.
Claim 14
Dependent Claim
12 words
The method of claim 1 wherein the substrate comprises an electronic device.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-05-09 | 1997-11-08 | 1998-05-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-05-09 | 2001-11-08 | 2002-05-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-05-09 | 2005-11-08 | 2006-05-10 | $7700.00 | Window Closed / Lapsed |