US5310456A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dry etching method
Assignee: Sony Corp
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Filing: 1991-07-29
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Granted: 1994-05-10
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Expires: 2011-07-29
Abstract
Abstract A dry etching method enabling layers of a variety of silicon based materials, such as polysilicon layer, single crystal silicon layer, metal silicide layer or a polycide film, and an aluminum based material, to be etched anisotropically without the necessity of employing depositive CFC-based gases. The etching gas is selected from a variety of gases composed mainly of sulfur halogenides, such as S 2 F 2 , S 2 Cl 2 or S 2 Br 2 . These sulfur halogenides yield halogen radicals as the etchant in the plasma, and a variety of ions assisting the radical reaction, while yielding free sulfur S, as a result of dissociation by electrical discharge. Free sulfur then is deposited on the sample wafer etched to display the effect of sidewall protection, while the wafer is controlled to a temperature lower than room temperature. According to the present invention, since sulfur yielded in the gaseous phase is used for sidewall protection, anisotropic processing becomes possible even with a system in which, by reason of the construction of the etching mask, the carbon based polymer derived from the resist material may not be expected to by yielded. The deposited sulfur may be easily removed by sublimation by proper heating the wafer after completion of etching.
Inventors
- 👤 Shingo Kadomura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 19:46
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H10P50/26; H10P50/264; H10P50/266; H10P50/267; H10P50/268
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
114 words
A dry etching method comprising etching a layer of a silicon based material or a layer of an aluminum based material formed on a sample wafer with the aid of an etching gas free of carbon based gas and comprised mainly of at least one of a compound selected from a group consisting of S 3 Cl 2 , S 2 Cl 2 and SCl 2 and a compound containing S and Br as constituent elements and controlling the temperature of the sample wafer to be not higher than room temperature to deposit sulfur for side wall protection, and then heating the wafer above room temperature after completing etching to sublimate the deposited sulfur.
Claim 2
Dependent Claim
114 words
A dry etching method comprising etching a layer of a silicon based material or a layer of an aluminum based material formed on a sample wafer with the aid of an etching gas free of carbon based gas and comprised mainly of at least one of a compound selected from a group consisting of S 3 Cl 2 , S 2 Cl 2 and SCl 2 and a compound containing S and Br as constituent elements and controlling the temperature of the sample wafer to be not higher than room temperature to deposit sulfur for side wall protection, and then heating the wafer above room temperature after completing etching to sublimate the deposited sulfur.
Claim 3
Dependent Claim
147 words
A dry etching method for etching a polycide film composed of a polysilicon layer and a refractory metal silicide layer formed step by step on a sample wafer, said method comprising etching said refractory metal silicide layer using an etching gas free of any carbon based gases and mainly composed of a compound containing S and F as the constituent elements, and controlling the temperature of the sample wafer to be not higher than room temperature to deposit sulfur for side wall protection, and etching said polysilicon layer using an etching gas free of any carbon based bases and composed of at least one of a compound containing S and Cl as constituent elements and a compound containing S and Br as constituent elements, and controlling the temperature of said sample wafer to be not higher than room ambient temperature to deposit sulfur for side wall protection.
Claim 4
Dependent Claim
147 words
A dry etching method for etching a polycide film composed of a polysilicon layer and a refractory metal silicide layer formed step by step on a sample wafer, said method comprising etching said refractory metal silicide layer using an etching gas free of any carbon based gases and mainly composed of a compound containing S and F as the constituent elements, and controlling the temperature of the sample wafer to be not higher than room temperature to deposit sulfur for side wall protection, and etching said polysilicon layer using an etching gas free of any carbon based bases and composed of at least one of a compound containing S and Cl as constituent elements and a compound containing S and Br as constituent elements, and controlling the temperature of said sample wafer to be not higher than room ambient temperature to deposit sulfur for side wall protection.
Claim 5
Dependent Claim
33 words
The dry etching method according to claim 2 wherein said compound containing S and Cl as the constituent elements is S 3 Cl 2 , S 2 Cl 2 or SCl 2 .
Claim 6
Dependent Claim
35 words
The dry etching method according to claims 1 or 2 wherein said compound containing S and Br as the constituent elements is S 3 Br 2 , S 2 Br 2 or SBr 2 .
Claim 7
Dependent Claim
33 words
The dry etching method according to claim 2 wherein said compound containing S and F is S 2 F 2 , SF 2 , SF 4 , or S 2 F 10 .
Claim 8
Dependent Claim
26 words
The dry etching method according to claim 1 wherein said layer of the silicon based material is a polysilicon layer or a single crystal silicon layer.
Claim 9
Dependent Claim
28 words
The dry etching method according to claim 2 wherein said refractory metal silicide layer is a tungsten silicide layer, a titanium silicide layer, or a molybdenum silicide layer.
Claim 10
Dependent Claim
32 words
The dry etching method according to claims 1 or 2 wherein said etching gas contains at least one of H 2 , H 2 S or silane compounds as an additional gas.
Claim 11
Dependent Claim
18 words
A dry etching method according to claim 2, which includes heating the wafer to remove the deposited sulfur.
References Cited (Backward Citations)
US4462863A
Cited
US4473436A
Cited
US4592800A
Cited
JPS61198627A
Cited
US4711698A
Cited
US4943344A
Cited
JPS63181430A
Cited
US4956043A
Cited
US5147500A
Cited
US4983543A
Cited
JPH02284420A
Cited
JPH08309631A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-05-09 | 1997-11-08 | 1998-05-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-05-09 | 2001-11-08 | 2002-05-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-05-09 | 2005-11-08 | 2006-05-10 | $7700.00 | Window Closed / Lapsed |