Abstract The invention is predicated upon the discovery by applicants that exposure of a Ge surface to arsenic produces a drastic change in the step structure of the Ge surface. Subsequent exposure to Ga and growth of GaAs produces three-dimensional growth and a high threading dislocation density at the GaAs/Ge interface. However exposure of the Ge surface to Ga does not substantially change the Ge step structure, and subsequent growth of GaAs is two-dimensional with little increase in threading dislocation density. Thus a high quality semiconductor heterostructure of gallium arsenide on germanium can be made by exposing a germanium surface in an environment substantially free of arsenic, depositing a layer of gallium on the surface and then growing a layer of gallium arsenide. The improved method can be employed to make a variety of optoelectronic devices such as light-emitting diodes.
An improved method of making semiconductor heterostructure of gallium arsenide on germanium comprising the steps of: exposing a surface comprising germanium in an environment having a partial pressure of arsenic less than 10 -8 torr; epitaxially growing a layer of gallium on the exposed surface; and epitaxially growing a layer of gallium arsenide on the gallium covered surface.
Claim 2
Dependent Claim
58 words
An improved method of making semiconductor heterostructure of gallium arsenide on germanium comprising the steps of: exposing a surface comprising germanium in an environment having a partial pressure of arsenic less than 10 -8 torr; epitaxially growing a layer of gallium on the exposed surface; and epitaxially growing a layer of gallium arsenide on the gallium covered surface.
Claim 3
Dependent Claim
18 words
The method of claim 1 wherein a monolayer or more of gallium is grown on said germanium surface.
Claim 4
Dependent Claim
15 words
The method of claim 1 wherein said epitaxial growth is effected by molecular beam epitaxy.
Claim 5
Dependent Claim
15 words
The method of claim 1 wherein said epitaxial growth is effected by chemical vapor deposition.
Claim 6
Dependent Claim
21 words
The method of claim 1 wherein said germanium surface is a (001) oriented germanium substrate off-cut 1°-6° towards the [110] direction.
Claim 7
Dependent Claim
15 words
The method of claim 1 wherein said germanium surface is germanium-silicon alloy comprising 70-100% germanium.