US5289222A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Drain arrangement for photoresist coating apparatus
Assignee: SEMICONDUCTER SYSTEMS Inc A CA CORP
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Filing: 1992-06-26
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Granted: 1994-02-22
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Expires: 2012-06-26
Abstract
Abstract A photoresist drainage system for conducting the excess photoresist and solvents from a spin coating machine in a semiconductor fabrication unit is disclosed. The excess photoresist liquid and solvents are channeled directly to an exhaust manifold instead of being collected in a temporary storage tank. From the exhaust manifold the photoresist and solvents flow directly into a factory chemical reclaim system. This substantially reduces the amount of solvent vapors that are drawn into the factory exhaust system.
Inventors
- 👤 Roy E. Hurtig
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 05:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/16; G03F7/162; Y; Y10; Y10T; Y10T137/00; Y10T137/2496; Y10T137/2499; Y10T137/2506
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
104 words
A drain system for a photoresist coating machine, said system comprising: an exhaust manifold; a drain line for transporting excess liquid photoresist and solvent from a spin coating chamine to said exhaust manifold, said drain line being configured such that liquid photoresist is not permitted to come to rest as it slows from aid coating machine to said exhaust manifold; a safety line for transporting solvent vapors from a motor chamber in said spin coating machine to said exhaust manifold; a means for connecting said exhaust manifold to an exhaust system; and a means for connecting said exhaust manifold to a chemical reclaim system.
Claim 2
Dependent Claim
29 words
The drain system of claim 1 wherein said drain line enters said exhaust manifold at a near wall thereof and terminates at a far wall of said exhaust manifold.
Claim 3
Dependent Claim
57 words
The drain system of claim 1 wherein said safety line extends from said motor chamber to a position in said exhaust manifold downstream from the position where said drain line joins said exhaust manifold, a valve being positioned in said exhaust manifold at a location upstream from the position where said safety line joins said exhaust manifold.
Claim 4
Dependent Claim
19 words
The drain system of claim 3 wherein said exhaust manifold includes a drain for removing liquid photoresist and solvent.
Claim 5
Dependent Claim
15 words
The drain system of claim 1, said exhaust manifold being connected to a developing unit.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-02-21 | 1997-08-23 | 1998-02-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-02-21 | 2001-08-23 | 2002-02-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-02-21 | 2005-08-23 | 2006-02-22 | $7700.00 | Window Closed / Lapsed |