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US5288662A Expired / Lapsed US ⏱️ 0.0 years remaining

Low ozone depleting organic chlorides for use during silicon oxidation and furnace tube cleaning

Assignee: Versum Materials US LLC
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Filing: 1992-06-15
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Granted: 1994-02-22
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Expires: 2012-06-15
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Abstract

Abstract A process for thermal oxidation of silicon or cleaning of furnace tubes used in semiconductor manufacturing by exposing the silicon or tube to temperatures above 700° C. while flowing a carrier gas containing oxygen and a chlorohydrocarbon having a general formula C x H x Cl x where x is 2, 3, or 4 over the silicon or tube. The chlorohydrocarbon is selected to readily and completely oxidize at temperature.

Inventors

  • 👤 Andre Lagendijk
  • 👤 Arthur K. Hochberg
  • 👤 David A. Roberts

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:30
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6302; H10P14/6304; H10P14/6306; H10P14/6308; H10P14/6309; C; C23; C23C; C23C16/00; C23C16/44; C23C16/4401; C23C16/4405; H10P14/6322; H10P70/00; H10P70/20

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 89 words
A process for thermal oxidation of a silicon article comprising the steps of: heating the silicon article to a temperature in excess of 700° C. in a reactor; flowing a gaseous mixture of oxygen and a chlorohydrocarbon having the general formula C x H x Cl x where x is 2, 3 or 4 into said reactor, said chlorohydrocarbon being selected based upon its being readily and completely oxidized under the stated conditions and; maintaining exposure of said silicon article to said gaseous mixture until said oxidation is completed.
Claim 2
Dependent Claim 89 words
A process for thermal oxidation of a silicon article comprising the steps of: heating the silicon article to a temperature in excess of 700° C. in a reactor; flowing a gaseous mixture of oxygen and a chlorohydrocarbon having the general formula C x H x Cl x where x is 2, 3 or 4 into said reactor, said chlorohydrocarbon being selected based upon its being readily and completely oxidized under the stated conditions and; maintaining exposure of said silicon article to said gaseous mixture until said oxidation is completed.
Claim 3
Dependent Claim 11 words
A process according to claim 1 wherein said chlorohydrocarbon is trans-dichloroethylene.
Claim 4
Dependent Claim 11 words
A process according to claim 1 wherein said chlorohydrocarbon is cis-dichloroethylene.
Claim 5
Dependent Claim 11 words
A process according to claim 1 wherein said chlorohydrocarbon is 1,1-dichloroethylene.
Claim 6
Dependent Claim 22 words
A process according to claim 1 wherein said chlorohydrocarbon is selected from the group consisting of trans-dichloroethylene, cis-dichloroethylene, 1,1-dichloroethylene and mixtures thereof.

References Cited (Backward Citations)

US3837905A Cited
JPS63269548A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-02-21 1997-08-23 1998-02-22 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-02-21 2001-08-23 2002-02-22 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-02-21 2005-08-23 2006-02-22 $7700.00 Window Closed / Lapsed

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