US5283948A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of manufacturing interconnect bumps
Assignee: Silicon Graphics International Corp
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Filing: 1991-05-31
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Granted: 1994-02-08
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Expires: 2011-05-31
Abstract
Abstract A method of manufacturing interconnect bumps on electrical connectors is disclosed. The interconnect bumps are formed with mechanically interlocking structure which allows the bumps to reach a height substantially greater than prior art bumps, while remaining structurally intact. The interconnect bumps are formed using standard photolithography techniques to form the bumps in multiple interlocking portions to achieve a structurally superior interconnect bump.
Inventors
- 👤 Paul E. Schroeder
- 👤 Deanna M. Dowdle
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 02:33
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/40; H05K3/4007; H05K1/00; H05K1/02; H05K1/03; H05K1/0393; H05K2201/00; H05K2201/03; H05K2201/0332; H05K2201/0335; H05K2201/0347; H05K2201/0364; H05K2201/0367; H05K2201/09; H05K2201/09818; H05K2201/09845; H05K2203/00; H05K2203/14; H05K2203/1476; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49117; Y10T29/49124; Y10T29/49147; Y10T29/49149; Y10T29/49155; Y10T29/49165
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
336 words
A method of coating a base layer to form an electrically conductive interconnect bump having elevated connection means rising above support means, the elevated connection means for making electrical connection between a point elevated above the base layer and the base layer and the support means for providing a mechanical interlock with the elevated connection means to prevent displacement of the elevated connection means comprising the steps of: coating the base layer with a photoresist layer; exposing the photoresist layer to radiation in a pattern defining the shape of the support means and an interlock cavity in the support means; removing the photoresist layer to form a first cavity in the photoresist layer defining the shape of the support means and the interlock cavity in the support means, the first cavity exposing a portion of the base layer; depositing a first layer of conductive material on the base layer in the first cavity formed in the photoresist layer, said first layer of conductive material forming the support means and interlock cavity; depositing a layer of gold on the support means; coating the base layer and support means with a second photoresist layer; exposing the second photoresist layer to radiation in a pattern defining the shape of the elevated connection means; removing the photoresist layer in the pattern defining the shape of the elevated connection means to form a second cavity in the second photoresist layer in the shape of the elevated connection means, the second cavity exposing the interlock cavity in the support means and a portion of the support means; depositing a second layer of conductive material in the interlock cavity in the support means and on the exposed portion of the support means in the pattern defined by the second layer of photoresist material to form the elevated connection means; planarizing a top surface of the elevated connection means of the interconnect bump; depositing a layer of gold on the top surface of the elevated connection means; and removing the remaining second photoresist layer.
Claim 2
Independent Claim
336 words
A method of coating a base layer to form an electrically conductive interconnect bump having elevated connection means rising above support means, the elevated connection means for making electrical connection between a point elevated above the base layer and the base layer and the support means for providing a mechanical interlock with the elevated connection means to prevent displacement of the elevated connection means comprising the steps of: coating the base layer with a photoresist layer; exposing the photoresist layer to radiation in a pattern defining the shape of the support means and an interlock cavity in the support means; removing the photoresist layer to form a first cavity in the photoresist layer defining the shape of the support means and the interlock cavity in the support means, the first cavity exposing a portion of the base layer; depositing a first layer of conductive material on the base layer in the first cavity formed in the photoresist layer, said first layer of conductive material forming the support means and interlock cavity; depositing a layer of gold on the support means; coating the base layer and support means with a second photoresist layer; exposing the second photoresist layer to radiation in a pattern defining the shape of the elevated connection means; removing the photoresist layer in the pattern defining the shape of the elevated connection means to form a second cavity in the second photoresist layer in the shape of the elevated connection means, the second cavity exposing the interlock cavity in the support means and a portion of the support means; depositing a second layer of conductive material in the interlock cavity in the support means and on the exposed portion of the support means in the pattern defined by the second layer of photoresist material to form the elevated connection means; planarizing a top surface of the elevated connection means of the interconnect bump; depositing a layer of gold on the top surface of the elevated connection means; and removing the remaining second photoresist layer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-02-07 | 1997-08-09 | 1998-02-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-02-07 | 2001-08-09 | 2002-02-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-02-07 | 2005-08-09 | 2006-02-08 | $7700.00 | Window Closed / Lapsed |