US5283155A
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Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative
Assignee: Sumitomo Chemical Co Ltd
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Filing: 1991-01-11
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Granted: 1994-02-01
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Expires: 2011-01-11
Abstract
Abstract PCT No. PCT/JP91/00013 Sec. 371 Date Jun. 11, 1991 Sec. 102(e) Date Jun. 11, 1991 PCT Filed Jan. 11, 1991 PCT Pub. No. WO92/12205 PCT Pub. Date Jul. 23, 1992.A positive resist composition which comprises an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: (* CHEMICAL STRUCTURE *) (I) wherein Y1, Y2, Z1, Z2, Z3, Z4, Z5, Z6 and Z7 are independently a hydrogen atom, a hydroxyl group, a C1-C4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y1 and Y2 is a hydroxyl group, and at least two of Z1 to Z7 are hydroxyl groups, and R1, R2, R3, R4, R5 and R6 are independently a hydrogen atom, a C1-C10 alkyl group, a C1-C4 alkenyl group, a cycloalkyl group or an aryl group, which composition has a high (gamma)-value.
Inventors
- 👤 Yasunori Uetani
- 👤 Hirotoshi Nakanishi
- 👤 Yasunori Doi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 04:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/20; G03F7/22
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
151 words
A positive resist composition which comprises in admixture an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: ##STR5## wherein Y 1 , Y 2 , Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are independently a hydrogen atom, a hydroxyl group, a C 1 -C 4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y 1 and Y 2 is a hydroxyl group, and at least two of Z 1 to Z 7 are hydroxyl groups, and R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are independently a hydrogen atom, a C 1 -C 10 alkyl group, a C 1 -C 4 alkenyl group, a cycloalkyl group or an aryl group.
Claim 2
Dependent Claim
151 words
A positive resist composition which comprises in admixture an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: ##STR5## wherein Y 1 , Y 2 , Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are independently a hydrogen atom, a hydroxyl group, a C 1 -C 4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y 1 and Y 2 is a hydroxyl group, and at least two of Z 1 to Z 7 are hydroxyl groups, and R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are independently a hydrogen atom, a C 1 -C 10 alkyl group, a C 1 -C 4 alkenyl group, a cycloalkyl group or an aryl group.
Claim 3
Dependent Claim
19 words
The positive resist composition according to claim 1, wherein two of Z 1 to Z 7 are hydroxyl groups.
Claim 4
Dependent Claim
45 words
The positive resist composition according to claim 1, wherein at least one of Z 1 , Z 2 , Z 3 and Z 4 is a hydroxyl group and at least one of Z 5 , Z 6 and Z 7 is a hydroxyl group.
Claim 5
Dependent Claim
17 words
The positive resist composition according to claim 1, wherein said phenol compound of formula (I) is: ##STR6##
Claim 6
Dependent Claim
17 words
The positive resist composition according to claim 1, wherein said phenol compound of formula (I) is: ##STR7##
Claim 7
Dependent Claim
17 words
The positive resist composition according to claim 1, wherein said phenol compound of formula (I) is: ##STR8##
Claim 8
Dependent Claim
39 words
The positive resist composition according to claim 1, wherein said quinone diazide sulfonic acid ester is present in an amount of from 15 to 30% by weight based on the total weight of solid components in said resist composition.
Claim 9
Dependent Claim
36 words
The positive resist composition according to claim 1, wherein said alkali-soluble resin is present in an amount of from 50 to 85% by weight based on the total weight of solid components in said resist composition.
Claim 10
Dependent Claim
222 words
The positive resist composition which comprises in admixture an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: ##STR9## wherein Y 1 , Y 2 , Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are independently a hydrogen atom, a hydroxyl group, a C 1 -C 4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y 1 and Y 2 is a hydroxyl group, and at least two of Z 1 to Z 7 are hydroxyl groups, and R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are independently a hydrogen atom, a C 1 -C 10 alkyl group, a C 1 -C 4 alkenyl group, a cycloalkyl group or an aryl group, wherein two of Z 1 to Z 7 are hydroxyl groups, wherein said quinone diazide sulfonic acid ester is present in an amount of from 15 to 30% by weight based on the total weight of solid components in said resist composition, and wherein said alkali-soluble resin is present in an amount of from 50 to 85% by weight based on the total weight of solid components in said resist composition.
Claim 11
Dependent Claim
222 words
The positive resist composition which comprises in admixture an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: ##STR9## wherein Y 1 , Y 2 , Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are independently a hydrogen atom, a hydroxyl group, a C 1 -C 4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y 1 and Y 2 is a hydroxyl group, and at least two of Z 1 to Z 7 are hydroxyl groups, and R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are independently a hydrogen atom, a C 1 -C 10 alkyl group, a C 1 -C 4 alkenyl group, a cycloalkyl group or an aryl group, wherein two of Z 1 to Z 7 are hydroxyl groups, wherein said quinone diazide sulfonic acid ester is present in an amount of from 15 to 30% by weight based on the total weight of solid components in said resist composition, and wherein said alkali-soluble resin is present in an amount of from 50 to 85% by weight based on the total weight of solid components in said resist composition.
Claim 12
Dependent Claim
45 words
The positive resist composition according to claim 9, wherein at least one of Z 1 , Z 2 , Z 3 and Z 4 is a hydroxyl group and at least one of Z 5 , Z 6 and Z 7 is a hydroxyl group.
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