US5059507A
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Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin
Assignee: Sumitomo Chemical Co Ltd
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Filing: 1989-06-12
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Granted: 1991-10-22
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Expires: 2009-06-12
Abstract
Abstract A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y 1 and Y 2 are each a hydrogen atom, an alkyl group or a hydroxyl group, provided that at least one of Y 1 and Y 2 is a hydroxyl group; Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are the same or different and each a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or halogen atom, provided that at least two of Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are hydroxyl groups; R 1 , R 2 and R 3 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group provides a positive resist composition having a high γ-value.
Inventors
- 👤 Yasunori Uetani
- 👤 Makoto Hanabata
- 👤 Hirotoshi Nakanishi
- 👤 Koji Kuwana
- 👤 Yukio Hanamoto
- 👤 Fumio Oi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 10:30
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/72; G03F; G03F7/00; G03F7/004; G03F7/022
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
218 words
A positive resist composition which in admixture comprises an alkali-soluble resin and one or more naphthoquinone or benzoquinone diazide sulfonic acid esters of a phenol compound of the general formula: ##STR7## wherein Y 1 and Y 2 are each a hydrogen atom, an alkyl group or a hydroxyl group, provided that at least one of Y 1 and Y 2 is a hydroxyl group; Z 1 , Z 2 , Z 3 , Z 5 , Z 6 and Z 7 are the same or different and each of a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or halogen atom, provided that at least two of Z 1 , Z 2 Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are hydroxyl groups; R 1 , R 2 and R 3 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, wherein said alkali-soluble resin is present in an amount of not less than 305 by weight and said quinone diazide sulfonic acid ester of said phenol compound is present in an amount of from 10 to 50% by weight based on the total weight of the solid components in the resist composition.
Claim 2
Dependent Claim
218 words
A positive resist composition which in admixture comprises an alkali-soluble resin and one or more naphthoquinone or benzoquinone diazide sulfonic acid esters of a phenol compound of the general formula: ##STR7## wherein Y 1 and Y 2 are each a hydrogen atom, an alkyl group or a hydroxyl group, provided that at least one of Y 1 and Y 2 is a hydroxyl group; Z 1 , Z 2 , Z 3 , Z 5 , Z 6 and Z 7 are the same or different and each of a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or halogen atom, provided that at least two of Z 1 , Z 2 Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are hydroxyl groups; R 1 , R 2 and R 3 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, wherein said alkali-soluble resin is present in an amount of not less than 305 by weight and said quinone diazide sulfonic acid ester of said phenol compound is present in an amount of from 10 to 50% by weight based on the total weight of the solid components in the resist composition.
Claim 3
Dependent Claim
34 words
The positive resist composition according to claim 1, wherein two of Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are hydroxyl groups.
Claim 4
Dependent Claim
45 words
The positive resist composition according to claim 1, wherein at least one of Z 1 , Z 2 , Z 3 and Z 4 is a hydroxyl group and at least one of Z 5 , Z 6 and Z 7 is a hydroxyl group.
Claim 5
Dependent Claim
20 words
The positive resist composition according to claim 1, wherein Y 2 , Z 2 and Z 6 are hydroxyl groups.
Claim 6
Dependent Claim
26 words
The positive resist composition according to claim 1, wherein R 1 , R 2 and R 3 are each a C 1 -C 4 alkyl group.
Claim 7
Dependent Claim
26 words
The positive resist composition according to claim 2, wherein R 1 , R 2 and R 3 are each a C 1 -C 4 alkyl group.
Claim 8
Dependent Claim
25 words
The positive resist composition according to claim 3, wherein R 1 , R 2 and R 3 are each C 1 -C 4 alkyl group.
Claim 9
Dependent Claim
26 words
The positive resist composition according to claim 4, wherein R 1 , R 2 and R 3 are each a C 1 -C 4 alkyl group.
Claim 10
Dependent Claim
24 words
The positive resist composition according to claim 1, wherein R 1 , R 2 and R 3 are each a methyl or ethyl group.
Claim 11
Dependent Claim
24 words
The positive resist composition according to claim 2, wherein R 1 , R 2 and R 3 are each a methyl or ethyl group.
Claim 12
Dependent Claim
24 words
The positive resist composition according to claim 3, wherein R 1 , R 2 and R 3 are each a methyl or ethyl group.
Claim 13
Dependent Claim
24 words
The positive resist composition according to claim 4, wherein R 1 , R 2 and R 3 are each a methyl or ethyl group.
Claim 14
Dependent Claim
17 words
The positive resist composition according to claim 1, wherein the phenol compound of formula (I) is ##STR8##
Claim 15
Dependent Claim
17 words
The positive resist composition according to claim 1, wherein the phenol compound of formula (I) is ##STR9##
Claim 16
Dependent Claim
17 words
The positive resist composition according to claim 1, wherein the phenol compound of formula (I) is ##STR10##
Claim 17
Dependent Claim
17 words
The positive resist composition according to claim 1, wherein the phenol compound of formula (I) is ##STR11##
Claim 18
Dependent Claim
17 words
The positive resist composition according to claim 1, wherein the phenol compound of formula (I) is ##STR12##
Claim 19
Dependent Claim
41 words
The positive resist composition according to claim 1, further comprising a quinone diazide sulfonic acid ester of a phenol compound selected from the group consisting of hydroquinone, resorcinol, phloroglucin, 2,4-dihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 2,3,3',4-tetrahydroxybenzophenone, 2,3,4,4'-tetrahydroxybenzophenone, 2,2',4,4',-tetrahydroxybenzophenone, 2,2',3,3',4-pentahydroxybenzophenone, 2,3,3',4,5'-pentahydroxybenzophenone, 2,2-bis(2,4-dihydroxyphenol)propane, 2-(3-hydroxyphenyl)-2-(2,5-dihydroxyphenyl)propane and alkyl gallates.
Claim 20
Dependent Claim
27 words
The positive resist composition according to claim 1, wherein said alkali-soluble resin comprises a novolak resin prepared by an addition condensation reaction of a phenol with formaldehyde.
Claim 21
Dependent Claim
207 words
A positive resist composition which comprises a novolak resin and one or more naphthoquinone or benzoquinone diazide sulfonic acid esters of a phenol compound of the general formula (I): ##STR13## wherein Y 1 and Y 2 are each a hydrogen atom or a hydroxyl group, provided that at least one of Y 1 and Y 2 is a hydroxyl group; Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are the same or different and each a hydrogen atom or a hydroxyl group, provided that at least two of Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are hydroxyl groups; and R 1 , R 2 and R 3 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, wherein said alkali-soluble resin is present in an amount of not less than 30% by weight and said quinone diazide sulfonic acid ester of said phenol compound is present in an amount of from 10 to 50% by weight based on the total weight of the solid components in the resist composition.
Claim 22
Dependent Claim
207 words
A positive resist composition which comprises a novolak resin and one or more naphthoquinone or benzoquinone diazide sulfonic acid esters of a phenol compound of the general formula (I): ##STR13## wherein Y 1 and Y 2 are each a hydrogen atom or a hydroxyl group, provided that at least one of Y 1 and Y 2 is a hydroxyl group; Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are the same or different and each a hydrogen atom or a hydroxyl group, provided that at least two of Z 1 , Z 2 , Z 3 , Z 4 , Z 5 , Z 6 and Z 7 are hydroxyl groups; and R 1 , R 2 and R 3 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, wherein said alkali-soluble resin is present in an amount of not less than 30% by weight and said quinone diazide sulfonic acid ester of said phenol compound is present in an amount of from 10 to 50% by weight based on the total weight of the solid components in the resist composition.
References Cited (Backward Citations)
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