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US5271801A Expired / Lapsed US ⏱️ 0.0 years remaining

Process of production of integrated optical components

Assignee: Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
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Filing: 1992-11-25
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Granted: 1993-12-21
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Expires: 2012-11-25
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Abstract

Abstract The invention relates to a process of production of integrated optical components on a substrate making it possible to combine microguides, separating plates, lenses, diopters. The process consists, for this purpose, in producing a first mask having patterns of given shapes and sizes; performing an anisotropic etching of the substrate not protected by the mask to obtain cavities (20) with vertical walls; eliminating the mask; performing a thermal oxidation of the vertical walls to constitute barrier layers (31) and the mask being used for the etching of the main phase, then in producing a mask (12) having patterns of given shapes and sizes; performing an etching of the substrate not protected by the mask to obtain at least one cavity (13) of desired shape; performing a thermal oxidation to form a peripheral layer (15, 16a, 16, 16c) of given thickness on a part or over the entire inside surface of the cavities; performing a filling (17, 18) of the cavities by a suitable material.

Inventors

  • 👤 Serge Valette

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 02:51
CPC Classifications
G; G02; G02B; G02B6/00; G02B6/10; G02B6/12; G02B6/13; G02B6/136

Claims Analysis

Total Claims: 39
Claim 1
Independent Claim 111 words
A process for producing integrated optical components on a substrate, comprising the steps of: producing a first mask on said substrate so that only first regions of the substrate are not covered by the mask; anisotropically etching said first regions, thereby forming a first cavity having nearly vertical walls; removing the first mask from the substrate; thermally oxidizing the vertical walls; forming a second mask on said substrate so that only second regions of said substrate are not covered by the mask; etching said second regions, thereby forming a second cavity; thermally oxidizing a surface region of said second cavity; and filling the first and second cavities with a first material.
Claim 2
Dependent Claim 111 words
A process for producing integrated optical components on a substrate, comprising the steps of: producing a first mask on said substrate so that only first regions of the substrate are not covered by the mask; anisotropically etching said first regions, thereby forming a first cavity having nearly vertical walls; removing the first mask from the substrate; thermally oxidizing the vertical walls; forming a second mask on said substrate so that only second regions of said substrate are not covered by the mask; etching said second regions, thereby forming a second cavity; thermally oxidizing a surface region of said second cavity; and filling the first and second cavities with a first material.
Claim 3
Dependent Claim 104 words
A process for producing integrated optical components on a substrate, comprising the steps of: forming a mask on said substrate so that only a selected region of said substrate is not covered by the mask; etching said selected region, thereby forming a cavity; thermally oxidizing a surface region of said cavity; and filling the cavity with a first material wherein etching said selected region comprises isotropic ion etching, thereby forming said cavity into a nearly circular cavity in the substrate, said cavity having an opening width at the substrate surface and a depth from the substrate surface, said width being smaller than said depth.
Claim 4
Dependent Claim 104 words
A process for producing integrated optical components on a substrate, comprising the steps of: forming a mask on said substrate so that only a selected region of said substrate is not covered by the mask; etching said selected region, thereby forming a cavity; thermally oxidizing a surface region of said cavity; and filling the cavity with a first material wherein etching said selected region comprises isotropic ion etching, thereby forming said cavity into a nearly circular cavity in the substrate, said cavity having an opening width at the substrate surface and a depth from the substrate surface, said width being smaller than said depth.
Claim 5
Dependent Claim 83 words
A process for producing an integrated optical microguide on a substrate, comprising the steps of: producing a mask on said substrate; isotopically etching that portion of the substrate not protected by the mask, to obtain at least one nearly circular cavity inside the substrate; thermally oxidizing the substrate to form a peripheral layer of given thickness inside the cavity, said peripheral layer forming a cladding of the microguide; filling the nearly circular cavity with material, said material forming the core of the microguide.
Claim 6
Dependent Claim 83 words
A process for producing an integrated optical microguide on a substrate, comprising the steps of: producing a mask on said substrate; isotopically etching that portion of the substrate not protected by the mask, to obtain at least one nearly circular cavity inside the substrate; thermally oxidizing the substrate to form a peripheral layer of given thickness inside the cavity, said peripheral layer forming a cladding of the microguide; filling the nearly circular cavity with material, said material forming the core of the microguide.
Claim 7
Dependent Claim 28 words
A process according to claim 3, wherein the mask has an opening width to define the cavity pattern whose width is smaller than a depth of said cavity.
Claim 8
Dependent Claim 17 words
A process according to claim 3, wherein the isotropic etching of the substrate comprises dry isotropic etching.
Claim 9
Dependent Claim 24 words
A process according to claim 3, further comprising the step of depositing an upper protective layer on said substrate, after the step of filling.
Claim 10
Dependent Claim 44 words
A process according to claim 3, wherein the step of producing a mask comprises: thermally oxidizing the substrate while the substrate is exposed to a selected gas pressure; removing the oxide from the substrate on a portion of the substrate corresponding to desired patterns.
Claim 11
Dependent Claim 26 words
A process according to claim 4, wherein a ratio of the cavity depth to the opening width of the mask is at least equal to 5.
Claim 12
Dependent Claim 44 words
A process according to claim 3, wherein the step of filling the cavity comprises the introducing of a material with an index of refraction ng greater than that of the inner peripheral layer of the cavity, this material constituting the core of the microguide.
Claim 13
Dependent Claim 27 words
A process according to claim 9, wherein the material introduced is a material of the same type as those used for the production of plastic optical fibers.
Claim 14
Dependent Claim 17 words
A process according to claim 9, wherein the filling material is an optically transparent and hardenable material.
Claim 15
Dependent Claim 131 words
A process for producing integrated optical components on a substrate comprising the steps of: a) producing a first mask; b) anisotropically etching that portion of the substrate which is not protected by the first mask to obtain at least one first cavity having nearly vertical walls; c) removing the first mask from the substrate; d) thermally oxidizing the vertical walls to constitute barrier layers for etching; e) producing a second mask; f) performing etching of that portion of the substrate that is not protected by the second mask and the barrier layers, to obtain at least one second cavity of a desired shape; g) thermally oxidizing the substrate to form a peripheral layer of given thickness inside the second cavity; h) filling at least the second cavity with a second material.
Claim 16
Dependent Claim 131 words
A process for producing integrated optical components on a substrate comprising the steps of: a) producing a first mask; b) anisotropically etching that portion of the substrate which is not protected by the first mask to obtain at least one first cavity having nearly vertical walls; c) removing the first mask from the substrate; d) thermally oxidizing the vertical walls to constitute barrier layers for etching; e) producing a second mask; f) performing etching of that portion of the substrate that is not protected by the second mask and the barrier layers, to obtain at least one second cavity of a desired shape; g) thermally oxidizing the substrate to form a peripheral layer of given thickness inside the second cavity; h) filling at least the second cavity with a second material.
Claim 17
Dependent Claim 20 words
A process according to claim 12, wherein the step of anisotropically etching comprises a preferential chemical etching of the substrate.
Claim 18
Dependent Claim 22 words
A process according to claim 12, wherein the depth of the first cavity is greater than the depth of the second cavity.
Claim 19
Dependent Claim 46 words
A process according to claim 12, wherein the step e of producing the second mask comprises the steps of: thermally oxidizing the substrate simultaneously with step d of thermally oxidizing the vertical walls; removing the oxide from the substrate in a portion corresponding to desired pattern.
Claim 20
Dependent Claim 21 words
A process according to claim 12, wherein the steps d and g of thermally oxidizing occur under at least atmospheric pressure.
Claim 21
Dependent Claim 24 words
A process according to claim 12, wherein the first and second cavities are filled respectively with a first material and with the second material.
Claim 22
Dependent Claim 14 words
A process according to claim 17, wherein the first and second materials are identical.
Claim 23
Dependent Claim 38 words
A process according to claim 12, wherein the material filling the first cavity comprises a material with an index of refraction nr which is less than the index of refraction of inner barrier layers of said first cavity.
Claim 24
Dependent Claim 28 words
A process according to claim 17, wherein the step of filling the first material in the first cavity consists of vapor deposition of metal to form a mirror.
Claim 25
Dependent Claim 32 words
A process according to claim 17, wherein the step of filling the first material in the first cavity for forming a mirror comprises filling said cavity with a low melting point metal.
Claim 26
Dependent Claim 50 words
A process according to claim 17, wherein the step of filling the first cavity which is for forming a separating plate on said substrate consists of filling said first cavity with a dielectric material with an index of refraction different from that of the second material filling the second cavity.
Claim 27
Dependent Claim 18 words
A process according to claim 12, wherein the etching of the substrate of step f comprises dry etching.
Claim 28
Dependent Claim 25 words
A process according to claim 12, further comprising the step of depositing an upper protective layer on said substrate after the step h of filling.
Claim 29
Dependent Claim 44 words
A process according to claim 12, wherein the step a of producing the first mask comprises: thermally oxidizing the substrate while the substrate is exposed to a selected gas pressure; removing the oxide from the substrate on a portion corresponding to a desired pattern.
Claim 30
Dependent Claim 21 words
A process according to claim 23, wherein the step of dry etching comprises isotropic ion etching thereby forming nearly circular cavities.
Claim 31
Dependent Claim 33 words
A process according to claim 26, wherein the nearly circular cavities have an opening width at the substrate surface and a depth from said surface, said opening width being smaller than said depth.
Claim 32
Dependent Claim 26 words
A process according to claim 26, wherein a ratio of the cavity depth to the opening width of the mask is at least equal to 5.
Claim 33
Dependent Claim 23 words
A process to claim 12, wherein the step b comprises anisotropic ion etching making it possible to obtain cavities with rectangular cross section.
Claim 34
Dependent Claim 45 words
A process according to claim 12, wherein the step h of filling the second cavity comprises introducing the second material with index of refraction ng greater than that of the inner peripheral layer of the cavity, the second material constituting the core of the microguide.
Claim 35
Dependent Claim 25 words
A process according to claim 30, wherein the second material is of the same type as those used for the production of plastic optical fibers.
Claim 36
Dependent Claim 16 words
A process according to claim 30, wherein the second material is an optically transparent and hardenable.
Claim 37
Dependent Claim 11 words
A process according to claim 12, wherein said components comprises microguides.
Claim 38
Dependent Claim 26 words
A process according to claim 12, wherein the components comprise at least one member selected from the group consisting of mirrors, separating plates, lenses and diopters.
Claim 39
Dependent Claim 27 words
A process according to claim 12, wherein the components comprise at least two members selected from the group consisting of microguides, mirrors, separating plates, lenses and diopters.

References Cited (Backward Citations)

JPS59220703A Cited
JPS60129711A Cited
EP0367675A1 Cited
US5032220A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-12-20 1997-06-21 1997-12-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-12-20 2001-06-21 2001-12-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-12-20 2005-06-21 2005-12-21 $7700.00 Window Closed / Lapsed

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