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US5266523A
Expired / Lapsed
US
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Method of forming self-aligned contacts using the local oxidation of silicon
Assignee: Micron Technology Inc
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Filing: 1993-03-12
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Granted: 1993-11-30
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Expires: 2013-03-12
Abstract
Abstract Self-aligned contacts are formed between a first layer of material which can be oxidized, such as polycrystalline silicon (poly 1), and a second layer of material such as metal or polycrystalline silicon (poly 2). A patterned layer of material, such as nitride, that prevents the first layer from oxidizing is deposited over the poly 1 layer. The exposed poly 1 material is oxidized, while the poly 1 material covered by the nitride is protected from oxidization. The nitride is removed and another layer of conductive material is formed, and thus contacts the poly 1 layer which was protected from oxidation, while the oxide insulates the other poly 1 areas.
Inventors
- 👤 Monte Manning
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 17:05
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/0698; Y; Y10; Y10S; Y10S148/00; Y10S148/117
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
237 words
A method of forming contact areas on the surface of a wafer of semiconductor material, comprising the steps of: a) forming a blanket first conductive layer over said wafer surface, said first conductive layer being oxidizable; b) forming a protective layer over said first conductive layer, said protective layer preventing oxidation of said first conductive layer thereunder; c) forming a first patterned photoresist layer over said protective layer, said photoresist covering portions of said protective layer and leaving portions of said protective layer exposed; d) removing said exposed portions of said protective layer and leaving said blanket conductive layer substantially intact; e) forming a second patterned photoresist layer over portions of said first conductive layer and over portions of said protective layer; f) etching through said protective layer and said blanket first conductive layer such that said first conductive layer becomes patterned thereby and at least part of said conductive and protective layers are self-aligned; g) oxidizing said exposed portions of said first conductive layer, said first conductive layer comprising oxidized and unoxidized regions thereby said oxidized areas being insulative; h) removing said protective layer; and i) forming a second conductive layer over said first conductive layer such that said second conductive layer contacts said oxidized and unoxidized portions of said first conductive layer, wherein an electrical impulse can be transferred between said first and second conductive layers through said unoxidized portions of said first conductive layer.
Claim 2
Independent Claim
237 words
A method of forming contact areas on the surface of a wafer of semiconductor material, comprising the steps of: a) forming a blanket first conductive layer over said wafer surface, said first conductive layer being oxidizable; b) forming a protective layer over said first conductive layer, said protective layer preventing oxidation of said first conductive layer thereunder; c) forming a first patterned photoresist layer over said protective layer, said photoresist covering portions of said protective layer and leaving portions of said protective layer exposed; d) removing said exposed portions of said protective layer and leaving said blanket conductive layer substantially intact; e) forming a second patterned photoresist layer over portions of said first conductive layer and over portions of said protective layer; f) etching through said protective layer and said blanket first conductive layer such that said first conductive layer becomes patterned thereby and at least part of said conductive and protective layers are self-aligned; g) oxidizing said exposed portions of said first conductive layer, said first conductive layer comprising oxidized and unoxidized regions thereby said oxidized areas being insulative; h) removing said protective layer; and i) forming a second conductive layer over said first conductive layer such that said second conductive layer contacts said oxidized and unoxidized portions of said first conductive layer, wherein an electrical impulse can be transferred between said first and second conductive layers through said unoxidized portions of said first conductive layer.
Claim 3
Dependent Claim
18 words
The method of claim 1 wherein said first conductive layer comprises polycrystalline silicon having a first type conductivity.
Claim 4
Dependent Claim
12 words
The method of claim 2 wherein said first type conductivity comprises n-type.
Claim 5
Dependent Claim
12 words
The method of claim 2 wherein said first type conductivity comprises p-type.
Claim 6
Dependent Claim
11 words
The method of claim 1 wherein said protective layer comprises nitride.
Claim 7
Dependent Claim
18 words
The method of claim 1 wherein said second conductive layer comprises polycrystalline silicon having a second type conductivity.
Claim 8
Dependent Claim
12 words
The method of claim 6 wherein said second type conductivity comprises n-type.
Claim 9
Dependent Claim
12 words
The method of claim 6 wherein said second type conductivity comprises p-type.
Claim 10
Dependent Claim
12 words
The method of claim 1 wherein said second conductive layer comprises metal.
Claim 11
Dependent Claim
31 words
The method of claim 1 wherein said first conductive layer comprises substantially vertical edges, said method further comprising the step of forming spacers at said vertical edges before said oxidizing step.
Claim 12
Dependent Claim
17 words
The method of claim 1 wherein said oxidizing step forms thermal oxide on said first conductive layer.
Claim 13
Independent Claim
225 words
A method of forming contact areas on the surface of a wafer of semiconductor material, comprising the steps of: a) forming a blanket first conductive layer comprising polycrystalline silicon having a first type conductivity over said water surface; b) forming a protective layer comprising nitride over said first conductive layer; c) forming a first patterned photoresist layer over said protective layer, said photoresist covering portions of said protective layer and leaving portions of said protective layer exposed; d) removing said exposed portions of said protective layer and leaving said first conductive layer substantially intact; e) forming a second patterned photoresist layer over portions of said blanket first conductive layer and over portions of said protective layer; f) etching through said blanket first conductive layer and said protective layer such that at least part of said conductive and protective layers are self-aligned, said etch patterning said first conductive layer; g) oxidizing said exposed portions of said first conductive layer, said first conductive layer comprising oxidized and unoxidized regions thereby; h) removing said protective layer; and i) forming a second conductive layer over said first conductive layer such that said second conductive layer contacts said oxidized and unoxidized portions of said first conductive layer, wherein an electrical impulse can be transferred between said first and second conductive layers through said unoxidized portions of said first conductive layer.
Claim 14
Independent Claim
225 words
A method of forming contact areas on the surface of a wafer of semiconductor material, comprising the steps of: a) forming a blanket first conductive layer comprising polycrystalline silicon having a first type conductivity over said water surface; b) forming a protective layer comprising nitride over said first conductive layer; c) forming a first patterned photoresist layer over said protective layer, said photoresist covering portions of said protective layer and leaving portions of said protective layer exposed; d) removing said exposed portions of said protective layer and leaving said first conductive layer substantially intact; e) forming a second patterned photoresist layer over portions of said blanket first conductive layer and over portions of said protective layer; f) etching through said blanket first conductive layer and said protective layer such that at least part of said conductive and protective layers are self-aligned, said etch patterning said first conductive layer; g) oxidizing said exposed portions of said first conductive layer, said first conductive layer comprising oxidized and unoxidized regions thereby; h) removing said protective layer; and i) forming a second conductive layer over said first conductive layer such that said second conductive layer contacts said oxidized and unoxidized portions of said first conductive layer, wherein an electrical impulse can be transferred between said first and second conductive layers through said unoxidized portions of said first conductive layer.
Claim 15
Dependent Claim
12 words
The method of claim 2 wherein said first type conductivity comprises n-type.
Claim 16
Dependent Claim
12 words
The method of claim 12 wherein said first type conductivity comprises p-type.
Claim 17
Dependent Claim
13 words
The method of claim 12 wherein said second conductive layer comprises polycrystalline silicon.
Claim 18
Dependent Claim
12 words
The method of claim 12 wherein said second conductive layer comprises metal.
Claim 19
Dependent Claim
31 words
The method of claim 12 wherein said first conductive layer comprises substantially vertical edges, said method further comprising the step of forming spacers at said vertical edges before said oxidizing step.
Claim 20
Dependent Claim
17 words
The method of claim 12 wherein said oxidizing step forms thermal oxide on said first conductive layer.
Claim 21
Independent Claim
172 words
A method of forming contact areas on the surface of a wafer of semiconductor material, comprising the steps of: a) forming an unpatterned first conductive layer over said wafer surface; b) forming a patterned protective layer over said first conductive layer; c) forming a patterned photoresist layer over portions of said first conductive layer and over portions of said protective layer; d) etching through said unpatterned first conductive layer and said protective layer, said first conductive layer being patterned thereby, said etching resulting in at least a partial self-alignment of said first conductive and protective layers; e) oxidizing exposed portions of said first conductive layer, said first conductive layer comprising oxidized and unoxidized regions thereby; f) removing said protective layer; and g) forming a second conductive layer over said first conductive layer such that said second conductive layer contacts said oxidized and unoxidized portions of said first conductive layer, wherein an electrical impulse can be transferred between said first and second conductive layers through said unoxidized portions of said first conductive layer.
Claim 22
Independent Claim
172 words
A method of forming contact areas on the surface of a wafer of semiconductor material, comprising the steps of: a) forming an unpatterned first conductive layer over said wafer surface; b) forming a patterned protective layer over said first conductive layer; c) forming a patterned photoresist layer over portions of said first conductive layer and over portions of said protective layer; d) etching through said unpatterned first conductive layer and said protective layer, said first conductive layer being patterned thereby, said etching resulting in at least a partial self-alignment of said first conductive and protective layers; e) oxidizing exposed portions of said first conductive layer, said first conductive layer comprising oxidized and unoxidized regions thereby; f) removing said protective layer; and g) forming a second conductive layer over said first conductive layer such that said second conductive layer contacts said oxidized and unoxidized portions of said first conductive layer, wherein an electrical impulse can be transferred between said first and second conductive layers through said unoxidized portions of said first conductive layer.
Claim 23
Dependent Claim
15 words
The method of claim 19 wherein said first and second conductive layers comprise polycrystalline silicon.
Claim 24
Dependent Claim
13 words
The method of claim 19 wherein said second conductive layer comprises a metal.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-11-29 | 1997-05-31 | 1997-11-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-11-29 | 2001-05-31 | 2001-11-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-11-29 | 2005-05-31 | 2005-11-30 | $7700.00 | Window Closed / Lapsed |